Patents by Inventor Zhen-Cheng Chou

Zhen-Cheng Chou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Partially photoexposed positive photoresist layer blocking method for regio-selectively processing a microelectronic layer
    Patent number: 6936408
    Abstract: Within a method for fabricating a microelectronic fabrication there is employed a patterned positive photoresist residue layer as a protective layer within an aperture when processing an upper region of a topographic microelectronic layer having formed therein the aperture. The patterned positive photoresist residue layer is formed employing an incomplete vertical, but complete horizontal, blanket photoexposure and development of a blanket positive photoresist layer formed upon the topographic microelectronic layer and filling the aperture. The method provides the microelectronic fabrication with enhanced reliability.
    Type: Grant
    Filed: July 16, 2002
    Date of Patent: August 30, 2005
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Yong-Shun Liao, Juing-Yi Wu, Dian-Hau Chen, Zhen-Cheng Chou
  • Partially photoexposed positive photoresist layer blocking method for regio-selectively processing a microelectronic layer
    Publication number: 20040013981
    Abstract: Within a method for fabricating a microelectronic fabrication there is employed a patterned positive photoresist residue layer as a protective layer within an aperture when processing an upper region of a topographic microelectronic layer having formed therein the aperture. The patterned positive photoresist residue layer is formed employing an incomplete vertical, but complete horizontal, blanket photoexposure and development of a blanket positive photoresist layer formed upon the topographic microelectronic layer and filling the aperture. The method provides the microelectronic fabrication with enhanced reliability.
    Type: Application
    Filed: July 16, 2002
    Publication date: January 22, 2004
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yong-Shun Liao, Juing-YI Wu, Dian-Hau Chen, Zhen-Cheng Chou