Patents by Inventor Yuval Shai

Yuval Shai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11673328
    Abstract: Methods that prevent oxygen inhibition of a light-initiated polymerization reaction by purging the oxygen from reaction surfaces using inert gas flow. In some embodiments, oxygen is purged using a gas diffusion system that introduces, via a diffuser, an inert gas into a workspace between a UV light source and a UV curable layer of a workpiece. The diffuser may be made of a transparent or diffuse material to allow UV light to pass through it, and includes an array of micro-holes for the gas to pass through towards the workpiece. The inert gas flow may be heated to maintain a desired and uniform reaction temperature.
    Type: Grant
    Filed: November 2, 2021
    Date of Patent: June 13, 2023
    Assignee: IO TECH GROUP LTD.
    Inventors: Michael Zenou, Ziv Gilan, Daniel Liptz, Yuval Shai
  • Patent number: 11590701
    Abstract: Systems and methods that prevent oxygen inhibition of a light-initiated polymerization reaction by forcing the oxygen away from the reaction surfaces. In some embodiments, oxygen is purged by bringing a planarizing surface (e.g., a thin transparent film and/or a transparent planar surface) into contact with a layer of UV curable material disposed on a workpiece and then moving the planarizing surface away from the workpiece one the UV material is cured.
    Type: Grant
    Filed: August 11, 2022
    Date of Patent: February 28, 2023
    Assignee: IO Tech Group Ltd.
    Inventors: Michael Zenou, Ziv Gilan, Daniel Liptz, Yuval Shai
  • Publication number: 20220379560
    Abstract: Systems and methods that prevent oxygen inhibition of a light-initiated polymerization reaction by forcing the oxygen away from the reaction surfaces. In some embodiments, oxygen is purged by bringing a planarizing surface (e.g., a thin transparent film and/or a transparent planar surface) into contact with a layer of UV curable material disposed on a workpiece and then moving the planarizing surface away from the workpiece one the UV material is cured.
    Type: Application
    Filed: August 11, 2022
    Publication date: December 1, 2022
    Inventors: Michael Zenou, Ziv Gilan, Daniel Liptz, Yuval Shai
  • Patent number: 11453164
    Abstract: Systems and methods that prevent oxygen inhibition of a light-initiated polymerization reaction by forcing the oxygen away from the reaction surfaces. In some embodiments, oxygen is purged by bringing a planarizing surface (e.g., a thin transparent film and/or a transparent planar surface) into contact with a layer of UV curable material disposed on a workpiece and then moving the planarizing surface away from the workpiece once the UV material is cured.
    Type: Grant
    Filed: December 4, 2019
    Date of Patent: September 27, 2022
    Assignee: IO Tech Group Ltd.
    Inventors: Michael Zenou, Ziv Gilan, Daniel Liptz, Yuval Shai
  • Publication number: 20220055302
    Abstract: Methods that prevent oxygen inhibition of a light-initiated polymerization reaction by purging the oxygen from reaction surfaces using inert gas flow. In some embodiments, oxygen is purged using a gas diffusion system that introduces, via a diffuser, an inert gas into a workspace between a UV light source and a UV curable layer of a workpiece. The diffuser may be made of a transparent or diffuse material to allow UV light to pass through it, and includes an array of micro-holes for the gas to pass through towards the workpiece. The inert gas flow may be heated to maintain a desired and uniform reaction temperature.
    Type: Application
    Filed: November 2, 2021
    Publication date: February 24, 2022
    Inventors: Michael Zenou, Ziv Gilan, Daniel Liptz, Yuval Shai
  • Patent number: 11203154
    Abstract: Systems and methods that prevent oxygen inhibition of a light-initiated polymerization reaction by purging the oxygen from reaction surfaces using inert gas flow. In some embodiments, oxygen is purged using a gas diffusion system that introduces, via a diffuser, an inert gas into a workspace between a UV light source and a UV curable layer of a workpiece. The diffuser may be made of a transparent or diffuse material to allow UV light to pass through it, and includes an array of micro-holes for the gas to pass through towards the workpiece. The inert gas flow may be heated to maintain a desired and uniform reaction temperature.
    Type: Grant
    Filed: December 4, 2019
    Date of Patent: December 21, 2021
    Assignee: IO Tech Group Ltd.
    Inventors: Michael Zenou, Ziv Gilan, Daniel Liptz, Yuval Shai
  • Publication number: 20200180190
    Abstract: Systems and methods that prevent oxygen inhibition of a light-initiated polymerization reaction by forcing the oxygen away from the reaction surfaces. In some embodiments, oxygen is purged by bringing a planarizing surface (e.g., a thin transparent film and/or a transparent planar surface) into contact with a layer of UV curable material disposed on a workpiece and then moving the planarizing surface away from the workpiece one the UV material is cured.
    Type: Application
    Filed: December 4, 2019
    Publication date: June 11, 2020
    Inventors: Michael Zenou, Ziv Gilan, Daniel Liptz, Yuval Shai
  • Publication number: 20200180225
    Abstract: Systems and methods that prevent oxygen inhibition of a light-initiated polymerization reaction by purging the oxygen from reaction surfaces using inert gas flow. In some embodiments, oxygen is purged using a gas diffusion system that introduces, via a diffuser, an inert gas into a workspace between a UV light source and a UV curable layer of a workpiece. The diffuser may be made of a transparent or diffuse material to allow UV light to pass through it, and includes an array of micro-holes for the gas to pass through towards the workpiece. The inert gas flow may be heated to maintain a desired and uniform reaction temperature.
    Type: Application
    Filed: December 4, 2019
    Publication date: June 11, 2020
    Inventors: Michael Zenou, Ziv Gilan, Daniel Liptz, Yuval Shai