Abstract: A coated cutting tool includes a substrate and a hard film on coated on the substrate. The hard film contains a complex nitride of Al and Cr. The hard film includes aggregates of columnar grains grown on the substrate along the thickness of the film. The nitride has an Al content of 60 atom % or more, a Cr content of 10 atom % or more, and a total content of Al and Cr of 90 atom % or more relative to the total amount of metal and metalloid elements. The complex nitride has the highest peak intensity assigned to crystal plane (311) of an fcc structure in X-ray diffractometry. In the hard film, the ratio of an X-ray diffraction intensity of plane (311) to the intensities of the other planes is 1.30 or more. A method and a system are also provided for manufacturing the coated cutting tool by chemical vapor deposition.

Abstract: A coated cutting tool includes a substrate and a hard film on coated on the substrate. The hard film contains a complex nitride of Al and Cr. The hard film includes aggregates of columnar grains grown on the substrate along the thickness of the film. The nitride has an Al content of 60 atom % or more, a Cr content of 10 atom % or more, and a total content of Al and Cr of 90 atom % or more relative to the total amount of metal and metalloid elements. The complex nitride has the highest peak intensity assigned to crystal plane (311) of an fcc structure in X-ray diffractometry. In the hard film, the ratio of an X-ray diffraction intensity of plane (311) to the intensities of the other planes is 1.30 or more. A method and a system are also provided for manufacturing the coated cutting tool by chemical vapor deposition.

Abstract: A hard coating comprising a lower layer formed by an fcc-based titanium aluminum nitride coating, and an upper layer formed by an aluminum nitride coating having an hcp crystal system, the upper layer having a columnar crystal structure, the columnar crystals having an average transverse cross section diameter of 0.05-0.6 ?m, and a ratio of an X-ray diffraction peak value Ia(002) of (002) planes to an X-ray diffraction peak value Ia(100) of (100) planes in the upper layer meeting the relation of Ia(002)/Ia(100)?6.

Abstract: A titanium aluminum nitride coating having a columnar crystal structure, which is formed on a substrate, comprises high-Al TiAlN having an fcc structure, which has a composition represented by (Tix1, Aly1)N, wherein x1 and y1 are numbers meeting x1=0.005-0.1, and y1=0.995-0.9 by atomic ratio, and network-like, high-Ti TiAlN having an fcc structure, which has a composition represented by (Tix2, Aly2)N, wherein x2 and y2 are numbers meeting x2=0.5-0.9, and y2=0.5-0.1 by atomic ratio; the high-Al TiAlN being surrounded by the network-like, high-Ti TiAlN.

Abstract: A hard coating comprising a lower layer formed by an fcc-based titanium aluminum nitride coating, and an upper layer formed by an aluminum nitride coating having an hcp crystal system, the upper layer having a columnar crystal structure, the columnar crystals having an average transverse cross section diameter of 0.05-0.6 ?m, and a ratio of an X-ray diffraction peak value Ia(002) of (002) planes to an X-ray diffraction peak value Ia(100) of (100) planes in the upper layer meeting the relation of Ia(002)/Ia(100)?6.

Abstract: An arc-ion-plated hard coating having a composition represented by (AlxTiyWz)aN(1-a-b)Ob, wherein x, y, z, a and b are numbers meeting by atomic ratio 0.6?x?0.8, 0.05?y?0.38, 0.02?z?0.2, x+y+z=1, 0.2?a?0.8, and 0.02?b?0.10), and having W—O bonds with substantially no Al—O bonds when identified by X-ray photoelectron spectroscopy, and having only a NaCl-type structure in an X-ray diffraction pattern.

Abstract: A hard coating having a composition represented by (AlxTiyMz)aN(1-a-b)Ob, wherein M is at least one element of Cr and Nb, and x, y, z, a and b are numbers meeting by atomic ratio 0.6?x?0.8, 0.05?y?0.38, 0.02?z?0.2, x+y+z=1, 0.2?a?0.8, and 0.02?b?0.10, respectively, having M-O bonds without Al—O bonds exceeding an inevitable impurity level as a bonding state identified by X-ray photoelectron spectroscopy, and having only an NaCl-type structure in its X-ray diffraction pattern.

Abstract: A titanium aluminum nitride coating having a columnar crystal structure, which is formed on a substrate, comprises high-Al TiAlN having an fcc structure, which has a composition represented by (Tix1, Aly1)N, wherein x1 and y1 are numbers meeting x1=0.005-0.1, and y1=0.995-0.9 by atomic ratio, and network-like, high-Ti TiAlN having an fcc structure, which has a composition represented by (Tix2, Aly2)N, wherein x2 and y2 are numbers meeting x2=0.5-0.9, and y2=0.5-0.1 by atomic ratio; the high-Al TiAlN being surrounded by the network-like, high-Ti TiAlN.

Abstract: An arc-ion-plated hard coating having a composition represented by (AlxTiyWz)aN(1-a-b)Ob, wherein x, y, z, a and b are numbers meeting by atomic ratio 0.6?x?0.8, 0.05?y?0.38, 0.02?z?0.2, x+y+z=1, 0.2?a?0.8, and 0.02?b?0.10), and having W—O bonds with substantially no Al—O bonds when identified by X-ray photoelectron spectroscopy, and having only a NaCl-type structure in an X-ray diffraction pattern.

Abstract: A hard-coated tool comprising a titanium carbonitride layer formed directly on a WC-based cemented carbide substrate by a chemical vapor deposition method; the titanium carbonitride layer having a composition comprising 74-81% by mass of titanium, 13-16% by mass of carbon and 6-10% by mass of nitrogen; the titanium carbonitride layer having a structure comprising columnar crystal grains having an average transverse cross section diameter of 0.01-0.22 ?m; a layer of W diffused from the substrate to the titanium carbonitride layer having an average thickness of 30-200 nm; and the titanium carbonitride layer having an X-ray diffraction peak of a (422) plane in a 2? range of 122.7-123.7°.

Abstract: A hard-coated member comprising a substrate made of cemented carbide or high-speed steel and a titanium carbonitride layer formed on the substrate by a chemical vapor deposition method, the titanium carbonitride layer comprising first to third layers each having a columnar crystal structure in this order from the side of the substrate, the second layer being smaller than the first layer in carbon concentration, and the third layer being smaller than the second layer in carbon concentration, and an indexable rotary tool comprising it. The first layer is formed by using a starting material gas comprising a TiCl4 gas, an N2 gas, a C2-C5 hydrocarbon gas and an H2 gas, the second layer is formed by using a starting material gas comprising a TiCl4 gas, an N2 gas, an organic cyanide gas, a C2-C5 hydrocarbon gas, and an H2 gas, and the third layer is formed by using a starting material gas comprising a TiCl4 gas, an N2 gas, an organic cyanide gas, whose amount is smaller than in the second layer, and an H2 gas.

Abstract: A hard-coated tool comprising a titanium carbonitride layer formed directly on a WC-based cemented carbide substrate by a chemical vapor deposition method; the titanium carbonitride layer having a composition comprising 74-81% by mass of titanium, 13-16% by mass of carbon and 6-10% by mass of nitrogen; the titanium carbonitride layer having a structure comprising columnar crystal grains having an average transverse cross section diameter of 0.01-0.22 ?m; a layer of W diffused from the substrate to the titanium carbonitride layer having an average thickness of 30-200 nm; and the titanium carbonitride layer having an X-ray diffraction peak of a (422) plane in a 2? range of 122.7-123.7°.

Abstract: A hard-coated member comprising a substrate made of cemented carbide or high-speed steel and a titanium carbonitride layer formed on the substrate by a chemical vapor deposition method, the titanium carbonitride layer comprising first to third layers each having a columnar crystal structure in this order from the side of the substrate, the second layer being smaller than the first layer in carbon concentration, and the third layer being smaller than the second layer in carbon concentration, and an indexable rotary tool comprising it. The first layer is formed by using a starting material gas comprising a TiCl4 gas, an N2 gas, a C2-C5 hydrocarbon gas and an H2 gas, the second layer is formed by using a starting material gas comprising a TiCl4 gas, an N2 gas, an organic cyanide gas, a C2-C5 hydrocarbon gas, and an H2 gas, and the third layer is formed by using a starting material gas comprising a TiCl4 gas, an N2 gas, an organic cyanide gas, whose amount is smaller than in the second layer, and an H2 gas.