Patents by Inventor Zhaohong Han

Zhaohong Han has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10515815
    Abstract: Methods and apparatuses for passivating a fin field effect transistor (FinFET) semiconductor device and performing a gate etch using integrated atomic layer deposition (ALD) and etch processes are described herein. Methods include performing a partial gate etch, depositing a passivation layer on exposed surfaces of semiconductor fins and a gate layer by ALD, and performing a final gate etch to form one or more gate structures of the FinFET semiconductor device. The etch, deposition, and etch processes are performed in the same plasma chamber. The passivation layer is deposited on sidewalls of the gate layer to maintain a gate profile of the one or more gate structures during etching.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: December 24, 2019
    Assignee: Lam Research Corporation
    Inventors: Xiang Zhou, Ganesh Upadhyaya, Yoshie Kimura, Weiye Zhu, Zhaohong Han, Seokhwan Lee, Noel Sun
  • Publication number: 20190187061
    Abstract: A sensing apparatus includes a light source to transmit a light beam, an input switch, a first sensing element, a second sensing element, and a detector. The input switch receives the light beam and includes a phase change material having a first state and a second state. The first sensing element receives the light beam from the input switch when the phase change material is in the first state and produces a first change in the light beam in response to a presence of a first analyte. The second sensing element receives the light beam from the input switch when the phase change material is in the second state and produces a second change in the light beam in response to a presence of a second analyte. The detector detects the first change and/or the second change in the light beam.
    Type: Application
    Filed: December 7, 2018
    Publication date: June 20, 2019
    Inventors: Zhaohong HAN, Jianwei MU, Anuradha Murthy AGARWAL, Pao Tai LIN, Lionel Cooper KIMERLING
  • Publication number: 20190157096
    Abstract: Methods and apparatuses for passivating a fin field effect transistor (FinFET) semiconductor device and performing a gate etch using integrated atomic layer deposition (ALD) and etch processes are described herein. Methods include performing a partial gate etch, depositing a passivation layer on exposed surfaces of semiconductor fins and a gate layer by ALD, and performing a final gate etch to form one or more gate structures of the FinFET semiconductor device. The etch, deposition, and etch processes are performed in the same plasma chamber. The passivation layer is deposited on sidewalls of the gate layer to maintain a gate profile of the one or more gate structures during etching.
    Type: Application
    Filed: November 21, 2017
    Publication date: May 23, 2019
    Inventors: Xiang Zhou, Ganesh Upadhyaya, Yoshie Kimura, Weiye Zhu, Zhaohong Han, Seokhwan Lee, Noel Sun
  • Publication number: 20180024072
    Abstract: A sensing apparatus includes a light source to transmit a light beam, an input switch, a first sensing element, a second sensing element, and a detector. The input switch receives the light beam and includes a phase change material having a first state and a second state. The first sensing element receives the light beam from the input switch when the phase change material is in the first state and produces a first change in the light beam in response to a presence of a first analyte. The second sensing element receives the light beam from the input switch when the phase change material is in the second state and produces a second change in the light beam in response to a presence of a second analyte. The detector detects the first change and/or the second change in the light beam.
    Type: Application
    Filed: February 6, 2017
    Publication date: January 25, 2018
    Inventors: Zhaohong HAN, Jianwei MU, Anuradha Murthy AGARWAL, Pao Tai LIN, Lionel Cooper KIMERLING
  • Patent number: 9234935
    Abstract: An automation testing system for testing a motherboard includes a frame, a first jig plate, a second jig plate, a platform, a first driving mechanism, a second driving mechanism and a console computer. The frame includes a track, a debug docking board is detachably disposed on the first jig plate for docking with the motherboard, the platform is slidably installed on the track and disposed between the first jig plate and the second jig plate, and the platform is for holding the motherboard. The console computer controls the first driving mechanism to drive the platform to move in a first direction along the track, and controls the second driving mechanism to drive the second jig plate to move in a second direction perpendicular to the first direction.
    Type: Grant
    Filed: February 19, 2014
    Date of Patent: January 12, 2016
    Assignee: Wistron Corporation
    Inventors: Pei-Chih Wang, Xingxing Wang, Fei Wang, Haiyang Li, Zhaohong Han, Haibin Xin
  • Publication number: 20150115988
    Abstract: An automation testing system for testing a motherboard includes a frame, a first jig plate, a second jig plate, a platform, a first driving mechanism, a second driving mechanism and a console computer. The frame includes a track, a debug docking board is detachably disposed on the first jig plate for docking with the motherboard, the platform is slidably installed on the track and disposed between the first jig plate and the second jig plate, and the platform is for holding the motherboard. The console computer controls the first driving mechanism to drive the platform to move in a first direction along the track, and controls the second driving mechanism to drive the second jig plate to move in a second direction perpendicular to the first direction.
    Type: Application
    Filed: February 19, 2014
    Publication date: April 30, 2015
    Applicant: Wistron Corporation
    Inventors: Pei-Chih Wang, Xingxing Wang, Fei Wang, Haiyang Li, Zhaohong Han, Haibin Xin