Patents by Inventor Yuzo Katsuki

Yuzo Katsuki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Wafer defect inspection machine having a dual illumination system
    Patent number: 6867424
    Abstract: A low-cost defect inspection machine for semiconductor wafers that can detect various defects has been disclosed and comprises an optical system that projects a pattern image, an image sensor and a processing circuit that processes the image signal and detects defect portions, wherein the optical system comprises an objective lens, a bright field illumination system that has a semi-transparent mirror and irradiates a specimen through the objective lens with the illumination light reflected by the semi-transparent mirror in the range that includes the optical axis of the objective lens, and a dark field illumination system that has a reflecting mirror provided in the portion except for the projection path of the objective lens and irradiates a specimen through the objective lens with the illumination light reflected by the reflecting mirror.
    Type: Grant
    Filed: November 15, 2002
    Date of Patent: March 15, 2005
    Assignee: Tokyo Seimitsu Co., Ltd.
    Inventors: Toshirou Kurosawa, Yuzo Katsuki, Jun Takebayashi
  • Wafer defect inspection machine
    Publication number: 20030094586
    Abstract: A low-cost defect inspection machine for semiconductor wafers that can detect various defects has been disclosed and comprises an optical system that projects a pattern image, an image sensor and a processing circuit that processes the image signal and detects defect portions, wherein the optical system comprises an objective lens, a bright field illumination system that has a semi-transparent mirror and irradiates a specimen through the objective lens with the illumination light reflected by the semi-transparent mirror in the range that includes the optical axis of the objective lens, and a dark field illumination system that has a reflecting mirror provided in the portion except for the projection path of the objective lens and irradiates a specimen through the objective lens with the illumination light reflected by the reflecting mirror.
    Type: Application
    Filed: November 15, 2002
    Publication date: May 22, 2003
    Inventors: Toshirou Kurosawa, Yuzo Katsuki, Jun Takebayashi