Patents by Inventor Zachary Bogusz

Zachary Bogusz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • BOTTOM ANTIREFLECTIVE MATERIALS AND COMPOSITIONS
    Publication number: 20150227043
    Abstract: The present invention relates to novel antireflective coating compositions and their use in image processing. The compositions self-segregate to form hydrophobic surfaces of the novel antireflective coating compositions, the composition being situated between a reflective substrate and a photoresist coating. Such compositions are particularly useful in the fabrication of semiconductor devices by photolithographic techniques. The present invention also related to self-segregating polymers useful in image processing and processes of their use.
    Type: Application
    Filed: April 21, 2015
    Publication date: August 13, 2015
    Inventors: Huirong YAO, JoonYeon CHO, Zachary BOGUSZ, Salem K. MULLEN, Guanyang LIN, Mark O. NEISSER
  • BOTTOM ANTIREFLECTIVE MATERIALS AND COMPOSITIONS
    Publication number: 20140295349
    Abstract: The present invention relates to novel antireflective coating compositions and their use in image processing. The compositions self-segregate to form hydrophobic surfaces of the novel antireflective coating compositions, the composition being situated between a reflective substrate and a photoresist coating. Such compositions are particularly useful in the fabrication of semiconductor devices by photolithographic techniques. The present invention also related to self-segregating polymers useful in image processing and processes of their use.
    Type: Application
    Filed: March 28, 2013
    Publication date: October 2, 2014
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Huirong YAO, JoonYeon CHO, Zachary BOGUSZ, Salem K. MULLEN, Guanyang LIN, Mark O. NEISSER
  • Underlayer composition and process thereof
    Patent number: 8568958
    Abstract: The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer.
    Type: Grant
    Filed: June 21, 2011
    Date of Patent: October 29, 2013
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Huirong Yao, Guanyang Lin, Zachary Bogusz, PingHung Lu, WooKyu Kim, Mark Neisser
  • Underlayer coating composition and processes thereof
    Patent number: 8465902
    Abstract: The invention relates to an underlayer coating composition comprising a polymer, where the polymer comprises at least one hydroxyaromatic unit in the backbone of the polymer phenol which has a pendant group comprising a fluoro or iodo moiety, and at least one unit comprising an aminoplast. The invention further relates to a process for forming an image using the composition, especially for EUV.
    Type: Grant
    Filed: February 8, 2011
    Date of Patent: June 18, 2013
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Huirong Yao, Zachary Bogusz, Guanyang Lin, Mark Neisser
  • UNDERLAYER COMPOSITION AND PROCESS THEREOF
    Publication number: 20120328990
    Abstract: The present invention relates to an underlayer composition comprising a polymer, an organic titanate compound and optionally a thermal acid generator, where the polymer comprises at least one fluoroalcohol group and at least one epoxy group. The invention also relates to a process for using this underlayer material as an antireflective coating composition and/or a hard mask for pattern transfer.
    Type: Application
    Filed: June 21, 2011
    Publication date: December 27, 2012
    Applicant: AZ ELECTRONIC MATERIALS USA CORP.
    Inventors: Huirong YAO, Guanyang LIN, Zachary BOGUSZ, PingHung LU, WooKyu KIM, Mark NEISSER
  • UNDERLAYER COATING COMPOSITION AND PROCESSES THEREOF
    Publication number: 20120202155
    Abstract: The invention relates to an underlayer coating composition comprising a polymer, where the polymer comprises at least one hydroxyaromatic unit in the backbone of the polymer phenol which has a pendant group comprising a fluoro or iodo moiety, and at least one unit comprising an aminoplast. The invention further relates to a process for forming an image using the composition, especially for EUV.
    Type: Application
    Filed: February 8, 2011
    Publication date: August 9, 2012
    Inventors: Huirong Yao, Zachary Bogusz, Guanyang Lin, Mark Neisser