Patents by Inventor Zeng Shi

Zeng Shi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230141530
    Abstract: The invention relates to a fluorinated, alkoxysilyl-functional polymer, obtainable by a method comprising the steps of: a) reacting an OH-functional (per)fluoropolyether (PFPE) with a polyisocyanate A under urethane formation reaction conditions, to obtain an isocyanate-functional intermediate B, b) reacting intermediate B with a secondary, alkoxysilyl-functional monoamine C, to obtain the alkoxysilyl-functional polymer. The polymer can be used as an additive in preparation of a coating with easy-clean, anti-stain and anti-scratch properties, which can advantageously be used for coating various substrates in consumer electronics or automotive applications such as glass, metal, metal alloy, anodized substrates, plastics, composite etc.
    Type: Application
    Filed: April 9, 2021
    Publication date: May 11, 2023
    Inventors: Zeng Shi, Xing-shun CHEN, Quan James HUANGpUXI, Puxin FANG, Lin HONG
  • Patent number: 7369430
    Abstract: Magnetic Random Access Memory (MRAM) can be programmed and read as fast as Static Random Access Memory (SRAM) and has the non-volatile characteristics of electrically eraseable programmable read only memory (EEPROM), FLASH EEPROM or one-time-programmable (OTP) EPROM. Due to the randomness of manufacturing process, the magnetic tunnel junctions (MTJ) in MRAM cells will require different row and column current combinations to program and not to disturb the other cells. Based on adaptive current sources for programming, this disclosure teaches methods, designs, test algorithms and manufacturing flows for generating EEPROM, FLASH EEPROM or OTP EPROM like memories from MRAM.
    Type: Grant
    Filed: July 12, 2006
    Date of Patent: May 6, 2008
    Assignees: Headway Technologies, Inc., Applied Spintronics, Inc.
    Inventors: Hsu Kai Yang, Xi Zeng Shi, Po-Kang Wang, Bruce Yang
  • Patent number: 7335961
    Abstract: An MTJ element is formed between orthogonal word and bit lines. The bit line is a composite line which includes a high conductivity layer and a soft magnetic layer under the high conductivity layer. During operation, the soft magnetic layer concentrates the magnetic field of the current and, due to its proximity to the free layer, it magnetically couples with the free layer in the MTJ. This coupling provides thermal stability to the free layer magnetization and ease of switching and the coupling may be further enhanced by inducing a shape or crystalline anisotropy into the free layer during formation.
    Type: Grant
    Filed: August 25, 2005
    Date of Patent: February 26, 2008
    Assignees: Headway Technologies, Inc., Applied Spintronics, Inc.
    Inventors: Yimin Guo, Tai Min, Pokang Wang, Xi Zeng Shi
  • Patent number: 7321519
    Abstract: Magnetic Random Access Memory (MRAM) can be programmed and read as fast as Static Random Access Memory (SRAM) and has the non-volatile characteristics of electrically eraseable programmable read only memory (EEPROM), FLASH EEPROM or one-time-programmable (OTP) EPROM. Due to the randomness of manufacturing process, the magnetic tunnel junctions (MTJ) in MRAM cells will require different row and column current combinations to program and not to disturb the other cells. Based on adaptive current sources for programming, this disclosure teaches methods, designs, test algorithms and manufacturing flows for generating EEPROM, FLASH EEPROM or OTP EPROM like memories from MRAM.
    Type: Grant
    Filed: July 12, 2006
    Date of Patent: January 22, 2008
    Assignees: Headway Technologies, Inc., Applied Spintronill, Inc.
    Inventors: Hsu Kai Yang, Xi Zeng Shi, Po-Kang Wang, Bruce Yang
  • Patent number: 7224628
    Abstract: Magnetic Random Access Memory (MRAM) can be programmed and read as fast as Static Random Access Memory (SRAM) and has the non-volatile characteristics of electrically eraseable programmable read only memory (EEPROM), FLASH EEPROM or one-time-programmable (OTP) EPROM. Due to the randomness of manufacturing process, the magnetic tunnel junctions (MTJ) in MRAM cells will require different row and column current combinations to program and not to disturb the other cells. Based on adaptive current sources for programming, this disclosure teaches methods, designs, test algorithms and manufacturing flows for generating EEPROM, FLASH EEPROM or OTP EPROM like memories from MRAM.
    Type: Grant
    Filed: July 13, 2006
    Date of Patent: May 29, 2007
    Assignees: Headway Technologies, Inc., Applied Spintronics, Inc.
    Inventors: Hsu Kai Yang, Xi Zeng Shi, Po-Kang Wang, Bruce Yang
  • Patent number: 7085183
    Abstract: Magnetic Random Access Memory (MRAM) can be programmed and read as fast as Static Random Access Memory (SRAM) and has the non-volatile characteristics of electrically eraseable programmable read only memory (EEPROM), FLASH EEPROM or one-time-programmable (OTP) EPROM. Due to the randomness of manufacturing process, the magnetic tunnel junctions (MTJ) in MRAM cells will require different row and column current combinations to program and not to disturb the other cells. Based on adaptive current sources for programming, this disclosure teaches methods, designs, test algorithms and manufacturing flows for generating EEPROM, FLASH EEPROM or OTP EPROM like memories from MRAM.
    Type: Grant
    Filed: July 13, 2004
    Date of Patent: August 1, 2006
    Assignees: Headway Technologies, Inc., Applied Spintronics, Inc.
    Inventors: Hsu Kai Yang, Xi Zeng Shi, Po-Kang Wang, Bruce Yang
  • Patent number: 6979586
    Abstract: An MTJ element is formed between orthogonal word and bit lines. The bit line is a composite line which includes a high conductivity layer and a soft magnetic layer under the high conductivity layer. During operation, the soft magnetic layer concentrates the magnetic field of the current and, due to its proximity to the free layer, it magnetically couples with the free layer in the MTJ. This coupling provides thermal stability to the free layer magnetization and ease of switching and the coupling may be further enhanced by inducing a shape or crystalline anisotropy into the free layer during formation.
    Type: Grant
    Filed: June 21, 2004
    Date of Patent: December 27, 2005
    Assignees: Headway Technologies, Inc., Applied Spintronics, Inc.
    Inventors: Yimin Guo, Tai Min, Pokang Wang, Xi Zeng Shi
  • Publication number: 20040233760
    Abstract: An MTJ element is formed between orthogonal word and bit lines. The bit line is a composite line which includes a high conductivity layer and a soft magnetic layer under the high conductivity layer. During operation, the soft magnetic layer concentrates the magnetic field of the current and, due to its proximity to the free layer, it magnetically couples with the free layer in the MTJ. This coupling provides thermal stability to the free layer magnetization and ease of switching and the coupling may be further enhanced by inducing a shape or crystalline anisotropy into the free layer during formation.
    Type: Application
    Filed: June 21, 2004
    Publication date: November 25, 2004
    Applicant: Headway Technologies, Inc.
    Inventors: Yimin Guo, Tai Min, Pokang Wang, Xi Zeng Shi