Patents by Inventor Zhaoning Yu

Zhaoning Yu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20040197843
    Abstract: Nanochannel arrays that enable high-throughput macromolecular analysis are disclosed. Also disclosed are methods of preparing nanochannel arrays and nanofluidic chips. Methods of analyzing macromolecules, such as entire strands of genomic DNA, are also disclosed, as well as systems for carrying out these methods.
    Type: Application
    Filed: January 20, 2004
    Publication date: October 7, 2004
    Inventors: Stephen Y. Chou, Han Cao, Robert H. Austin, Zhaoning Yu, Jonas O. Tegenfeldt
  • Publication number: 20040156108
    Abstract: In accordance with the invention, an article comprising a nanoscale surface pattern, such as a grating, is provided with a nanoscale patterns of reduced edge and/or sidewall roughness. Smooth featured articles, can be fabricated by nanoimprint lithography using a mold having sloped profile molding features. Another approach uses a mold especially fabricated to provide smooth sidewalls of reduced roughness, and a third approach adds a post-imprint smoothing step. These approaches can be utilized individually or in various combinations to make the novel articles.
    Type: Application
    Filed: December 10, 2003
    Publication date: August 12, 2004
    Inventors: Stephen Y. Chou, Zhaoning Yu, Wei Wu
  • Publication number: 20040120644
    Abstract: In accordance with the invention, a SRG filter is fabricated by disposing a moldable layer on the unpatterned grating layer, pressing a patterned molding surface into the moldable layer to produce an appropriate pattern of reduced thickness regions, removing material from the reduced thickness regions to expose the grating layer and processing the exposed grating layer to form a grating array. In a preferred embodiment the grating layer is adjacent a planar waveguiding layer overlying a substrate and the moldable material is a polymer resist. The waveguide layer advantageously has a refractive index greater than both the grating layer and the underlying substrate. And the pattern can be a one or two-dimensional array of grating elements.
    Type: Application
    Filed: September 30, 2003
    Publication date: June 24, 2004
    Inventors: Stephen Y. Chou, Allan S.P. Chang, Hua Tan, Jim Jian Wang, Wei Wu, Rich Zhaoning Yu