Patents by Inventor Z Serpil Gonen Williams

Z Serpil Gonen Williams has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RESISTS FOR LITHOGRAPHY
    Publication number: 20150185616
    Abstract: New routes involving multi-step reversible photo-chemical reactions using two-step techniques to provide non-linear resist for lithography are described in this disclosure. They may provide exposure quadratically dependant on the intensity of the light. Several specific examples, including but not limited to using nanocrystals, are also described. Combined with double patterning, these approaches may create sub-diffraction limit feature density.
    Type: Application
    Filed: January 7, 2015
    Publication date: July 2, 2015
    Inventors: Gregory D. COOPER, Zhiyun CHEN, Z. Serpil GONEN WILLIAMS, Larry F. THOMPSON
  • Resists for lithography
    Patent number: 8383316
    Abstract: New routes involving multi-step reversible photo-chemical reactions using two-step techniques to provide non-linear resist for lithography are described in this disclosure. They may provide exposure quadratically dependant on the intensity of the light. Several specific examples, including but not limited to using nanocrystals, are also described. Combined with double patterning, these approaches may create sub-diffraction limit feature density.
    Type: Grant
    Filed: July 6, 2007
    Date of Patent: February 26, 2013
    Assignee: Pixelligent Technologies, LLC
    Inventors: Gregory D. Cooper, Zhiyun Chen, Z Serpil Gonen Williams, Larry F. Thompson
  • RESISTS FOR LITHOGRAPHY
    Publication number: 20080176166
    Abstract: New routes involving multi-step reversible photo-chemical reactions using two-step techniques to provide non-linear resist for lithography are described in this disclosure. They may provide exposure quadratically dependant on the intensity of the light. Several specific examples, including but not limited to using nanocrystals, are also described. Combined with double patterning, these approaches may create sub-diffraction limit feature density.
    Type: Application
    Filed: July 6, 2007
    Publication date: July 24, 2008
    Inventors: Gregory D. COOPER, Zhiyun Chen, Z. Serpil Gonen Williams, Larry F. Thompson