Abstract: A display substrate including: a base substrate, wherein at least one bonding element to be electrically connected to an external component is disposed in a peripheral region of the base substrate. The bonding element includes a first conductive layer, a second conductive layer and an insulation layer. The first conductive layer includes a metal oxide conductive lead. The second conductive layer includes a metal conductive lead. One or more via holes are provided in a region of the insulation layer. The metal conductive lead is electrically connected to the metal oxide conductive lead through the one or more via holes. The bonding element further comprises a via hole protection layer. A reflective liquid crystal display panel and an electrical apparatus are provided.

Abstract: A display substrate including: a base substrate, wherein at least one bonding element to be electrically connected to an external component is disposed in a peripheral region of the base substrate. The bonding element includes a first conductive layer, a second conductive layer and an insulation layer. The first conductive layer includes a metal oxide conductive lead. The second conductive layer includes a metal conductive lead. One or more via holes are provided in a region of the insulation layer. The metal conductive lead is electrically connected to the metal oxide conductive lead through the one or more via holes. The bonding element further comprises a via hole protection layer. A reflective liquid crystal display panel and an electrical apparatus are provided.

Abstract: There is provided a manufacture method of an array substrate of a display device using TFT as a pixel control unit, an array substrate, and a display apparatus. In this method, when a data line and source and drain electrodes of a TFT are prepared, a half-tone mask is used to retain at least one part of a photoresist on the data line; and the retained photoresist is softened by heating so that the at least one part of the data line is coated by the retained photoresist.

Abstract: A method of manufacturing an array substrate assembly, an array substrate assembly manufactured by the method, and a display panel including the array substrate assembly are disclosed. The method includes: providing a substrate, the substrate having a first region as a preset semiconductor-removed region, and a second region as a remaining region; forming, in the first region of the substrate, a semiconductor removing layer corrodible by a corrosive solution; and forming a semiconductor layer on the substrate formed with the semiconductor removing layer, so that the semiconductor layer covers the semiconductor removing layer.

Abstract: There is provided a manufacture method of an array substrate of a display device using TFT as a pixel control unit, an array substrate, and a display apparatus. In this method, when a data line and source and drain electrodes of a TFT are prepared, a half-tone mask is used to retain at least one part of a photoresist on the data line; and the retained photoresist is softened by heating so that the at least one part of the data line is coated by the retained photoresist.

Abstract: A method of manufacturing an array substrate assembly, an array substrate assembly manufactured by the method, and a display panel including the array substrate assembly are disclosed. The method includes: providing a substrate, the substrate having a first region as a preset semiconductor-removed region, and a second region as a remaining region; forming, in the first region of the substrate, a semiconductor removing layer corrodible by a corrosive solution; and forming a semiconductor layer on the substrate formed with the semiconductor removing layer, so that the semiconductor layer covers the semiconductor removing layer.