Abstract: In one aspect, the present application provides a dental imaging device, it comprises: a base, an elongated light blocking housing, a retractor and an attachment mechanism, wherein the elongated light blocking housing is mounted on a first side of the base and defines a channel, the retractor is for opening a user's lips and is provided on a first end away from the base of the elongated light blocking housing, the attachment mechanism is mounted on a second side opposite to the first side of the base for securing an image capturing device so that the image capturing device is able to capture images of the user's teeth, which are exposed by opening the user's lips with the retractor, through the channel, the elongated light blocking housing is mounted on a rectilinear rail on the base and its position along the rectilinear rail is adjustable.

Abstract: A method for etching a curved substrate is provided, including: forming a conductive thin film layer with an etched pattern on the curved substrate; supplying power to the conductive thin film layer such that the conductive thin film layer has an equal potential at each position of the conductive thin film layer; etching each position of the curved substrate to an etching depth corresponding to the potential at each position of the conductive thin film layer based on the etched pattern of the conductive thin film layer, so as to obtain the curved substrate having a consistent etching depth at each position of the curved substrate. With the etching method, it is possible to etch an arbitrary curved surface to obtain a microstructure with a uniform processing depth.

Abstract: The present disclosure provides a secondary imaging optical lithography method and apparatus.

Abstract: A method for etching a curved substrate is provided, including: forming a conductive thin film layer with an etched pattern on the curved substrate; supplying power to the conductive thin film layer such that the conductive thin film layer has an equal potential at each position of the conductive thin film layer; etching each position of the curved substrate to an etching depth corresponding to the potential at each position of the conductive thin film layer based on the etched pattern of the conductive thin film layer, so as to obtain the curved substrate having a consistent etching depth at each position of the curved substrate. With the etching method, it is possible to etch an arbitrary curved surface to obtain a microstructure with a uniform processing depth.

Abstract: Systems and methods disclosed relate to generating training data. In one embodiment, the disclosure relates to systems and methods for generating training data to train a neural network to detect and classify objects. A simulator obtains 3D models of objects, and simulates 3D environments comprising the objects using physics-based simulations. The simulations may include applying real-world physical conditions, such as gravity, friction, and the like on the objects. The system may generate images of the simulations, and use the images to train a neural network to detect and classify the objects from images.

Abstract: The present disclosure relates to a field of dry etching technology. The present disclosure provides an ultra-large area scanning reactive ion etching machine and an etching method thereof. The ultra-large area scanning reactive ion etching machine includes: an injection chamber (101), an etching reaction chamber (102), a transition chamber (103), and an etching ion generation chamber (104). By moving a sample holder (111) among the injection chamber (100), the etching reaction chamber (102) and the transition chamber (103) in a scanning direction, a scanning etching is performed on a sample (100) placed on the sample holder (111), which may realize a large-area, uniform and efficient etching.

Abstract: A system and method are provided for creating and evaluating computational models for games (e.g., individual or team sports games, etc.), team performance, and individual player performance evaluation. The method comprises obtaining data associated with the team game, the information comprising at least one individual player activity, at least one team activity, at least one game event, and a location in space and time for each of the events and activities; generating quantitative values for the data associated with the team game; and evaluating either or both an individual player and a team using the quantitative values.

Abstract: The present disclosure proposes an apparatus for coating photoresist and a method for coating photoresist. The apparatus for coating photoresist comprises a gas supply unit (10) configured to supply gas to a photoresist application unit (20); wherein the photoresist application unit (20) comprises: a device cavity (202) enclosed by sidewalls, a bottom plate and a cover plate (206), a rotation platform (204) configured to carry a substrate (205) and bring the substrate to rotate; a guide unit conformal with the substrate, and configured to uniformly blow the gas supplied by the gas supply unit over a surface of the substrate on which the photoresist is coated; and a gas extraction unit (203) configured to extract gas from the device cavity (202). The present disclosure realizes uniformly and rapidly coating the photoresist on a large substrate.

Abstract: The present disclosure proposes an apparatus for coating photoresist and a method for coating photoresist. The apparatus for coating photoresist comprises a gas supply unit (10) configured to supply gas to a photoresist application unit (20); wherein the photoresist application unit (20) comprises: a device cavity (202) enclosed by sidewalls, a bottom plate and a cover plate (206), a rotation platform (204) configured to carry a substrate (205) and bring the substrate to rotate; a guide unit conformal with the substrate, and configured to uniformly blow the gas supplied by the gas supply unit over a surface of the substrate on which the photoresist is coated; and a gas extraction unit (203) configured to extract gas from the device cavity (202). The present disclosure realizes uniformly and rapidly coating the photoresist on a large substrate.

Abstract: The present disclosure provides a secondary imaging optical lithography method and apparatus.

Abstract: An intraocular lens including an optic zone and a modulated surface profile formed in the optic zone and configured to focus incident light at a plurality of focal points, wherein the modulated surface profile is incorporated with a base surface profile of the optic zone.

Abstract: A method for regulating the phase of a wide-band electromagnetic wave uses a meta-surface sub-wavelength structure and the meta-surface sub-wavelength structure. The sub-wavelength structure is used as a basic unit of the meta-surface, and the basic unit is arranged in an array according to a regular order determined by the predetermined phase to generate a geometrical phase distribution with the spatial continuity and the spectral achromaticity between 0 and 2?, so that the phase is controlled and modulated in a two dimensional plane. The operating bandwidth may cover the entire electromagnetic spectrum, and a variety of optical devices such as reflective focusing/imaging elements, transmission focusing/imaging elements, prisms, orbital angular momentum generator may be realized. As an extension of the phase regulation, the method may also realize other novel electromagnetic wave functions such as wideband absorption and radar cross section reduction.

Abstract: A system and method are provided for creating and evaluating computational models for games (e.g., individual or team sports games, etc.), team performance, and individual player performance evaluation. The method comprises obtaining data associated with the team game, the information comprising at least one individual player activity, at least one team activity, at least one game event, and a location in space and time for each of the events and activities; generating quantitative values for the data associated with the team game; and evaluating either or both an individual player and a team using the quantitative values.

Abstract: Provided are apparatuses and methods for super resolution imaging photolithography. An exemplary apparatus may include an illumination light generation device configured to generate illumination light for imaging a pattern included in a mask through the mask. The illumination light may include a high-frequency spatial spectrum such that a high-frequency evanescent wave component of spatial spectrum information for the light is converted to a low-frequency evanescent wave component after being transmitted through the mask pattern. For example, the illumination light generation device may be configured to form the illumination in accordance with a high numerical aperture (NA) illumination mode and/or a surface plasmon (SP) wave illumination mode.

Abstract: Provided are apparatuses and methods for super resolution imaging photolithography. An exemplary apparatus may include an illumination light generation device configured to generate illumination light for imaging a pattern included in a mask through the mask. The illumination light may include a high-frequency spatial spectrum such that a high-frequency evanescent wave component of spatial spectrum information for the light is converted to a low-frequency evanescent wave component after being transmitted through the mask pattern. For example, the illumination light generation device may be configured to form the illumination in accordance with a high numerical aperture (NA) illumination mode and/or a surface plasmon (SP) wave illumination mode.