Patents by Inventor Yves Arnal

Yves Arnal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060263548
    Abstract: The method comprises the following steps: preparing a sheet having thickness of 5 ?m to a few tens of micrometers, suitable for being etched by a lithographic operation; making a mask on a face of the sheet, the mask presenting etching selectivity S of at least 5; depositing a layer of photosensitive resin on the mask; making through holes in the layer of resin by photolithography; etching through the mask via the pores in the layer of resin; and anisotropically etching through the sheet from the pores in the mask in order to make pores in the sheet having an aspect ratio greater than 5. The invention is applicable to fabricating micron and sub-micron filters.
    Type: Application
    Filed: January 7, 2003
    Publication date: November 23, 2006
    Inventors: Thierry Lagarde, Jacques Pelletier, Ana Lacoste, Yves Arnal
  • Publication number: 20060086322
    Abstract: The invention relates to a device for the production of a plasma (16) within a housing comprising means for the generation of energy in the microwave spectrum, for the excitation of the plasma, said means comprise at least one basic plasma excitation device with a coaxial applicator (4) of microwave energy, one of the ends of which is connected to a production source (7) of microwave energy, the other end (8) of which is directed to the gas to be excited within the housing. The device is characterised in that each basic plasma excitation device is arranged in the wall (3) of the housing, each applicator (4) having a central core (5) which is essentially flush with the wall of the housing. The central core and the thickness of the wall (3) of the housing are separated by a space (6) coaxial to the central core, said space being totally filled, at least at the end of each applicator, by a dielectric material (14), such that said material is essentially flush with the level of the wall of the housing.
    Type: Application
    Filed: June 3, 2004
    Publication date: April 27, 2006
    Inventors: Thierry Lagarde, Ana Lacoste, Jacques Pelletier, Yves Arnal
  • Publication number: 20050184670
    Abstract: The invention relates to a device for confinement of a plasma (5) within a housing (1), comprising means for creating a magnetic field, said means being a series of permanent magnets (3) for creation of a magnetic field presenting an alternating multi-polar magnetic structure to the plasma. The invention is characterised in that the magnets (3) restrict the plasma to a large volume, the magnets begin distributed in a discontinuous manner around the volume and said magnets (3) are arranged within the housing at a separation from the walls of the housing by means of support shafts (4).
    Type: Application
    Filed: February 27, 2003
    Publication date: August 25, 2005
    Inventors: Ana Lacoste, Yves Arnal, Stephane Bechu, Jacques Pelletier
  • Publication number: 20050093443
    Abstract: The invention concerns a plasma display device-comprising in a screen a chamber (17) containing a discharge gas capable of being excited to generate, alone or in combination with luminophor means (18) themselves designed to be excited by a radiation emitted by said gas, a visible light. The device comprises means for generating on one side of said chamber (17) a uniformly distributed electric field (E) designed to ignite a plasma in the gas, as well as a matrix of controllable elements (19) and means controlling said elements (19) so that they modulate individually the electric field (E) or the radiation emitted by the plasma or the generated visible light thereby generating selectively luminous zones on the screen.
    Type: Application
    Filed: December 23, 2002
    Publication date: May 5, 2005
    Inventors: Jacques Pelletier l, Ana Lacoste, Yves Arnal
  • Publication number: 20050062387
    Abstract: The invention concerns a source supplying an adjustable energy electron beam, comprising a plasma chamber (P) consisting of an enclosure (1) having an inner surface of a first value (S1) and an extraction gate (2) having a surface of a second value (S2), the gate potential being different from that of the enclosure and adjustable. The invention is characterized in that the plasma is excited and confined in multipolar or multidipolar magnetic structures, the ratio of the second value (S2) over the first value (S1) being close to: D=1/? {square root}2?cme/mi exp (?½), wherein: ? is the proportion of electrons of the plasma P, me the electron mass, and mi is the mass of positively charged ions.
    Type: Application
    Filed: December 6, 2002
    Publication date: March 24, 2005
    Applicant: Centre National De La Recherche Scientifique
    Inventors: Ana Lacoste, Jacques Pelletier, Yves Arnal
  • Patent number: 4745337
    Abstract: Method and device for exciting a plasma using microwaves at the electronic cyclotronic resonance.The device for exciting a gaseous medium by microwaves comprises at least a co-axial structure for introducing the microwave power inside a multipolar confinement structure and at least one antenna coupled to said co-axial structure for the localized introduction of the microwave energy inside said multipolar magnetic confinement structure which comprises a set of permanent magnets creating a network of surfaces having a constant magnetic field and presenting locally an intensity which corresponds to the electronic cyclotronic resonance, and said antenna being positioned on said network of surfaces of constant magnetic field in an area of intensity corresponding to the electronic cyclotronic resonance.The invention finds an application in the creation of a homogenous, isotropic plasma of large volume and high density, which is free of fields in the area of use.
    Type: Grant
    Filed: June 5, 1986
    Date of Patent: May 17, 1988
    Assignees: Centre National d'Etudes des Telecommunications, Centre National De La Recherche Scientifique
    Inventors: Michel Pichot, Jacques Pelletier, Yves Arnal
  • Patent number: 4534842
    Abstract: The invention relates to the production of plasma. The process according to the invention comprises the steps of: maintaining a gaseous medium in an enclosure at a pressure in the range of 10.sup.-5 to 10.sup.-1 Torr; exciting this gaseous medium in the enclosure by means of UHF waves in the range of one to ten gigahertz, producing a plasma; and maintaining this plasma in the enclosure by means of a magnetic confinement shell comprising many elongated magnetic elements arranged parallel to each other inside the enclosure near the respective interior surfaces, the faces of the magnetic elements which face the interior of the enclosure having alternating polarities. It is more particularly applicable to the microelectronics industry.
    Type: Grant
    Filed: June 13, 1984
    Date of Patent: August 13, 1985
    Assignee: Centre National de la Recherche Scientifique (CNRS)
    Inventors: Yves Arnal, Jacques Pelletier, Claude Pomot