Abstract: Scanner aberration impact modeling in a semiconductor manufacturing process, which may facilitate co-optimization of multiple scanners. Scanner aberration impact modeling may include executing a calibrated model and controlling a scanner based on output from the model. The model is configured to receive patterning system aberration data. The model is calibrated with patterning system aberration calibration data and corresponding patterning process impact calibration data. New patterning process impact data may be determined, based on the model, for the received patterning system aberration data. The model includes a hyperdimensional function configured to correlate the received patterning system aberration data with the new patterning process impact data.

Abstract: The present disclosure relates to a method for efficiently compressing a dynamic 3D model sequence based on 4D fusion. In some embodiments, comprising: storing a 3D model of one frame of the dynamic 3D model sequence as a reference model; determining an initial correspondence between vertices of the reference model and a target model to align the reference model and the target model by optimizing an energy function of the reference model so as to obtain initialized fusion parameters, wherein the target model is a 3D model of remaining frames of the dynamic 3D model sequence; and determining the final fusion parameters for deforming the reference model into the target model by iteratively optimizing the initialized fusion parameters.

Abstract: Scanner aberration impact modeling in a semiconductor manufacturing process, which may facilitate co-optimization of multiple scanners. Scanner aberration impact modeling may include executing a calibrated model and controlling a scanner based on output from the model. The model is configured to receive patterning system aberration data. The model is calibrated with patterning system aberration calibration data and corresponding patterning process impact calibration data. New pattering process impact data may be determined, based on the model, for the received patterning system aberration data. The model includes a hyperdimensional function configured to correlate the received patterning system aberration data with the new pattering process impact data.

Abstract: The present disclosure relates to a three-dimensional reconstruction method and system, and storage medium. Various embodiments regarding three-dimensional reconstruction are described. In an embodiment, a method for training a three-dimensional reconstruction model comprises: generating an initial voxel envelope of a target object based on an image that is obtained by photographing the target object at a plurality of angles of view; performing random sampling on points inside the initial voxel envelope, so as to obtain a set of sampling points; performing global feature extraction on the image, so as to obtain a global feature map; determining, from the global feature map, a global feature corresponding to the sampling point based on a geometric association; performing encoding on geometric information related to the sampling point, so as to generate geometric encoded information; and training the model at least based on the global feature and the geometric encoded information.

Abstract: The present disclosure relates to a method and system for three-dimensional reconstruction, and a storage medium. Embodiments regarding three-dimensional reconstruction are described. In an embodiment, the method for three-dimensional reconstruction comprises: obtaining a composite image obtained by photographing a body of a target object and a mirror image of the target object; and performing three-dimensional reconstruction on the target object by using the composite image and relative position and posture information representing a position and posture of a mirror for generating the mirror image relative to a camera for the photography.

Abstract: Methods, software, and systems are disclosed for determining mask patterns. The determination can include obtaining a mask pattern including sub-resolution assist features (SRAFs) each having constant widths. The widths are set as continuous variables and so can be optimized along with other variables during a mask optimization process of the mask pattern. Based on their population and/or statistics, the optimized continuous widths are then discretized to a limited number of global width levels. Further mask optimization be performed with the SRAFs having discretized optimized global width levels, where the width assigned to an individual SRAF may be adjusted to a different level of the global width levels.

Abstract: Provided are a digital currency payment method, apparatus, and system, and relates to the technical field of computers. A specific implementation of the method includes: sending a transaction amount to a first currency management apparatus corresponding to a first client, so as to enable the first currency management apparatus to determine whether the transaction amount is greater than an available balance of a first digital currency used for payment; and in the case where the transaction amount is not greater than the available balance, sending a payment request to a second client, the payment request indicating the first digital currency or a circulation identifier of the first digital currency, so as to enable a second currency management apparatus corresponding to the second client to cash, for the first currency management apparatus, a second digital currency corresponding to the transaction amount.

Abstract: In one embodiment, a system determines a target lane for an autonomous driving vehicle (ADV) to change lanes from a current lane to the target lane. The system determines obstacles information for one or more obstacles surrounding the ADV from sensor data. The system determines vehicle information of the ADV including a speed of the ADV. The system applies a reinforcement learning (RL) model to the obstacles and vehicle information of the ADV to generate an action for the ADV, where the action includes an acceleration/deceleration value and a steering angle value. The system controls the ADV to perform the lane change from the current lane to the target lane by executing the action.

Abstract: A method for determining a wavefront parameter of a patterning process. The method includes obtaining a reference performance (e.g., a contour, EPE, CD) of a reference apparatus (e.g., a scanner), a lens model for a patterning apparatus configured to convert a wavefront parameter of a wavefront to actuator movement, and a lens fingerprint of a tuning apparatus (e.g., a to-be-matched scanner). Further, the method involves determining the wavefront parameter (e.g., a wavefront parameter such as tilt, offset, etc.) based on the lens fingerprint of the tuning apparatus, the lens model, and a cost function, wherein the cost function is a difference between the reference performance and a tuning apparatus performance.

Abstract: A long-distance lane change planning of an ADV is performed. A driving environment is perceived based on sensor data obtained from a plurality of sensors mounted on an ADV, including obtaining information of one or more obstacles on an adjacent lane. In response to a request to make a lane change from a current lane on which the ADV is driving to the adjacent lane, an S-V map is generated based on the information of the one or more obstacles. Each point on the S-V map represents a state of the ADV including a distance and a speed of the ADV. A trajectory of the ADV is generated using dynamic programming based on the S-V map. The ADV is controlled to drive autonomously according to the trajectory to make the lane change to the adjacent lane and avoid the one or more obstacles.

Abstract: A system with a pair of glasses, such as sunglasses, having a frame and at least one lens mounted in the frame, a light sensor mounted on the frame, and a receiver and circuitry present in the frame. The system also has app (e.g., on a cell phone) having control logic that is configured to send a command to the glasses to change the lens to a first or “dark” tint setting when a reading of the light sensor exceeds a high threshold and to send a command to change the lens to a second or “light” tint setting when a reading of the light sensor drops below a low threshold. The tint settings may change the transmittance or opacity of the lenses or the color of the lenses.

Abstract: Disclosed are a method, apparatus and system for exporting and recharging a digital currency, which mainly relate to the technical field of computers. The method includes: receiving a generation request of a digital currency sent by a digital currency terminal, wherein the generation request indicates a first denomination of the requested digital currency and user information corresponding to the digital currency terminal (S101); determining, according to the user information, an available currency corresponding to the user information and a second denomination of the available currency (S102); generating, according to the available currency and the second denomination of the available currency, the digital currency corresponding to the user information and the first denomination, and recording a status of the digital currency as an export status (S103), and notifying the digital currency terminal of the digital currency in the export status (S104).

Abstract: A magnesium-based solid, by means of determination based on a nitrogen adsorption method, has a multimodal pore distribution and a specific surface area of not less than 50 m2/g, and the pore size distribution of the solid is in a range of 1 nm to 300 nm. There is at least one peak within a pore size range of less than 10 nm, and there is at least another peak within a pore size range of not less than 10 nm. A catalyst is formed using the solid catalyst component is used for propylene polymerization.

Abstract: Scanner aberration impact modeling in a semiconductor manufacturing process, which may facilitate co-optimization of multiple scanners. Scanner aberration impact modeling may include executing a calibrated model and controlling a scanner based on output from the model. The model is configured to receive patterning system aberration data. The model is calibrated with patterning system aberration calibration data and corresponding patterning process impact calibration data. New patterning process impact data may be determined, based on the model, for the received patterning system aberration data. The model includes a hyperdimensional function configured to correlate the received patterning system aberration data with the new patterning process impact data.

Abstract: A method for determining a wavefront parameter of a patterning process. The method includes obtaining a reference performance (e.g., a contour, EPE, CD) of a reference apparatus (e.g., a scanner), a lens model for a patterning apparatus configured to convert a wavefront parameter of a wavefront to actuator movement, and a lens fingerprint of a tuning apparatus (e.g., a to-be-matched scanner). Further, the method involves determining the wavefront parameter (e.g., a wavefront parameter such as tilt, offset, etc.) based on the lens fingerprint of the tuning apparatus, the lens model, and a cost function, wherein the cost function is a difference between the reference performance and a tuning apparatus performance.

Abstract: A display panel and a fabrication method thereof are provided. The display panel includes an array substrate, a light-emitting device layer disposed on the array substrate, and an encapsulation layer disposed on the light-emitting device layer. The light-emitting device layer includes a pixel definition layer disposed on the array substrate, and the pixel definition layer includes a plurality of grooves formed along a periphery of a sub-pixel area of the display panel, and at least one of the grooves corresponds to the sub-pixel area.

Abstract: A method for determining a wavefront parameter of a patterning process. The method includes obtaining a reference performance (e.g., a contour, EPE, CD) of a reference apparatus (e.g., a scanner), a lens model for a patterning apparatus configured to convert a wavefront parameter of a wavefront to actuator movement, and a lens fingerprint of a tuning apparatus (e.g., a to-be-matched scanner). Further, the method involves determining the wavefront parameter (e.g., a wavefront parameter such as tilt, offset, etc.) based on the lens fingerprint of the tuning apparatus, the lens model, and a cost function, wherein the cost function is a difference between the reference performance and a tuning apparatus performance.

Abstract: The present disclosure provides antibody drug conjugates comprising STING modulators. Also provided are compositions comprising the antibody drug conjugates. The compounds and compositions are useful for stimulating an immune response in a subject in need thereof.

Abstract: A code reuse processing method, apparatus and electronic device related to a software development technology in the technical field of computers. The method includes: receiving a target request sent by a client of a target unit; in response to the target request, determining a first code line quantity per capita submitted within a target unit time and a reuse code base of the target unit used by a first code base in a dependency manner, the first code base is a code base except the reuse code base; determining reference information configured to indicate an amount of labor capable of being saved for the target unit when the target unit performs a code reuse within a target duration, the reference information based on the first code line quantity, a code line quantity of the reuse code base and a preset reuse proportion; and outputting the reference information to the client.

Abstract: The present disclosure includes systems and methods for configuring a radio base station of a cellular telecommunications network. An exemplary method includes receiving an instantaneous bandwidth (IBW) capability list from a radio unit that is coupled to an antenna and transmitting a control message to the radio unit to configure radio carriers for the radio unit. The control message is based on the IBW capability list. Associated network nodes are also included.