Abstract: Provided is a liquid-repellent agent which enables the production of partition walls that are less susceptible to reduction in liquid repellency even when subjected to oxygen plasma treatment or UV-ozone treatment. A liquid-repellent agent (A) of the present invention contains a polymer containing: a polymerization unit (a1) derived from a hydrocarbon having an alkyl group in which at least one hydrogen atom is replaced with a fluorine atom and which may contain an ether-oxygen atom; and one or two or more types of polymerization units (a2) other than the polymerization unit (a1), wherein the number of ethylenically unsaturated double bonds in the polymerization units (a1) and (a2) is 3 or greater.

Abstract: The present disclosure aims to provide a photosensitive resin composition that can improve the surface roughness of a fluororesin suitable for use as a partition wall material. The present disclosure relates to a photosensitive resin composition containing: a fluororesin having a fluorine atom content of 20 to 60 mass %; a fluorine-containing surface modifier including a fluorine compound having a weight average molecular weight (Mw) of 1,000 to 15,000; a base resin; a solvent; and a photopolymerization initiator.

Abstract: The present disclosure aims to provide a novel surface modifier that can be introduced into a photosensitive resin composition to improve the surface roughness of a fluororesin suitable for use as a partition wall material. The present disclosure relates to a surface modifier containing a fluororesin (A) having a structure represented by the following formula (1): wherein each Ra independently represents a C1-C6 linear, C3-C6 branched, or C3-C6 cyclic alkyl group or a fluorine atom, and any number of hydrogen atoms in the alkyl group are replaced with fluorine atoms.

Abstract: Provided is a method for producing a fluorine-containing polymer with little lot-to-lot variation in weight average molecular weight.

Abstract: An object of the present invention is to provide a photosensitive resin composition having good liquid repellency. The photosensitive resin composition of the present invention at least contains a fluororesin having a crosslinking site, a solvent, and a photopolymerization initiator, and the fluororesin contains a repeating unit derived from a hydrocarbon having a fluorine atom.

Abstract: Provided is a fluorine-containing polymer for use in a film-forming solution capable of forming a film that is less likely to leave a residue when immersed in a developer. The fluorine-containing polymer of the present invention contains a repeating unit represented by the following formula (1), and a repeating unit represented by the following formula (2) in an amount, expressed in parts per million based on a mass of the repeating unit of formula (1), of 1500 ppm or less: wherein R1 and R2 are each independently a hydrogen atom, a methyl, ethyl, n-propyl, iso-propyl, n-butyl, iso-butyl, sec-butyl, or t-butyl group; R3 and R4 are each independently a hydrogen atom, a methyl group, or an ethyl group; R5 is a hydrogen atom or a trifluoromethyl group; and R6 is a hydrogen atom, a chlorine atom, a methyl group, or a trifluoromethyl group.

Abstract: Provided is a method of producing a light-emitting element, the method being capable of producing a light-emitting element including a first light emitting layer and banks on the first light emitting layer, without damaging the first light emitting layer. The method of producing a light-emitting element of the present disclosure includes: preparing a base element including a monochromatic first light emitting layer on a substrate; forming a patterned fluororesin film by disposing a photosensitive resin composition at least containing a fluororesin having a crosslinking site and a repeating unit derived from a hydrocarbon containing a fluorine atom, a solvent, and a photopolymerization initiator on the base element such that photosensitive resin composition partitions at least one region of the base element; and baking the patterned fluororesin film at a temperature of 200° C. or lower to cure the patterned fluororesin film.

Abstract: A curable composition including a first compound having a group represented by general formula (x) and an epoxy group and having a molecular weight of 1000 or less. In the general formula (x), Rf1 and Rf2 each independently represent a fluorine-containing alkyl group.

Abstract: An object of the present invention is to provide a photosensitive resin composition having good liquid repellency. The photosensitive resin composition of the present invention at least contains a fluororesin having a crosslinking site, a solvent, and a photopolymerization initiator, and the fluororesin contains a repeating unit derived from a hydrocarbon having a fluorine atom.

Abstract: Provided is a fluorine-containing polymer which has no perfluoroalkyl group of 4 or more carbon atoms and which, when formed together with a photoacid generator into a film, shows water repellency after film formation, but becomes hydrophilic by the action of an acid generated under light irradiation, and thus serves as a pattern forming material capable of forming a film with high sensitivity and resolution. A fluorine-containing polymer according to the present invention has a repeating unit of the formula (1) where R1 is a hydrogen atom, a fluorine atom or a C1-C10 alkyl group; R2 to R5 are each independently a hydrogen atom or a C1-C10 alkyl group; X is a single bond or a divalent group; Y is a C1-C3 fluoroalkyl or carboxylate (—COOR) group; R is a C1-C3 fluoroalkyl group; and seven or less of hydrogen atoms contained in the substituent group may be substituted with fluorine.

Abstract: The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film to obtain a first substrate with a patterned film, the substrate with a patterned film including a substrate and a patterned film on the substrate, the patterned film containing a fluorine-containing copolymer having a specific repeating unit; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film.

Abstract: The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film including a substrate and a patterned film on the substrate, to obtain a first substrate with a patterned film; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film, wherein the patterned film of the first substrate with a patterned film has a contact angle decreased in the cleaning step, and the patterned film of the second substrate with a patterned film has a contact angle recovered in the heating step.

Abstract: Provided is a fluorine-containing polymer which has no perfluoroalkyl group of 4 or more carbon atoms and which, when formed together with a photoacid generator into a film, shows water repellency after film formation, but becomes hydrophilic by the action of an acid generated under light irradiation, and thus serves as a pattern forming material capable of forming a film with high sensitivity and resolution. A fluorine-containing polymer according to the present invention has a repeating unit of the formula (1) where R1 is a hydrogen atom, a fluorine atom or a C1-C10 alkyl group; R2 to R5 are each independently a hydrogen atom or a C1-C10 alkyl group; X is a single bond or a divalent group; Y is a C1-C3 fluoroalkyl or carboxylate (—COOR) group; R is a C1-C3 fluoroalkyl group; and seven or less of hydrogen atoms contained in the substituent group may be substituted with fluorine.

Abstract: Sulfonic acid derivatives of general formula RCOOCH2CH2CFHCF2SO3-M+ are provided, wherein R represents a substituted or unsubstituted C1-30 linear, branched, or cyclic hydrocarbon group, or a substituted or unsubstituted C6-30 aryl group, and M+ represents a counter cation. Photoacid generators and photoresists containing such sulfonic acid derivatives are also provided.

Abstract: A sulfonic acid derivative represented by the following general formula (1): [Chemical formula 1] RCOOCH2CH2CFHCF2SO3?M+??(1) where R represents a substituted or unsubstituted C1-30 linear, branched, or cyclic hydrocarbon group, or a substituted or unsubstituted C6-30 aryl group, and M+ represents a counter cation.