Patents by Inventor Yuzo Morioka

Yuzo Morioka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9005500
    Abstract: When extrusion of a molten resin by means of an extruder is started, a simple polyetherimide resin is melt extruded from a lip portion 7a of a T-die 7, and a film of the simple polyetherimide resin is molded. The molding material is then switched to a resin composition including the polyetherimide resin and a fluorine resin and then a film of the resin composition is continuously extruded and molded from the T-die 7. Having been covered with a very thin film 8a of the simple polyetherimide resin, on a flow passage face of the lip portion 7a of the T-die 7, a resin composition layer 8b including a polyetherimide resin and a fluorine resin, which has affinity with the film 8a, is then formed at a center part.
    Type: Grant
    Filed: December 16, 2010
    Date of Patent: April 14, 2015
    Assignee: Shin-Etsu Polymer Co., Ltd.
    Inventors: Michimasa Ote, Takashi Gonda, Junya Ishida, Kenro Takizawa, Kazuhiro Suzuki, Yuzo Morioka
  • Patent number: 8524133
    Abstract: The present invention provides a method for manufacturing a film for a film capacitor making it possible to produce a film for a film capacitor which has a thickness of 10 ?m or less and which is excellent in a heat resistance and a voltage resistance at a high thickness accuracy by using a polyetherimide resin and provides as well a film for a film capacitor.
    Type: Grant
    Filed: November 1, 2010
    Date of Patent: September 3, 2013
    Assignee: Shin-Etsu Polymer Co., Ltd
    Inventors: Kenro Takizawa, Yuzo Morioka, Kazuhiro Suzuki, Michimasa Ote
  • Patent number: 8394183
    Abstract: An asymmetric membrane contains a porous layer and a dense layer adjacent thereto. The porous layer and the dense layer are formed of a polymeric material. The porous layer and/or dense layer contains a filler. The amount of the filler is 11 parts by mass or more per 100 parts by mass of the polymeric material contained in the asymmetric membrane.
    Type: Grant
    Filed: October 27, 2008
    Date of Patent: March 12, 2013
    Assignees: Shin-Etsu Polymer Co., Ltd., Denso Corporation, Shin-Etsu Chemical Co., Ltd.
    Inventors: Junya Ishida, Mitsuaki Negishi, Yuzo Morioka, Mika Kawakita, Katsunori Iwase, Manabu Maeda, Masahiko Minemura, Mamoru Hagiwara
  • Publication number: 20110299222
    Abstract: The present invention provides a method for manufacturing a film for a film capacitor in which a film can be prepared by melt extrusion molding in a thin film having a thickness of 10 ?m or less and in which a cost can be cut by simplifying a manufacturing step thereof and a film for a film capacitor. It is a method for manufacturing a film for a film capacitor comprising the steps of charging a melt extrusion molding equipment 10 with a molding material 1 to mold a film 20 for a film capacitor by extruding from a dice 12, interposing the above extruded and molded film 20 for a film capacitor between a pressing roll 31 and a metal roll 32 to cool it and winding up the cooled film 20 for a film capacitor having a thickness of 10 ?m or less in order on a winding tube 41 of a winding device 40, wherein the molding material 1 is prepared by adding a fluorocarbon resin to a PEI resin having a glass transition point of 200° C.
    Type: Application
    Filed: December 29, 2010
    Publication date: December 8, 2011
    Applicant: SHIN-ETSU POLYMER CO., LTD.
    Inventors: Kazuhiro SUZUKI, Takashi Gonda, Norimasa Shinada, Yuzo Morioka
  • Publication number: 20110151187
    Abstract: When extrusion of a molten resin by means of an extruder is started, a simple polyetherimide resin is melt extruded from a lip portion 7a of a T-die 7, and a film of the simple polyetherimide resin is molded. The molding material is then switched to a resin composition including the polyetherimide resin and a fluorine resin and then a film of the resin composition is continuously extruded and molded from the T-die 7. Having been covered with a very thin film 8a of the simple polyetherimide resin, on a flow passage face of the lip portion 7a of the T-die 7, a resin composition layer 8b including a polyetherimide resin and a fluorine resin, which has affinity with the film 8a, is then formed at a center part.
    Type: Application
    Filed: December 16, 2010
    Publication date: June 23, 2011
    Applicant: SHIN-ETSU POLYMER CO., LTD.
    Inventors: Michimasa OTE, Takashi Gonda, Junya Ishida, Kenro Takizawa, Kazuhiro Suzuki, Yuzo Morioka
  • Publication number: 20110117348
    Abstract: The present invention provides a method for manufacturing a film for a film capacitor making it possible to produce a film for a film capacitor which has a thickness of 10 ?m or less and which is excellent in a heat resistance and a voltage resistance at a high thickness accuracy by using a polyetherimide resin and provides as well a film for a film capacitor.
    Type: Application
    Filed: November 1, 2010
    Publication date: May 19, 2011
    Applicant: SHIN-ETSU POLYMER CO., LTD.
    Inventors: Kenro TAKIZAWA, Yuzo Morioka, Kazuhiro Suzuki, Michimasa Ote
  • Publication number: 20100294132
    Abstract: Disclosed is an asymmetric membrane having a porous layer and a dense layer adjacent to the porous layer. The porous layer and the dense layer are made of a polymer material. The porous layer and/or the dense layer contains a filler.
    Type: Application
    Filed: October 27, 2008
    Publication date: November 25, 2010
    Applicants: SHIN-ETSU POLYMER CO., LTD., DENSO CORPORATION, SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Junya Ishida, Mitsuaki Negishi, Yuzo Morioka, Mika Kawakita, Katsunori Iwase, Manabu Maeda, Masahiko Minemura, Mamoru Hagiwara