Abstract: An isotropic neutron detector includes a spherical secondary particle radiator component and a plurality of stacked semiconductor detectors, A first semiconductor detector is coupled to at least a portion of the spherical secondary particle radiator component, forming a portion of a first concentric shell thereover. A second semiconductor detector coupled to at least a portion of the first semiconductor detector, forming a portion of a second concentric shell thereover.

Abstract: The present invention provides a Michelson interferometer for capturing images of a vibrating sample comprising a coherent light source. The light source may be adapted to illuminate a sample with a constant brightness across the sample. The interferometer may also be configured to generate a 3D representation of a sample using a single frame for a predetermined phase of the sample. The 3D representations may be combined to create a 3D video representation of the vibrating sample.

Abstract: Provided is a method for treating a fiber, including: imparting a pattern from a diffraction grating onto a fiber surface. The pattern is capable of diffracting incident polychromatic light into one or more dispersed visible colors, the fiber is not coated and the pattern is imparted directly onto the surface of the fiber.

Abstract: Provided is a method for determining a volume, at room temperature, of a first chamber having an unknown volume that is in fluid communication through a controllable valve with a second chamber having an unknown volume. The method can include measuring, by a pressure sensor coupled to one of the first chamber and the second chamber, a first equilibrium pressure of a gas that was introduced into the second chamber in both the first chamber and the second chamber after equilibrium is reached; measuring, by the pressure sensor, a second equilibrium pressure of the gas that was introduced into the second chamber in both the first chamber and the second chamber after equilibrium is reached, wherein the first chamber comprises an object with a known volume therein; and determining the volume of the first chamber based on the first equilibrium pressure and the second equilibrium pressure.

Abstract: Various embodiments provide methods of forming zero valent metal particles using an aerosol-reductive/expansion synthesis (A-RES) process. In one embodiment, an aerosol stream including metal precursor compound(s) and chemical agent(s) that produces reducing gases upon thermal decomposition can be introduced into a heated inert atmosphere of a RES reactor to form zero valent metal particles corresponding to metals used for the metal precursor compound(s).

Abstract: A method for determining depletion of an etchant, an etch depth, and an etch rate during an etch of a material such as Si using an etchant such as xenon difluoride (XeF2) in a pulsed etching system in real time measuring pressure within a closed system during the etch. Coupling the pressure data with the knowledge of the chemical reactions allows for the determination of the etching parameters of interest. While the etch of Si using XeF2 is used for demonstration, the method may be generalized to any closed volume system provided there is a net change in number of moles of gaseous species present in the system before and after the reaction.

Abstract: Various embodiments provide methods of forming metallic particles or carbon/graphite coated metallic particles with zero-valence from metal precursor compounds by a reductive/expansion synthesis method using nitrogen-hydrogen containing molecules.

Abstract: Various embodiments provide methods of forming zero valent metal particles using an aerosol-reductive/expansion synthesis (A-RES) process. In one embodiment, an aerosol stream including metal precursor compound(s) and chemical agent(s) that produces reducing gases upon thermal decomposition can be introduced into a heated inert atmosphere of a RES reactor to form zero valent metal particles corresponding to metals used for the metal precursor cot pound(s).

Abstract: Exemplary embodiments provide methodologies for generating structures of filamentous carbon (or carbon filaments) with controlled geometries. In one exemplary embodiment of forming the carbon filament structure, a metal template can be exposed to a fuel rich gaseous mixture to form a carbon filament structure at an appropriate gas flow and/or at an appropriate temperature on the metal template. The metal template can have one or more metal surfaces with controlled geometries. Carbon filament structures can then be grown on the metal surfaces having corresponding geometries (or shapes) in the growth direction. The carbon filament structure can be two or three dimensional and can have high density. In various embodiments, the metal template can be removed to leave a self-supporting carbon filament structure.

Abstract: Exemplary embodiments provide methodologies for generating structures of filamentous carbon (or carbon filaments) with controlled geometries. In one exemplary embodiment of forming the carbon filament structure, a metal template can be exposed to a fuel rich gaseous mixture to form a carbon filament structure at an appropriate gas flow and/or at an appropriate temperature on the metal template. The metal template can have one or more metal surfaces with controlled geometries. Carbon filament structures can then be grown on the metal surfaces having corresponding geometries (or shapes) in the growth direction. The carbon filament structure can be two or three dimensional and can have high density. In various embodiments, the metal template can be removed to leave a self-supporting carbon filament structure.

Abstract: Method and device for measuring mechanical properties of microscale and nanoscale thin film membranes. A testing system comprises a unitary material load cell, including a substrate, a beam supported to the substrate at its ends and otherwise substantially free from the substrate, a test-probe extending from the substrate and connected to the beam, and a scale to measure movement of the test-probe relative to the substrate. The system further comprises a thin film support, supporting a thin film at its circumference and providing a freestanding thin film, and a positioner to move the unitary material load cell for controlled pushing against the freestanding thin film.