Patents by Inventor Zaitsu Masaru

Zaitsu Masaru has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for filling a gap
    Patent number: 10395919
    Abstract: According to the invention a method for filling one or more gaps created during manufacturing of a feature on a substrate is provided by providing the substrate in a reaction chamber and providing a deposition method. The deposition method comprises; providing an anisotropic plasma to bombard a bottom area of a surface of the one or more gaps with ions thereby creating adsorption sites at the bottom area; introducing a first reactant to the substrate; and, allowing the first reactant to react with the adsorption sites at the bottom area of the surface to fill the one or more gaps from the bottom area upwards.
    Type: Grant
    Filed: July 28, 2016
    Date of Patent: August 27, 2019
    Assignee: ASM IP Holding B.V.
    Inventors: Zaitsu Masaru, Atsuki Fukazawa
  • METHOD AND APPARATUS FOR FILLING A GAP
    Publication number: 20180033616
    Abstract: According to the invention a method for filling one or more gaps created during manufacturing of a feature on a substrate is provided by providing the substrate in a reaction chamber and providing a deposition method. The deposition method comprises; providing an anisotropic plasma to bombard a bottom area of a surface of the one or more gaps with ions thereby creating adsorption sites at the bottom area; introducing a first reactant to the substrate; and, allowing the first reactant to react with the adsorption sites at the bottom area of the surface to fill the one or more gaps from the bottom area upwards.
    Type: Application
    Filed: July 28, 2016
    Publication date: February 1, 2018
    Inventors: Zaitsu Masaru, Atsuki Fukazawa