Abstract: A machine learning device includes: a training data acquisition unit configured to acquire multiple pieces of training data each including insulation resistances of a servomotor at the beginning and the end of a certain period and time-series data indicating conditions of the servomotor in the certain period; and a learning model generating unit configured to perform a supervised learning using the training data to thereby generate a learning model.

Abstract: A development device may include: a development device body; a developer cartridge detachably attached to the development device body; first and second levers provided to the development device body, the first lever including an operation part and a first engagement portion and the second lever including a second engagement portion; first and second engaged portions provided to the developer cartridge, the first engaged portion being configured to form a first engagement with the first engagement portion and the second engaged portion being configured to form a second engagement with the second engagement portion; and a first biasing member biasing the first engagement portion to the first engaged portion. When the operation part is operated with a first pressing force, the first engagement is released, and when the operation part is operated with a second pressing force greater than the first pressing force, the first and second engagements are released.

Abstract: A development device may include: a development device body; a developer cartridge detachably attached to the development device body; first and second lavers provided to the development device body, the first lever including an operation part and a first engagement portion and a second lever including a second engagement portion; first and second engaged portions provided to the developer cartridge, the first engaged portion being configured to form a first engagement with the first engagement portion and the second engaged portion being configured to form a second engagement with the second engagement portion; and a first biasing member biasing the first engagement portion to the first engaged portion. When the operation part is operated with a first pressing force, the first engagement is released, and when the operation part is operated with a second pressing force greater than the first pressing force, the first and second engagements are released.

Abstract: A camera captures an image of a region including at least a portion of an operating member and generates image data indicative of the image. A controller acquires the image data from the camera. The controller determines whether an operation of the operating member by an operator is an intentional operation or an unintentional operation based on the image. When the operation of the operating member by the operator is determined to be the intentional operation, the controller controls a work machine according to the operation of the operating member. When the operation of the operating member by the operator is determined to be the unintentional operation, the controller invalidates the operation of the operating member.

Abstract: The present technology relates to a solid-state imaging device and electronic equipment to suppress degradation of Dark characteristics. A photoelectric converting unit configured to perform photoelectric conversion, and a PN junction region including a P-type region and an N-type region on a side of a light incident surface of the photoelectric converting unit are included. Further, on a vertical cross-section, the PN junction region is formed at three sides including a side of the light incident surface among four sides enclosing the photoelectric converting unit. Further, a trench which penetrates through a semiconductor substrate in a depth direction and which is formed between the photoelectric converting units each formed at adjacent pixels is included, and the PN junction region is also provided on a side wall of the trench. The present technology can be applied, for example, to a backside irradiation type CMOS image sensor.

Abstract: In the hydraulic excavator, the control unit outputs the drive signals, which gives the motion corresponding to the motion of the hydraulic cylinder, the revolving motor of the revolving unit and the traveling device to the work implement operating lever, the right work implement operating lever and the traveling lever, to the drive section. The control section outputs the control signals based on the motion of the left work implement operating lever the right work implement operating lever or the traveling lever operated by the operator when the motion of the left work implement operating lever, the right work implement operating lever or the traveling lever operated by the operator is different from the motion corresponding to the motion of the hydraulic cylinder, the revolving motor of the revolving unit and the traveling device.

Abstract: A work vehicle includes an operating lever configured to operate a work implement, an actuator configured to move the operating lever, and a control section configured to control the actuator to move the operating lever to a retreat position outside an operation range of the operating lever.

Abstract: A work vehicle includes a vehicle main body, a work implement attached to the vehicle main body, an operating lever configured to operate the work implement, an imparting section configured to impart force to the operating lever, an acceleration detection section configured to detect acceleration of the vehicle main body, and a control section configured to control the imparting section to automatically adjust a magnitude of the force imparted to the operating lever based on the acceleration detected by the acceleration detection section.

Abstract: A developing agent container includes: a container, a shutter that sets a supply hole to a closed state and an open state, a seal sponge that seals a gap between the first surface and the shutter when the supply hole is in the closed state, wherein the shutter has a first ridge line part that makes contact with the seal sponge due to the movement of the shutter, in a first edge part on a front end side in the first direction, the seal sponge has a second ridge line part that makes contact with the shutter due to the movement of the shutter in the first direction, in a second edge part on the opposite direction's side facing the supply hole, and the first ridge line part and the second ridge line part have a relationship in which one is inclined with respect to the other.

Abstract: The present technology relates to a solid-state imaging device and electronic equipment to suppress degradation of Dark characteristics. A photoelectric converting unit configured to perform photoelectric conversion, and a PN junction region including a P-type region and an N-type region on a side of a light incident surface of the photoelectric converting unit are included. Further, on a vertical cross-section, the PN junction region is formed at three sides including a side of the light incident surface among four sides enclosing the photoelectric converting unit. Further, a trench which penetrates through a semiconductor substrate in a depth direction and which is formed between the photoelectric converting units each formed at adjacent pixels is included, and the PN junction region is also provided on a side wall of the trench. The present technology can be applied, for example, to a backside irradiation type CMOS image sensor.

Abstract: A developing agent container includes: a container, a shutter that sets a supply hole to a closed state and an open state, a seal sponge that seals a gap between the first surface and the shutter when the supply hole is in the closed state, wherein the shutter has a first ridge line part that makes contact with the seal sponge due to the movement of the shutter, in a first edge part on a front end side in the first direction, the seal sponge has a second ridge line part that makes contact with the shutter due to the movement of the shutter in the first direction, in a second edge part on the opposite direction's side facing the supply hole, and the first ridge line part and the second ridge line part have a relationship in which one is inclined with respect to the other.

Abstract: An image forming unit includes an image bearing body, a developer storage section that stores a developer removed from a surface of the image bearing body, a frame surrounding the developer storage section, a developer conveying member that conveys the developer in the developer storage section in a predetermined conveying direction, and a convex portion that is provided in the frame and pushes the developer conveying member toward the image bearing body.

Abstract: An image forming unit includes an image bearing body, a developer storage section that stores a developer removed from a surface of the image bearing body, a frame surrounding the developer storage section, a developer conveying member that conveys the developer in the developer storage section in a predetermined conveying direction, and a convex portion that is provided in the frame and pushes the developer conveying member toward the image bearing body.

Abstract: Provided is a doping method for doping by injecting a dopant into a processing target substrate. According to this doping method, a value of bias electric power supplied during a plasma doping processing is set to a predetermined value on premise of a washing processing to be performed after a plasma doping, and plasma is generated within a processing vessel using microwaves so as to perform the plasma doping processing on the processing target substrate hold on a holding pedestal in the processing vessel.

Abstract: There is provided a plasma processing apparatus, which includes: a processing chamber into which a target substrate is loaded and in which a dopant is implanted into the target substrate using a plasma of a gas which contains an element used as the dopant; a wall probe configured to measure a change in voltage corresponding to a density of charged particles in the plasma generated within the processing chamber; an OES (Optical Emission Spectrometer) configured to measure a light emission intensity of the dopant existing in the plasma; and a calculation unit configured to calculate a dose amount of the dopant implanted into the target substrate, based on a measurement result obtained at the wall probe and a measurement result obtained at the OES.

Abstract: Disclosed is a plasma doping apparatus and a plasma doping method for performing a doping on a processing target substrate by implanting dopant ions into the processing target substrate. The plasma doping method includes a plasma doping processing performed on the processing target substrate held on a holding unit within a processing container by generating plasma using a microwave. The plasma doping method also includes an annealing processing which is performed on the processing target substrate which has been subjected to the plasma doping processing.

Abstract: Disclosed is a method of performing doping by implanting a dopant to a processing target substrate. First, in an oxide film forming step, an oxide film is formed on the processing target substrate prior to performing a doping treatment. In addition, after the oxide film is formed on the processing target substrate, a plasma doping treatment is performed from a top of the oxide film after the oxide film forming step.

Abstract: There is provided a plasma processing apparatus, which includes: a processing chamber into which a target substrate is loaded and in which a dopant is implanted into the target substrate using a plasma of a gas which contains an element used as the dopant; a wall probe configured to measure a change in voltage corresponding to a density of charged particles in the plasma generated within the processing chamber; an OES (Optical Emission Spectrometer) configured to measure a light emission intensity of the dopant existing in the plasma; and a calculation unit configured to calculate a dose amount of the dopant implanted into the target substrate, based on a measurement result obtained at the wall probe and a measurement result obtained at the OES.

Abstract: A method and apparatus for doping a surface of a substrate with a dopant, with the dopant being for example phosphine or arsine. The doping is performed with a plasma formed primarily of an inert gas such as helium or argon, with a low concentration of the dopant. To provide conformal doping, preferably to form a monolayer of the dopant, the gas flow introduction location is switched during the doping process, with the gas mixture primarily introduced through a center top port in the process chamber during a first period of time followed by introduction of the gas mixture primarily through peripheral or edge injection ports for a second period of time, with the switching continuing in an alternating fashion as the plasma process.

Abstract: Disclosed is a plasma doping apparatus and a plasma doping method for performing a doping on a processing target substrate by implanting dopant ions into the processing target substrate. The plasma doping method includes a plasma doping processing performed on the processing target substrate held on a holding unit within a processing container by generating plasma using a microwave. The plasma doping method also includes an annealing processing which is performed on the processing target substrate which has been subjected to the plasma doping processing.