Patents by Inventor Øyvind Tafjord

Øyvind Tafjord has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Real time registration in lithography system
    Patent number: 11906903
    Abstract: A device for measuring reference points in real time during lithographic printing includes a light source providing an exposure beam; a light modulator modulating the exposure beam according to an exposure pattern; a measurement system configured to measure a position of a number of alignment marks previously arranged on a substrate; and an exposure optical system comprising a control unit. The exposure optical system delivers the modulated exposure beam as an image provided by the light modulator onto the substrate. The exposure system control unit is configured to calculate the orientation of the substrate based on the position of the alignment marks and control the delivering of the modulated exposure beam relative to the calculated orientation of the substrate.
    Type: Grant
    Filed: June 29, 2020
    Date of Patent: February 20, 2024
    Assignee: Visitech AS
    Inventors: Øyvind Tafjord, Trond Jørgensen, Endre Kirkhorn, Roy Almedal
  • REAL TIME REGISTRATION IN LITHOGRAPHY SYSTEM
    Publication number: 20220276566
    Abstract: A device for measuring reference points in real time during lithographic printing includes a light source providing an exposure beam; a light modulator modulating the exposure beam according to an exposure pattern; a measurement system configured to measure a position of a number of alignment marks previously arranged on a substrate; and an exposure optical system comprising a control unit. The exposure optical system delivers the modulated exposure beam as an image provided by the light modulator onto the substrate. The exposure system control unit is configured to calculate the orientation of the substrate based on the position of the alignment marks and control the delivering of the modulated exposure beam relative to the calculated orientation of the substrate.
    Type: Application
    Filed: June 29, 2020
    Publication date: September 1, 2022
    Applicant: Visitech AS
    Inventors: Øyvind Tafjord, Trond Jørgensen, Endre Kirkhorn, Roy Almedal