Patents by Inventor Zhang Kang

Zhang Kang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Shutter Disk
    Publication number: 20220028702
    Abstract: Describes are shutter disks comprising one or more of titanium (Ti), barium (Ba), or cerium (Ce) for physical vapor deposition (PVD) that allows pasting to minimize outgassing and control defects during etching of a substrate. The shutter disks incorporate getter materials that are highly selective to reactive gas molecules, including O2, CO, CO2, and water.
    Type: Application
    Filed: October 11, 2021
    Publication date: January 27, 2022
    Applicant: Applied Materials, Inc.
    Inventors: Zhang Kang, Junqi Wei, Yueh Sheng Ow, Kelvin Boh, Yuichi Wada, Ananthkrishna Jupudi, Sarath Babu
  • Shutter disk
    Patent number: 11171017
    Abstract: Describes are shutter disks comprising one or more of titanium (Ti), barium (Ba), or cerium (Ce) for physical vapor deposition (PVD) that allows pasting to minimize outgassing and control defects during etching of a substrate. The shutter disks incorporate getter materials that are highly selective to reactive gas molecules, including O2, CO, CO2, and water.
    Type: Grant
    Filed: September 3, 2020
    Date of Patent: November 9, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Zhang Kang, Junqi Wei, Yueh Sheng Ow, Kelvin Boh, Yuichi Wada, Ananthkrishna Jupudi, Sarath Babu
  • Shutter Disk
    Publication number: 20210074552
    Abstract: Describes are shutter disks comprising one or more of titanium (Ti), barium (Ba), or cerium (Ce) for physical vapor deposition (PVD) that allows pasting to minimize outgassing and control defects during etching of a substrate. The shutter disks incorporate getter materials that are highly selective to reactive gas molecules, including O2, CO, CO2, and water.
    Type: Application
    Filed: September 3, 2020
    Publication date: March 11, 2021
    Applicant: Applied Materials, Inc.
    Inventors: Zhang Kang, Junqi Wei, Yueh Sheng Ow, Kelvin Boh, Yuichi Wada, Ananthkrishna Jupudi, Sarath Babu