Patents by Inventor Yuuji Mizuho

Yuuji Mizuho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Negative photoresist composition and method of manufacturing array substrate using the same
    Patent number: 8092981
    Abstract: A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.
    Type: Grant
    Filed: December 29, 2008
    Date of Patent: January 10, 2012
    Assignees: Samsung Electronics Co., Ltd., Techno Semichem Co., Ltd.
    Inventors: Hoon Kang, Jae-Sung Kim, Yang-Ho Jung, Hi-Kuk Lee, Yasuhiro Kameyama, Yuuji Mizuho, Jong-Cheol Kim, Se-Jin Choi
  • NEGATIVE PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME
    Publication number: 20090176337
    Abstract: A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.
    Type: Application
    Filed: December 29, 2008
    Publication date: July 9, 2009
    Applicants: SAMSUNG ELECTRONICS CO., LTD., TECHNO SEMICHEM CO., LTD.
    Inventors: Hoon KANG, Jae-Sung KIM, Yang-Ho JUNG, Hi-Kuk LEE, Yasuhiro KAMEYAMA, Yuuji MIZUHO, Jong-Cheol KIM, Se-Jin CHOI