Patents by Inventor Zamir Abraham

Zamir Abraham has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System, method and computer software product for inspecting charged particle responsive resist
    Patent number: 7856138
    Abstract: A system software product and a method for evaluating a mask, the method including the stages of: defining multiple CD measurement target windows; defining multiple pattern recognition windows such that the multiple CD measurements windows do not overlap the multiple pattern recognition windows, wherein each CD measurement target window and an associated pattern recognition window are positioned within a measurement area that is scannable without introducing a substantial mechanical movement; performing multiple critical dimension measurements of multiple patterns of an object being manufactured by exposing the mask to radiation, wherein the performing comprises using at least one CD measurement target window and at least one pattern recognition window; and evaluating the mask.
    Type: Grant
    Filed: February 23, 2006
    Date of Patent: December 21, 2010
    Assignee: Applied Materials Israel, Ltd.
    Inventors: Youval Nehmadi, Ovadya Menadeva, Sergey Latinsky, Zamir Abraham, Orit Afek
  • Process monitoring system and method for processing a large number of sub-micron measurement targets
    Patent number: 7587700
    Abstract: The invention provides a method that includes the stages of: (i) receiving design information representative of a portion of an object that includes sub micron measurement targets, (ii) processing the received design information to provide a large number of measurement targets; and (iii) associating target measurement parameters to each of large number of measurement targets. The invention provides a system that includes: (i) an interface for receiving design information representative of a portion of a layer of an object that includes sub micron measurement targets; and (ii) a processor, coupled to the interface, for processing the received design information to provide a large number of measurement targets; and for associating target measurement parameters to each of large number of measurement targets.
    Type: Grant
    Filed: April 1, 2004
    Date of Patent: September 8, 2009
    Assignee: Applied Materials, Israel, Ltd.
    Inventors: Youval Nehmadi, Zamir Abraham, Gil Sod-Moriah, Yair Eran, Chen Ofek, Yaron Cohen, Ariel Ben-Porath
  • Process monitoring system and method
    Publication number: 20080092088
    Abstract: The invention provides a method that includes the stages of: (i) receiving design information representative of a portion of an object that includes sub micron measurement targets, (ii) processing the received design information to provide a large number of measurement targets; and (iii) associating target measurement parameters to each of large number of measurement targets. The invention provides a system that includes: (i) an interface for receiving design information representative of a portion of a layer of an object that includes sub micron measurement targets; and (ii) a processor, coupled to the interface, for processing the received design information to provide a large number of measurement targets; and for associating target measurement parameters to each of large number of measurement targets.
    Type: Application
    Filed: April 1, 2004
    Publication date: April 17, 2008
    Inventors: Youval Nehmadi, Zamir Abraham, Gil Sod-Moriah, Yair Eran, Chen Ofek, Yaron Cohen, Ariel Ben-Porath
  • System, method and computer software product for inspecting charged particle responsive resist
    Publication number: 20060266833
    Abstract: A system, computer software product and a method for evaluating a mask, the method includes the stages of: defining multiple CD measurement target windows; defining multiple pattern recognition windows such that the multiple CD measurements windows do not overlap the multiple pattern recognition windows; wherein each CD measurement target window and an associated pattern recognition window are positioned within a measurement area that is scan-able without introducing a substantial mechanical movement; performing multiple critical dimension measurements of multiple patterns of an object being manufactured by exposing the mask to radiation; wherein the performing comprises using at least one CD measurement target window and at least one pattern recognition window; and evaluating the mask
    Type: Application
    Filed: February 23, 2006
    Publication date: November 30, 2006
    Inventors: Youval Nehmadi, Ovadya Menadeva, Sergey Latinsky, Zamir Abraham, Orit Afek