Patents by Inventor Yuusuke Honma

Yuusuke Honma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask blank, mask blank manufacturing method, transfer mask, and transfer mask manufacturing method
    Patent number: 8404407
    Abstract: According to certain embodiments, a mask blank for an electron beam writing is provided, capable of forming a resist pattern of a 3-dimensional topology through an one-time writing. The mask blank includes a substrate, a thin film formed on the substrate, and an electron beam resist film formed on the thin film. The electron beam resist film is made of a laminated film including at least a lower resist film and an upper resist film. The lower resist film and the upper resist film have different resist sensitivities with respect to an electron beam.
    Type: Grant
    Filed: December 20, 2010
    Date of Patent: March 26, 2013
    Assignee: Hoya Corporation
    Inventors: Masahiro Hashimoto, Hiroshi Shirotori, Yuusuke Honma, Mitsuhiro Shirakura
  • MASK BLANK, MASK BLANK MANUFACTURING METHOD, TRANSFER MASK, AND TRANSFER MASK MANUFACTURING METHOD
    Publication number: 20110183240
    Abstract: According to certain embodiments, a mask blank for an electron beam writing is provided, capable of forming a resist pattern of a 3-dimensional topology through an one-time writing. The mask blank includes a substrate, a thin film formed on the substrate, and an electron beam resist film formed on the thin film. The electron beam resist film is made of a laminated film including at least a lower resist film and an upper resist film. The lower resist film and the upper resist film have different resist sensitivities with respect to an electron beam.
    Type: Application
    Filed: December 20, 2010
    Publication date: July 28, 2011
    Applicant: HOYA CORPORATION
    Inventors: Masahiro Hashimoto, Hiroshi Shirotori, Yuusuke Honma, Mitsuhiro Shirakura
  • Magnet and method for manufacturing the same
    Patent number: 5062981
    Abstract: Disclosed is a magnet which is composed mainly of magnetic powders expressed by R-T-B (R is Nd or that partially replaced with rare earth elements and T is Fe or that partially replaced with transition metal.) and a chelate resin or a chelate resin in admixture with other synthetic resins. The magnetic has markedly improved resistance to deterioration caused by oxidation and corrosion.
    Type: Grant
    Filed: June 21, 1990
    Date of Patent: November 5, 1991
    Assignee: Kanegafuchi Kagaku Kogyo Kabushiki Kaisha
    Inventors: Takuji Nomura, Shogo Miki, Takashi Sakauchi, Yoshitaka Sato, Yuusuke Honma