Patents by Inventor Yuzo Shimazaki

Yuzo Shimazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Surface-treating agent adapted for intermediate products of a semiconductor device
    Patent number: 4339340
    Abstract: A surface-treating agent formed of an aqueous solution containing 0.01 to 20% by weight of trialkyl(hydroxyalkyl) ammonium hydroxide. The treating agent is adapted to be used for the effective removal of organic and inorganic contaminants deposited on the surface of intermediate semiconductor products obtained in the respective steps of manufacturing a semiconductor device and the efficient etching of a metal layer used as wiring. Further, it can be used for the elimination of those portions of a positive working photoresist film coated on the surface of the intermediate semiconductor products which are and are not exposed to a light by controlling its concentration.
    Type: Grant
    Filed: December 5, 1980
    Date of Patent: July 13, 1982
    Assignee: Tokyo Shibaura Electric Co., Ltd.
    Inventors: Hisashi Muraoka, Masafumi Asano, Taizo Ohashi, Yuzo Shimazaki
  • Radiation-sensitive positive resist
    Patent number: 4259407
    Abstract: A radiation-sensitive positive resist which is prepared from a homogeneous polymer of any one of the various forms of halogenated alkyl .alpha.-halogenated acrylate expressed by the general structural formula: ##STR1## where: X = fluorine, chlorine or bromineR = alkyl group in which one or more hydrogen atoms are substituted by the corresponding number of fluorine atoms, or aryl group in which said substitution takes place, or alkoxy group in which said substitution takes place, or a copolymer of two or more of the monomers expressed by said general structural formula or a copolymer of any one of said monomers and any one of the different forms of vinyl monomer from those expressed by said general structural formula.
    Type: Grant
    Filed: July 25, 1979
    Date of Patent: March 31, 1981
    Assignee: VLSI Technology Research Association
    Inventors: Tsukasa Tada, Yuzo Shimazaki, Masanobu Kohda, Hirohisa Kato, Hideo Saeki
  • Surface-treating agent adapted for intermediate products of a semiconductor device
    Patent number: 4239661
    Abstract: A surface-treating agent formed of an aqueous solution containing 0.01 to 20% by weight of trialkyl(hydroxyalkyl) ammonium hydroxide. The treating agent is adapted to be used for the effective removal of organic and inorganic contaminants deposited on the surface of intermediate semiconductor products obtained in the respective steps of manufacturing a semiconductor device and the efficient etching of a metal layer used as wiring. Further, it can be used for the elimination of those portions of a positive working photoresist film coated on the surface of the intermediate semiconductor products which are and are not exposed to a light by controlling its concentration.
    Type: Grant
    Filed: July 21, 1978
    Date of Patent: December 16, 1980
    Assignee: Tokyo Shibaura Electric Co., Ltd.
    Inventors: Hisashi Muraoka, Masafumi Asano, Taizo Ohashi, Yuzo Shimazaki