Patents by Inventor Yuusuke UJIHARA

Yuusuke UJIHARA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Aluminum alloy film, method of producing the same, and thin film transistor
    Patent number: 11935936
    Abstract: [Object] It is an object of the present invention to provide an aluminum alloy film having excellent bending resistance and heat resistance, and a thin film transistor including the aluminum alloy film. [Solving Means] In order to achieve the above-mentioned object, an aluminum alloy film according to an embodiment of the present invention includes: an Al pure metal that includes at least one type of a first additive element selected from the group consisting of Zr, Sc, Mo, Y, Nb, and Ti. A content of the first additive element is 0.01 atomic % or more and 1.0 atomic % or less. Such an aluminum alloy film has excellent bending resistance and excellent heat resistance. Further, also etching can be performed on the aluminum alloy film.
    Type: Grant
    Filed: March 28, 2019
    Date of Patent: March 19, 2024
    Assignee: ULVAC, INC.
    Inventors: Yuusuke Ujihara, Motoshi Kobayashi, Yasuhiko Akamatsu, Tomohiro Nagata, Ryouta Nakamura, Junichi Nitta, Yasuo Nakadai
  • ALUMINUM ALLOY FILM, METHOD OF PRODUCING THE SAME, AND THIN FILM TRANSISTOR
    Publication number: 20210226028
    Abstract: [Object] It is an object of the present invention to provide an aluminum alloy film having excellent bending resistance and heat resistance, and a thin film transistor including the aluminum alloy film. [Solving Means] In order to achieve the above-mentioned object, an aluminum alloy film according to an embodiment of the present invention includes: an Al pure metal that includes at least one type of a first additive element selected from the group consisting of Zr, Sc, Mo, Y, Nb, and Ti. A content of the first additive element is 0.01 atomic % or more and 1.0 atomic % or less. Such an aluminum alloy film has excellent bending resistance and excellent heat resistance. Further, also etching can be performed on the aluminum alloy film.
    Type: Application
    Filed: March 28, 2019
    Publication date: July 22, 2021
    Inventors: Yuusuke UJIHARA, Motoshi KOBAYASHI, Yasuhiko AKAMATSU, Tomohiro NAGATA, Ryouta NAKAMURA, Junichi NITTA, Yasuo NAKADAI
  • ALUMINUM ALLOY TARGET AND METHOD OF PRODUCING THE SAME
    Publication number: 20210140032
    Abstract: [Object] It is an object of the present invention to provide an aluminum alloy target capable of forming an aluminum alloy film having excellent bending resistance and heat resistance, and a method of producing the aluminum alloy target. [Solving Means] In order to achieve the above-mentioned object, an aluminum alloy target according to an embodiment of the present invention includes: an Al pure metal that includes at least one type of a first additive element selected from the group consisting of Zr, Sc, Mo, Y, Nb, and Ti. A content of the first additive element is 0.01 atomic % or more and 1.0 atomic % or less. The aluminum alloy film formed using such an aluminum alloy target has excellent bending resistance and excellent heat resistance. Further, also etching can be performed on the aluminum alloy film.
    Type: Application
    Filed: March 28, 2019
    Publication date: May 13, 2021
    Inventors: Ryouta NAKAMURA, Tomohiro NAGATA, Yasuhiko AKAMATSU, Motoshi KOBAYASHI, Yuusuke UJIHARA, Yasuo NAKADAI, Junichi NITTA