Abstract: The resonance fluorescence spectrum of a number of two-level atoms is driven by a gradient coherent laser field. In the weak dipole-dipole interaction region (separation less than ?/50), a very strong laser field may be applied such that the Rabi frequency is much larger than the dipole-dipole interaction energy. From the spectrum, the positions of each atom may be determined by just a few measurements. This sub-wavelength microscopy scheme is entirely based on far-field technique and it does not require point-by-point scanning, which makes the method more time-efficient. When two atoms are very close to each other (less than ?/50), the position information for each atom may still be obtained with very high accuracy provided that they are not too close to other atoms. The method may be extended to an arbitrarily large region without requiring more peak laser power and only a few measurements are required.

Abstract: Preservation of quantum entanglement in a two-qubit system is achieved by use of the disclosed systems. Three different example two-qubit systems are shown: (1) a system employing a weak measurement, (2) a system in which a generalized amplitude dampening occurs without use of a weak measurement, and (3) an extended system in which the system is prepared in a more robust state less susceptible to decoherence prior to a generalized amplitude dampening.

Abstract: Preservation of quantum entanglement in a two-qubit system is achieved by use of the disclosed systems. Three different example two-qubit systems are shown: (1) a system employing a weak measurement, (2) a system in which a generalized amplitude dampening occurs without use of a weak measurement, and (3) an extended system in which the system is prepared in a more robust state less susceptible to decoherence prior to a generalized amplitude dampening.

Abstract: The resonance fluorescence spectrum of a number of two-level atoms is driven by a gradient coherent laser field. In the weak dipole-dipole interaction region (separation less than ?/50), a very strong laser field may be applied such that the Rabi frequency is much larger than the dipole-dipole interaction energy. From the spectrum, the positions of each atom may be determined by just a few measurements. This sub-wavelength microscopy scheme is entirely based on far-field technique and it does not require point-by-point scanning, which makes the method more time-efficient. When two atoms are very close to each other (less than ?/50), the position information for each atom may still be obtained with very high accuracy provided that they are not too close to other atoms. The method may be extended to an arbitrarily large region without requiring more peak laser power and only a few measurements are required.

Abstract: A sub-wavelength photolithographic method includes exposing a photoresist material to a stimulating electromagnetic source prior to further exposing the photoresist material to a dissociating electromagnetic source. The stimulating electromagnetic source induces Rabi oscillations in the photoresist material between a first molecular state and an excited molecular state. The subsequent exposure of the photoresist material to the dissociating electromagnetic source dissociates only those molecules that are in the excited state, altering the properties of the photoresist material in zones of excited state molecules. The resulting patterns therefore depend on the spatial distribution of the zones of excited state molecules induced by the stimulating electromagnetic source. The properties of the stimulating electromagnetic source are controlled to achieve a desired spatial distribution of zones of excited state molecules of the photoresist material.

Abstract: A sub-wavelength photolithographic method includes exposing a photoresist material to a stimulating electromagnetic source prior to further exposing the photoresist material to a dissociating electromagnetic source. The stimulating electromagnetic source induces Rabi oscillations in the photoresist material between a first molecular state and an excited molecular state. The subsequent exposure of the photoresist material to the dissociating electromagnetic source dissociates only those molecules that are in the excited state, altering the properties of the photoresist material in zones of excited state molecules. The resulting patterns therefore depend on the spatial distribution of the zones of excited state molecules induced by the stimulating electromagnetic source. The properties of the stimulating electromagnetic source are controlled to achieve a desired spatial distribution of zones of excited state molecules of the photoresist material.

Abstract: A sub-wavelength photolithographic method includes exposing a photoresist material to a stimulating electromagnetic source prior to further exposing the photoresist material to a dissociating electromagnetic source. The stimulating electromagnetic source induces Rabi oscillations in the photoresist material between a first molecular state and an excited molecular state. The subsequent exposure of the photoresist material to the dissociating electromagnetic source dissociates only those molecules that are in the excited state, altering the properties of the photoresist material in zones of excited state molecules. The resulting patterns therefore depend on the spatial distribution of the zones of excited state molecules induced by the stimulating electromagnetic source. The properties of the stimulating electromagnetic source are controlled to achieve a desired spatial distribution of zones of excited state molecules of the photoresist material.

Abstract: A sub-wavelength photolithographic method includes exposing a photoresist material to a stimulating electromagnetic source prior to further exposing the photoresist material to a dissociating electromagnetic source. The stimulating electromagnetic source induces Rabi oscillations in the photoresist material between a first molecular state and an excited molecular state. The subsequent exposure of the photoresist material to the dissociating electromagnetic source dissociates only those molecules that are in the excited state, altering the properties of the photoresist material in zones of excited state molecules. The resulting patterns therefore depend on the spatial distribution of the zones of excited state molecules induced by the stimulating electromagnetic source. The properties of the stimulating electromagnetic source are controlled to achieve a desired spatial distribution of zones of excited state molecules of the photoresist material.