Abstract: An emergency flush apparatus for a toilet includes a flush driver module, a battery, and a processing unit operatively connected to the battery and the flush driver module. The emergency flush apparatus further includes a flush switch operatively connected to the battery and the processing unit, and a primary power supply operatively connected to the flush driver module. When the flush switch is activated, the processing unit detects a state of the flush driver module. Power is then supplied to the flush driver module from one of either the primary power supply or the battery in response to the detected state.

Abstract: An emergency flush apparatus for a toilet includes a flush driver module, a battery, and a processing unit operatively connected to the battery and the flush driver module. The emergency flush apparatus further includes a flush switch operatively connected to the battery and the processing unit, and a primary power supply operatively connected to the flush driver module. When the flush switch is activated, the processing unit detects a state of the flush driver module. Power is then supplied to the flush driver module from one of either the primary power supply or the battery in response to the detected state.

Abstract: A system, method, and computer program product are provided for creating expressions through the use of an expression builder. This allows the exploitation of additional views of data in a local data store without the need to rely on an enterprise server to push this data to a user device. Meta data descriptions of a local data source as properties are provided in order to generate an expression builder interface which can be used to combine these properties with mathematical expressions to derive new views of the local data.

Abstract: Chemical polishing systems, methods and slurries are disclosed for the chemical-mechanical rough polishing of GaAs wafers. An exemplary polishing slurry consistent with the innovations herein may comprise dichloroisocyanurate, sulfonate, pyrophosphate, bicarbonate and silica sol. An exemplary chemical polishing method may comprise polishing a wafer in a chemical polishing apparatus in the presence of such a chemical polishing solution. Chemical polishing solutions and methods herein make it possible, for example, to improve wafer quality, decrease costs, and/or reduce environmental pollution.