Abstract: To provide a glass plate which has a low B2O3 content and which can be used as a glass plate for e.g. an LCD panel. A glass plate which comprises, as a glass matrix composition as represented by mass % based on oxide, from 53 to 74 mass % of SiO2, from 15 to 23 mass % of Al2O3, from 0 to 3 mass % of B2O3, from 2 to 17 mass % of MgO, from 0 to 12 mass % of CaO, from 0 to 6 mass % of SrO, from 6 to 28 mass % of MgO+CaO+SrO, from 0 to 9 mass % of Na2O, from 0 to 6 mass % of K2O and from 0.8 to 11 mass % of Na2O+K2O, contains from 100 to 500 ppm of SO3, has an average coefficient of thermal expansion from 50 to 350° C. of at most 60×10?7/° C., and has a strain point of at least 600° C.

Abstract: [Problems] To provide an efficient process for producing an optically active epoxy compound. [Means For Solving Problems] The process for producing an optically active epoxy compound comprises asymmetrically epoxidizing an unsaturated compound with an oxidizing agent in the presence of an optically active titanium-salen complex, an optically active titanium-salalen complex or an optically active titanium-salan complex, with addition of a buffering agent or a buffer solution. The process can inhibit catalyst degradation, reduce the amount of the catalyst used in the reaction, and inhibit a by-product, compared with the prior art, and can provide an optically active epoxy compound in high chemical yield and optical yield and with high quality, and therefore is an industrially useful process.