Patents by Inventor Yvonne Wendela Kruijt-Stegeman
Yvonne Wendela Kruijt-Stegeman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8529823Abstract: A method of determining an offset between an imprint template and a substrate using an alignment grating on the imprint template and an alignment grating on the substrate is disclosed. The method includes bringing the imprint template alignment grating and the substrate alignment grating sufficiently close together such that they form a composite grating, directing an alignment radiation beam at the composite grating while modulating the relative position of the imprint template and the substrate, detecting the intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing modulation of the detected intensity.Type: GrantFiled: September 27, 2010Date of Patent: September 10, 2013Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Vadim Yevgenyevich Banine, Andre Bernardus Jeunink, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman
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Patent number: 8524136Abstract: An imprint template cover for an imprint template having a pattern feature thereon. The cover is configured such that, in use, it extends around the pattern feature of the imprint template, and such that the cover does not contact the pattern feature.Type: GrantFiled: December 5, 2008Date of Patent: September 3, 2013Assignee: ASML Netherlands B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Ivar Schram, Sander Frederik Wuister, Jeroen Herman Lammers
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Publication number: 20130182236Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.Type: ApplicationFiled: June 14, 2011Publication date: July 18, 2013Applicant: ASML Netherlands B.V.Inventors: Catharinus De Schiffart, Michael Jozef Mathijs Renkens, Gerard Van Schothorst, Andre Bernardus Jeunink, Gregor Edward Van Baars, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Norbert Erwin Therenzo Jansen, Toon Hardeman, George Arie Jan De Fockert, Johan Frederik Dijksman
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Patent number: 8485123Abstract: An imprint lithography apparatus is disclosed. The apparatus has a substrate table configured to support a lithographic substrate and a plurality of nozzles arranged to eject fluid onto the lithographic substrate, the plurality of nozzles extending over a distance which is substantially equal to or greater than a width of the substrate, wherein the nozzles, the lithographic substrate, or both, are moveable relative to the other.Type: GrantFiled: July 15, 2011Date of Patent: July 16, 2013Assignees: ASML Netherlands B.V., Koninklijke Philips Electronics N.V.Inventors: Johan Frederik Dijksman, Antonius Johannes Joseph Wismans, Anke Pierik, Martin Maurice Vernhout, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman
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Patent number: 8486485Abstract: An imprintable medium dispenser includes a chamber, a nozzle, and an actuator connected to the chamber and configured to be actuated and thereby generate a pressure wave within the chamber such that imprintable medium is dispensed from the nozzle. The imprintable medium dispenser is provided with a control circuit which includes a monitoring apparatus configured to receive a transient oscillation signal generated when the actuator is actuated, and to monitor the operation of the imprintable medium dispenser by monitoring the transient oscillation signal.Type: GrantFiled: July 29, 2011Date of Patent: July 16, 2013Assignee: ASML Netherlands B.V.Inventors: Johan Frederik Dijksman, Anke Pierik, Martin Maurice Vernhout, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
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Publication number: 20130160230Abstract: A vacuum cleaning device comprises a unit (1) in which an oscillating airflow is generated which substantially zero net flow and an asymmetry between the suction and the blowing phases, such that in the blowing phase a jet is generated. A generator (31) which is needed for generating the oscillating airflow comprises a movable surface (30) which is integrated in a wall (12) of a housing (10) having an internal space (11) and at least one opening (13) for allowing air to flow to and from the internal space (11). The jet can be generates when the so-called Strouhal number, being the frequency of the movement of the movable surface (30) multiplied by a characteristic dimension of the opening (13) and divided by the velocity of the air in the opening (13), is not higher than a predetermined maximum.Type: ApplicationFiled: September 21, 2011Publication date: June 27, 2013Applicant: KONINKLIJKE PHILIPS ELECTRONICS N.V.Inventors: Gerben Kooijman, Jan Frederik Suijver, Yvonne Wendela Kruijt-Stegeman, Jeroen Herman Lammers
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Patent number: 8454849Abstract: An imprint lithography method is disclosed that includes, after imprinting an imprint lithography template into a layer of imprintable medium to form a pattern in that imprintable medium and fixing that pattern to form a patterned layer of imprintable medium, adding etch resistant material (i.e. a hard mask) to a part of the patterned layer of imprintable medium to reduce a difference between an intended topography and an actual topography of that part of the patterned layer of imprintable medium.Type: GrantFiled: March 18, 2011Date of Patent: June 4, 2013Assignee: ASML Netherlands B.V.Inventors: Sander Frederik Wuister, Vadim Yevgenyevich Banine, Arie Jeffrey Den Boef, Yvonne Wendela Kruijt-Stegeman, Tatyana Viktorovna Rakhimova, Dmitriy Viktorovich Lopaev, Denis Alexandrovich Glushkov, Andrei Mikhailovich Yakunin, Roelof Koole
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Publication number: 20120313295Abstract: A method of determining a position of an imprint template in an imprint lithography apparatus. In an embodiment, the method includes illuminating an area of the imprint template in which an alignment mark is expected to be found by scanning an alignment radiation beam over that area, detecting an intensity of radiation reflected or transmitted from the area, and identifying the alignment mark via analysis of the detected intensity.Type: ApplicationFiled: January 11, 2011Publication date: December 13, 2012Inventors: Arie Jeffrey Den Boef, Andre Bernardus Jeunink, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman
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Patent number: 8329052Abstract: A method of making an imprint template includes providing a transfer layer on a substrate and providing a layer of imprintable medium on the transfer layer, using a master imprint template to imprint a pattern into the imprintable medium, polymerizing the imprintable medium by exposing it to actinic radiation, then etching the resulting polymer layer, the transfer layer and the substrate such that the imprinted pattern is transferred to the substrate, the substrate thereby becoming an imprint template bearing a pattern which is the inverse of a pattern provided on the master imprint template.Type: GrantFiled: July 12, 2011Date of Patent: December 11, 2012Assignee: ASML Netherlands B.V.Inventors: Sander Frederik Wuister, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
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Patent number: 8323541Abstract: A chuck apparatus for holding a substrate is the disclosed. The chuck apparatus includes a first surface portion on which the substrate is to be held and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion.Type: GrantFiled: February 22, 2012Date of Patent: December 4, 2012Assignee: ASML Netherlands B.V.Inventors: Ivar Schram, Johan Frederik Dijksman, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Jeroen Herman Lammers, Richard Joseph Marinus Schroeders
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Patent number: 8319968Abstract: A method of determining a position of a substrate relative to an imprint template is described, wherein the imprint template has at least three gratings and the substrate has at least three gratings positioned such that each imprint template grating forms a composite grating with an associated substrate grating, the at least three imprint template gratings and associated substrate gratings having offsets relative to one another. The method includes detecting an intensity of radiation which is reflected by the three composite gratings, and using the detected intensities to determine displacement of the substrate or imprint template from a position.Type: GrantFiled: September 10, 2009Date of Patent: November 27, 2012Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Andre Bernardus Jeunink, Johannes Petrus Martinus Bernardus Vermeulen, Pascal Antonius Smits, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Catharinus De Schiffart
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Publication number: 20120244319Abstract: An object provided with a particular alignment arrangement for use in aligning the object and a further object with respect to each other is disclosed. The alignment arrangement includes a first fine alignment mark in the form of a substantially regular grating, and a second coarse alignment mark located in the same area as the first alignment mark.Type: ApplicationFiled: October 1, 2010Publication date: September 27, 2012Applicant: ASML Netherlands B.V.Inventors: Sander Frederik Wuister, Arie Jeffrey Den Boef, Yvonne Wendela Kruijt-Stegeman
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Publication number: 20120225152Abstract: An imprint lithography alignment apparatus is disclosed that includes at least two detectors which are configured to detect an imprint template alignment mark, wherein the alignment apparatus further comprises alignment radiation adjustment optics which are configured to provide adjustment of locations from which the at least two alignment detectors receive alignment radiation.Type: ApplicationFiled: September 30, 2010Publication date: September 6, 2012Applicant: ASML Netherlands B.V.Inventors: Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman
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Patent number: 8241550Abstract: An imprint lithography apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table, and an optical encoder, the optical encoder having a radiation output, a first diffraction grating, and a detector, the radiation output arranged to illuminate a second diffraction grating and the detector positioned to detect radiation diffracted by the first and second diffraction gratings to provide an alignment signal.Type: GrantFiled: October 6, 2009Date of Patent: August 14, 2012Assignee: ASML Netherlands B.V.Inventors: Helmar Van Santen, Aleksey Yurievich Kolesnychenko, Yvonne Wendela Kruijt-Stegeman
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Publication number: 20120153538Abstract: A chuck apparatus for holding a substrate is the disclosed. The chuck apparatus includes a first surface portion on which the substrate is to be held and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion.Type: ApplicationFiled: February 22, 2012Publication date: June 21, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Johan Frederick Dijksman, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Ivar SCHRAM, Jeroen Herman Lammers, Richard Joseph Marinus Schroeders
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Publication number: 20120091629Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.Type: ApplicationFiled: December 20, 2011Publication date: April 19, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Yvonne Wendela KRUIJT-STEGEMAN, Raymond Jacobus Knaapen, Johan Frederik Dijksman, Krassimir Todorov Krastev, Sander Frederik Wuister, Aleksey Yurievich Kolesnychencko, Karel Diederick Van Der Mast, Klaus Simon
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Patent number: 8144309Abstract: A chuck apparatus for holding a substrate is the disclosed. The chuck apparatus includes a first surface portion on which the substrate is to be held and a second surface portion adjacent to the first surface portion and extending at least partially around an edge of the first surface portion and which, in use, is arranged to deflect gas over the first surface portion and thus the substrate that is to be held on the first surface portion.Type: GrantFiled: September 5, 2007Date of Patent: March 27, 2012Assignee: ASML Netherlands B.V.Inventors: Sander Frederik Wuister, Johan Frederik Dijksman, Yvonne Wendela Kruijt-Stegeman, Ivar Schram, Jeroen Herman Lammers, Richard Joseph Marinus Schroeders
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Patent number: 8100684Abstract: An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.Type: GrantFiled: February 24, 2009Date of Patent: January 24, 2012Assignee: ASML Netherlands B.V.Inventors: Yvonne Wendela Kruijt-Stegeman, Johan Frederik Dijksman, Aleksey Yurievich Kolesnychenko, Karel Diederick Van Der Mast, Klaus Simon, Raymond Jacobus Knaapen, Krassimir Todorov Krastev, Sander Frederik Wuister
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Publication number: 20120012611Abstract: An imprintable medium dispenser includes a chamber, a nozzle, and an actuator connected to the chamber and configured to be actuated and thereby generate a pressure wave within the chamber such that imprintable medium is dispensed from the nozzle. The imprintable medium dispenser is provided with a control circuit which includes a monitoring apparatus configured to receive a transient oscillation signal generated when the actuator is actuated, and to monitor the operation of the imprintable medium dispenser by monitoring the transient oscillation signal.Type: ApplicationFiled: July 29, 2011Publication date: January 19, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Johan Frederik Dijksman, Anke Pierik, Martin Maurice Vernhout, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman, Ivar Schram
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Publication number: 20110268869Abstract: An imprint lithography apparatus is disclosed. The apparatus has a substrate table configured to support a lithographic substrate and a plurality of nozzles arranged to eject fluid onto the lithographic substrate, the plurality of nozzles extending over a distance which is substantially equal to or greater than a width of the substrate, wherein the nozzles, the lithographic substrate, or both, are moveable relative to the other.Type: ApplicationFiled: July 15, 2011Publication date: November 3, 2011Applicants: KONINKLIJKE PHILIPS ELECTRONICS N.V., ASML NETHERLANDS B.V.Inventors: Johan Frederik DIJKSMAN, Antonius Johannes Joseph Wismans, Anke Pierik, Martin Maurice Vernhout, Sander Frederik Wuister, Yvonne Wendela Kruijt-Stegeman