Patents by Inventor Yuuzi Kosuga

Yuuzi Kosuga has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Negative photoresist composition comprising a photosensitizer of a polyhalogen compound
    Patent number: 5128231
    Abstract: A photoresist composition is disclosed. The photoresist composition comprises a base resin, a photosensitizer, and a solvent. The base resin comprises polyhydroxystyrene represented by the following structural formula (I): ##STR1## (wherein k is a positive integer). The photosensitizer comprises a polyhalogen compound(s). The photoresist composition of the present invention has dry etching resistance characteristics comparable to those of conventional positive novolak photoresist compositions and can form a resist pattern with a high resolution and vertical sidewall profiles. This makes microprocessing possible.
    Type: Grant
    Filed: November 29, 1991
    Date of Patent: July 7, 1992
    Assignees: Oki Electric Industry Co., Ltd., Fuji Chemicals Industrial Co., Ltd.
    Inventors: Toshio Itoh, Miwa Sakata, Yoshio Yamashita, Takateru Asano, Yuuzi Kosuga, Hiroshi Umehara