Patents by Inventor Yuzi Shibasaki

Yuzi Shibasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RESIN COMPOSITION, CURED PRODUCT AND OPTICAL PARTS
    Publication number: 20100137490
    Abstract: It is provided for a resin composition including (A) at least one polyamic acid having the structure represented by the following formula (1): wherein R1 is independently an alkyl group having 1 to 3 carbon atoms or a cyano group; a is independently an integer of 0 to 4; R is a tetravalent organic group; n is an integer of 1 to 4; and m is an integer of 1 to 100,000, and (E) an organic solvent.
    Type: Application
    Filed: January 27, 2010
    Publication date: June 3, 2010
    Applicants: Tokyo Institute of Technology, JSR CORPORATION
    Inventors: Mitsuru Ueda, Shinji Ando, Jin-gang Liu, Yuzi Shibasaki, Yasuhiro Nakamura, Shuichi Sugawara, Miwa Ariyuki, Yuichi Eriyama, Keisuke Kuriyama, Hideaki Takase
  • Resin composition, cured product and optical parts
    Patent number: 7714096
    Abstract: It is provided for a resin composition including (A) at least one polyamic acid having the structure represented by the following formula (1): wherein R1 is independently an alkyl group having 1 to 3 carbon atoms or a cyano group; a is independently an integer of 0 to 4; R is a tetravalent organic group; n is an integer of 1 to 4; and m is an integer of 1 to 100,000, and (E) an organic solvent.
    Type: Grant
    Filed: March 28, 2008
    Date of Patent: May 11, 2010
    Assignees: Tokyo Institute of Technology, JSR Corporation
    Inventors: Mitsuru Ueda, Shinji Ando, Jin-gang Liu, Yuzi Shibasaki, Yasuhiro Nakamura, Shuichi Sugawara, Miwa Ariyuki, Yuichi Eriyama, Keisuke Kuriyama, Hideaki Takase
  • RESIN COMPOSITION, CURED PRODUCT AND OPTICAL PARTS
    Publication number: 20080255284
    Abstract: It is provided for a resin composition including (A) at least one polyamic acid having the structure represented by the following formula (1): wherein R1 is independently an alkyl group having 1 to 3 carbon atoms or a cyano group; a is independently an integer of 0 to 4; R is a tetravalent organic group; n is an integer of 1 to 4; and m is an integer of 1 to 100,000, and (E) an organic solvent.
    Type: Application
    Filed: March 28, 2008
    Publication date: October 16, 2008
    Applicants: Tokyo Institute of Technology, JSR CORPORATION
    Inventors: Mitsuru Ueda, Shinji Ando, Jin-gang Liu, Yuzi Shibasaki, Yasuhiro Nakamura, Shuichi Sugawara, Miwa Ariyuki, Yuichi Eriyama, Keisuke Kuriyama, Hideaki Takase
  • Calixresorcinarene compounds, photoresist base materials, and compositions thereof
    Publication number: 20070190451
    Abstract: A calixresorcinarene compound shown by the following formula (1), wherein R individually represents a hydrogen atom, a 1-tetrahydropyranyl group, a 1-tetrahydrofuranyl group, or one or more organic groups selected from the group consisting of the organic groups shown by the following formulas, wherein n individually represents an integer of 1 to 50, provided that a compound in which R is selected only from a hydrogen atom, a 1-tetrahydropyranyl group, and a 1-tetrahydrofuranyl group is excluded.
    Type: Application
    Filed: April 1, 2005
    Publication date: August 16, 2007
    Applicant: Idemitsu Kosan Co., Ltd.
    Inventors: Hirotoshi Ishii, Takanori Owada, Yuzi Shibasaki, Mitsuru Ueda