Patents by Inventor Yuuta HASUMOTO

Yuuta HASUMOTO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230391696
    Abstract: The present disclosure provides a method for producing a reaction gas containing 1,1,2-trifluoroethane (R-143) and/or (E,Z)-1,2-difluoroethylene (R-1132(E,Z)) using a starting material that is easier to obtain than those used in conventional methods. Specifically, the present disclosure provides a method for producing a reaction gas containing 1,1,2-trifluoroethane (R-143) and/or (E,Z)-1,2-difluoroethylene (R-1132(E,Z)), the method comprising subjecting a starting material gas containing difluoromethane (R-32) to a reaction that involves thermal decomposition at a pressure of 0.6 MPaG or more and 2.0 MPaG or less and a temperature of 600° C. or more and 1000° C. or less, thereby obtaining the reaction gas.
    Type: Application
    Filed: June 14, 2023
    Publication date: December 7, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya TAKAKUWA, Tomo OTSUKA, Atsushi NOGUCHI, Yuuta HASUMOTO
  • Publication number: 20230027989
    Abstract: This disclosure relates to an analysis method for analyzing a chemical reaction from one or more starting materials, comprising a preparation step S1 of preparing a reaction network diagram indicating the one or more starting materials, at least part of one or more intermediate products and one or more final products generated from the chemical reaction, and reaction pathways of the chemical reaction, and a prediction step S2 of predicting the reaction rate in each reaction pathway using an artificial intelligence algorithm.
    Type: Application
    Filed: September 29, 2022
    Publication date: January 26, 2023
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya TAKAKUWA, Atsushi NOGUCHI, Yuuta HASUMOTO, Satoru YOSHIZAKI, Hiroyuki MURATA, Tsuneyoshi IWASAKI
  • Publication number: 20230014347
    Abstract: This disclosure provides a method for producing a hydrofluoroolefin (HFO) or fluoroolefin (FO), which is a target compound, with high selectivity, without requiring a high temperature and a catalyst in a synthesis process of the target compound. Specifically, the present disclosure provides a method for producing a hydrofluoroolefin or fluoroolefin having two, three, or four carbon atoms, comprising irradiating at least one starting material compound selected from the group consisting of hydrofluorocarbons having one or two carbon atoms and hydrofluoroolefin As having two or three carbon atoms with ionizing radiation and/or an ultraviolet ray having a wavelength of 300 nm or less, with the proviso that when the at least one starting material compound is the hydrofluoroolefin A, the resulting hydrofluoroolefin is different from the hydrofluoroolefin A.
    Type: Application
    Filed: August 25, 2022
    Publication date: January 19, 2023
    Applicants: DAIKIN INDUSTRIES, LTD., OSAKA UNIVERSITY
    Inventors: Yuuta HASUMOTO, Tatsuya TAKAKUWA, Osamu YAMAMOTO, Hideki NAKAYA, Masao NOUMI, Kazuyuki SATOU, Kohei YAMANOI, Akihiro OSHIMA
  • Patent number: 11465955
    Abstract: The present disclosure provides a method for producing a reaction gas containing R-1132(E) with selectivity higher than that of known methods. Specifically, the present disclosure provides a method for producing a reaction gas containing (E)-1,2-difluoroethylene (R-1132(E)), (1) the method comprising a step of subjecting a starting material gas containing one or more fluoromethanes selected from the group consisting of chlorodifluoromethane (R-22), difluoromethane (R-32), and fluoromethane (R-41) to a reaction that involves thermal decomposition to obtain the reaction gas, and (2) the starting material gas having a water vapor content of 1 volume % or less.
    Type: Grant
    Filed: January 14, 2021
    Date of Patent: October 11, 2022
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya Takakuwa, Osamu Yamamoto, Katsuki Fujiwara, Kei Kuramoto, Yuuta Hasumoto
  • Patent number: 11155507
    Abstract: The present disclosure provides a method for producing a reaction gas containing R-1132(E) with selectivity higher than that of known methods. Specifically, the present disclosure provides a method for producing a reaction gas containing (E)-1,2-difluoroethylene (R-1132(E)), (1) the method comprising a step of subjecting a starting material gas containing one or more fluoromethanes selected from the group consisting of chlorodifluoromethane (R-22), difluoromethane (R-32), and fluoromethane (R-41) to a reaction that involves thermal decomposition to obtain the reaction gas, and (2) the starting material gas having a water vapor content of 1 volume % or less.
    Type: Grant
    Filed: December 22, 2020
    Date of Patent: October 26, 2021
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya Takakuwa, Osamu Yamamoto, Katsuki Fujiwara, Kei Kuramoto, Yuuta Hasumoto
  • Patent number: 11124468
    Abstract: The present disclosure provides a method for producing a reaction gas containing R-1132(E) with selectivity higher than that of known methods. Specifically, the present disclosure provides a method for producing a reaction gas containing (E)-1,2-difluoroethylene (R-1132(E)), (1) the method comprising a step of subjecting a starting material gas containing one or more fluoromethanes selected from the group consisting of chlorodifluoromethane (R-22), difluoromethane (R-32), and fluoromethane (R-41) to a reaction that involves thermal decomposition to obtain the reaction gas, and (2) the starting material gas having a water vapor content of 1 volume % or less.
    Type: Grant
    Filed: December 22, 2020
    Date of Patent: September 21, 2021
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya Takakuwa, Osamu Yamamoto, Katsuki Fujiwara, Kei Kuramoto, Yuuta Hasumoto
  • Publication number: 20210130268
    Abstract: The present disclosure provides a method for producing a reaction gas containing R-1132(E) with selectivity higher than that of known methods. Specifically, the present disclosure provides a method for producing a reaction gas containing (E)-1,2-difluoroethylene (R-1132(E)), (1) the method comprising a step of subjecting a starting material gas containing one or more fluoromethanes selected from the group consisting of chlorodifluoromethane (R-22), difluoromethane (R-32), and fluoromethane (R-41) to a reaction that involves thermal decomposition to obtain the reaction gas, and (2) the starting material gas having a water vapor content of 1 volume % or less.
    Type: Application
    Filed: January 14, 2021
    Publication date: May 6, 2021
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya TAKAKUWA, Osamu YAMAMOTO, Katsuki FUJIWARA, Kei KURAMOTO, Yuuta HASUMOTO
  • Publication number: 20210107850
    Abstract: The present disclosure provides a method for producing a reaction gas containing R-1132(E) with selectivity higher than that of known methods. Specifically, the present disclosure provides a method for producing a reaction gas containing (E)-1,2-difluoroethylene (R-1132(E)), (1) the method comprising a step of subjecting a starting material gas containing one or more fluoromethanes selected from the group consisting of chlorodifluoromethane (R-22), difluoromethane (R-32), and fluoromethane (R-41) to a reaction that involves thermal decomposition to obtain the reaction gas, and (2) the starting material gas having a water vapor content of 1 volume % or less.
    Type: Application
    Filed: December 22, 2020
    Publication date: April 15, 2021
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya TAKAKUWA, Osamu YAMAMOTO, Katsuki FUJIWARA, Kei KURAMOTO, Yuuta HASUMOTO