Abstract: The present invention provides an imprint method that performs a process of forming a pattern of an imprint material on a substrate using a mold, for each of a plurality of shot regions on the substrate, the process including: dispensing the imprint material onto the substrate; moving, to below the mold, the substrate on which the imprint material is dispensed; and supplying, in a moving path of the substrate in the moving, a first gas that promotes filling of the imprint material into a pattern of the mold, wherein in a case where a target shot region to be subjected to the process meets a predetermined condition, supplying a second gas having a lower oxygen concentration than air onto the substrate is additionally executed for the target shot region after the supplying the first gas.

Abstract: Provided is an apparatus which is advantageous in view of reduction of consumption of a replacement gas. An apparatus for forming a pattern on a substrate using a mold includes a gas supply unit, a positioning unit and a controller. The controller controls a gas supply unit and a positioning unit and, causes second contact between a second shot region different from a first shot region and the mold after first contact between a first shot region having a material supplied thereon among the plurality of shot regions and the mold and controls the positioning unit so that a second gap which is the distance at the time of changing a relative position between the mold and the substrate in a surface direction from the first shot region to the second shot region is shorter than a first gap which is the distance at the time of gas supply.

Abstract: The present invention provides an imprint method that performs a process of forming a pattern of an imprint material on a substrate using a mold, for each of a plurality of shot regions on the substrate, the process including: dispensing the imprint material onto the substrate; moving, to below the mold, the substrate on which the imprint material is dispensed; and supplying, in a moving path of the substrate in the moving, a first gas that promotes filling of the imprint material into a pattern of the mold, wherein in a case where a target shot region to be subjected to the process meets a predetermined condition, supplying a second gas having a lower oxygen concentration than air onto the substrate is additionally executed for the target shot region after the supplying the first gas.

Abstract: Provided is an apparatus which is advantageous in view of reduction of consumption of a replacement gas. An apparatus for forming a pattern on a substrate using a mold includes a gas supply unit, a positioning unit and a controller. The controller controls a gas supply unit and a positioning unit and, causes second contact between a second shot region different from a first shot region and the mold after first contact between a first shot region having a material supplied thereon among the plurality of shot regions and the mold and controls the positioning unit so that a second gap which is the distance at the time of changing a relative position between the mold and the substrate in a surface direction from the first shot region to the second shot region is shorter than a first gap which is the distance at the time of gas supply.

Abstract: An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a mold holding unit that holds the mold, a substrate holding unit that holds the substrate, a deforming unit that deforms the mold held by the mold holding unit into a convex shape toward the substrate, a driving unit that changes an attitude of the mold or the substrate during a releasing operation in which the mold deformed into the convex shape is released from the resin to thereby make the position of a contact region at which the mold is brought into contact with the resin movable, a measuring unit that acquires image information indicating a state of the contact region, and a control unit configured to control the operation of the driving unit based on the image information.

Abstract: Provided is an interferometer system that irradiates an object to be measured with measuring light to thereby measure the position of the object to be measured. The interferometer system includes a laser light source; an interferometer configured to separate laser light emitted from an emission opening of the laser light source into the measuring light and reference light; and an optical path protecting member configured to surround an optical axis such that the laser light passes through the inside thereof and of which one opening is in contact with the emission opening.

Abstract: A mold replicating method for replicating a master mold (mold) by forming a pattern of the master mold on a substrate, the method comprising: obtaining information related to a shape difference between a pattern region of the master mold and a pattern region of the substrate; and deforming a relative shape of the pattern region of the master mold and the pattern region of the substrate by applying heat based on the information. The master mold (mold) and the substrate differ in an amount of deformation with respect to the heat applied.

Abstract: An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a mold holding unit that holds the mold, a substrate holding unit that holds the substrate, a deforming unit that deforms the mold held by the mold holding unit into a convex shape toward the substrate, a driving unit that changes an attitude of the mold or the substrate during a releasing operation in which the mold deformed into the convex shape is released from the resin to thereby make the position of a contact region at which the mold is brought into contact with the resin movable, a measuring unit that acquires image information indicating a state of the contact region, and a control unit configured to control the operation of the driving unit based on the image information.

Abstract: An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a mold holding unit that holds the mold, a substrate holding unit that holds the substrate, a deforming unit that deforms the mold held by the mold holding unit into a convex shape toward the substrate, a driving unit that changes an attitude of the mold or the substrate during a releasing operation in which the mold deformed into the convex shape is released from the resin to thereby make the position of a contact region at which the mold is brought into contact with the resin movable, a measuring unit that acquires image information indicating a state of the contact region, and a control unit configured to control the operation of the driving unit based on the image information.

Abstract: An imprint apparatus includes a deforming unit configured to deform the mold held by the mold holding unit into a convex shape toward the substrate; a driving unit configured to change an attitude of the mold or the substrate during a pressing in which the mold deformed is pressed against the uncured resin to thereby make a position of a contact region at which the mold is brought into contact with the uncured resin movable; a control unit configured to calculate a plane coordinates of a centroid of the contact region based on an image information of the contact region acquired by a measuring unit and to control an operation of the driving unit such that the plane coordinates position of the centroid is directed toward the plane coordinates position of the centroid of a pattern-forming region on the substrate, which has been calculated or has been acquired in advance.

Abstract: A stage apparatus includes a stage, an interferometric measurement device which is arranged to be able to measure a position of a surface of a mirror arranged on a side surface of the stage, and a driving unit configured to position the stage based on a measurement result of the interferometric measurement device. The interferometric measurement device includes: a varying unit configured to periodically vary an incident position where measurement light is incident on the mirror; and a detecting unit configured to detect rotation of the mirror based on a variation amount of the measurement result of the interferometric measurement device, which is generated upon a periodic variation of the incident position.

Abstract: Provided is an interferometer system that irradiates an object to be measured with measuring light to thereby measure the position of the object to be measured. The interferometer system includes a laser light source; an interferometer configured to separate laser light emitted from an emission opening of the laser light source into the measuring light and reference light; and an optical path protecting member configured to surround an optical axis such that the laser light passes through the inside thereof and of which one opening is in contact with the emission opening.

Abstract: A stage apparatus includes a stage, an interferometric measurement device which is arranged to be able to measure a position of a surface of a mirror arranged on a side surface of the stage, and a driving unit configured to position the stage based on a measurement result of the interferometric measurement device. The interferometric measurement device includes: a varying unit configured to periodically vary an incident position where measurement light is incident on the mirror; and a detecting unit configured to detect rotation of the mirror based on a variation amount of the measurement result of the interferometric measurement device, which is generated upon a periodic variation of the incident position.

Abstract: An imprint apparatus includes a deforming unit configured to deform the mold held by the mold holding unit into a convex shape toward the substrate; a driving unit configured to change an attitude of the mold or the substrate during a pressing in which the mold deformed is pressed against the uncured resin to thereby make a position of a contact region at which the mold is brought into contact with the uncured resin movable; a control unit configured to calculate a plane coordinates of a centroid of the contact region based on an image information of the contact region acquired by a measuring unit and to control an operation of the driving unit such that the plane coordinates position of the centroid is directed toward the plane coordinates position of the centroid of a pattern-forming region on the substrate, which has been calculated or has been acquired in advance.

Abstract: An imprint apparatus molds an uncured resin on a substrate and cures the resin to form a pattern of the cured resin on the substrate. The apparatus includes a mold holding unit that holds the mold, a substrate holding unit that holds the substrate, a deforming unit that deforms the mold held by the mold holding unit into a convex shape toward the substrate, a driving unit that changes an attitude of the mold or the substrate during a releasing operation in which the mold deformed into the convex shape is released from the resin to thereby make the position of a contact region at which the mold is brought into contact with the resin movable, a measuring unit that acquires image information indicating a state of the contact region, and a control unit configured to control the operation of the driving unit based on the image information.

Abstract: An exposure apparatus of the present invention is an EUV exposure apparatus 700 which is configured to expose a circuit pattern formed on a reticle 6 onto a wafer 9 in a vacuum environment. The EUV exposure apparatus 700 comprises a plurality of vacuum chambers 1 to 5 which separate inside of the EUV exposure apparatus 700 into a plurality of areas, and a wire electrode array 30 having a plurality of parallel wire electrodes. The wire electrode array 30 is placed at openings 25 to 28 through which exposure light passes at a boundary between adjacent vacuum chambers, and has a first wire electrode group to which an alternating voltage Va of a first phase is applied and a second wire electrode group to which an alternating voltage Vb of a second phase differing from the first phase is applied.

Abstract: A positioning apparatus includes a stage base, a stage moving along a surface of the stage base, a cable having one end connected to the stage, and a straightening structure configured to straighten air currents around the cable. The straightening structure is provided to at least one of the stage and the cable.

Abstract: A positioning apparatus includes a stage base, a stage moving along a surface of the stage base, a cable having one end connected to the stage, and a straightening structure configured to straighten air currents around the cable. The straightening structure is provided to at least one of the stage and the cable.