Patents by Inventor Zhangning XIE

Zhangning XIE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240151666
    Abstract: The present application discloses a method for calibrating a parameter error of an electron probe microanalysis instrument. A one-dimensional grating standard template is prepared based on atom lithography technology. A theoretical grating period D of the one-dimensional grating standard template is calculated. The one-dimensional grating standard template is statically placed on a stage of the electron probe microanalysis instrument. The electron probe microanalysis instrument scans the one-dimensional grating standard template on the stage, performs image acquisition and measurement on a grid distance of the one-dimensional grating standard template to obtain a grating scanning distance measurement value L, and records a magnification ratio at this time. A calibration factor K under the magnification ratio is calculated according to D and L.
    Type: Application
    Filed: December 15, 2022
    Publication date: May 9, 2024
    Applicants: Shanghai Institute of Measurement and Testing Technology, Tongji University
    Inventors: Lihua LEI, Chengming CAO, Yingfan XIONG, Zhangning XIE, Xiao DENG, Xinbin CHENG, Yuqing GUAN, Wenzhe ZOU, Yunxia FU