Patents by Inventor Zheng Lv
Zheng Lv has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20250089278Abstract: A high-voltage capacitor and a manufacturing method thereof. The high-voltage capacitor includes a first electrode part, at least one interlayer dielectric layer disposed on the first electrode part, a groove disposed in a top surface of the interlayer dielectric layer, where projection of the groove in a vertical direction overlaps with the first electrode part, and a second electrode part of the high-voltage capacitor disposed on the top surface of the interlayer dielectric layer. The second electrode overlaps with the groove and extends beyond the sides of the groove. By providing the filled groove, the thickness of the dielectric layer at the edge of the lower surface of the second electrode part is increased compared to the capacitor's middle part, thereby improving the withstand voltage of the high-voltage capacitor.Type: ApplicationFiled: September 11, 2024Publication date: March 13, 2025Applicant: Silergy Semiconductor Technology (Hangzhou) LTD.Inventors: Zheng LV, Chuan PENG, Xunyi SONG
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Publication number: 20250089279Abstract: A high-voltage capacitor and a method for manufacturing the high-voltage capacitor are provided. The high-voltage capacitor comprises a first electrode portion, interlayer dielectric layers, a first voltage-resistant dielectric layer, a second electrode portion, and a second voltage-resistant dielectric layer. The interlayer dielectric layers are stacked on the first electrode portion. The first voltage-resistant dielectric layer is formed on an upper surface of a topmost interlayer dielectric layer among the interlayer dielectric layers. The second electrode portion is formed on the first voltage-resistant dielectric layer, and projections of the second electrode portion and the first electrode portion overlap along a vertical direction. The second voltage-resistant dielectric layer covers a side surface and part of an upper surface of the second electrode portion.Type: ApplicationFiled: September 11, 2024Publication date: March 13, 2025Applicant: Silergy Semiconductor Technology (Hangzhou) LTD.Inventors: Zheng LV, Chuan PENG, Xunyi SONG
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Patent number: 12098086Abstract: A device for advanced nitrogen and phosphorus removal in sewage treatment includes a pre-denitrification zone, an anaerobic zone, an anoxic zone, an aerobic zone, a sedimentation zone, a biological filtration zone, and a clear water zone, where a sludge return system is provided between the pre-denitrification zone and the sedimentation zone; a nitrification liquid return system is provided between the anoxic zone and the aerobic zone; a filler layer is provided in the biological filtration zone, and the filler layer divides a cavity in the biological filtration zone to form an upper water inlet cavity and a lower water outlet cavity; a backwash aeration pipe is provided in the water outlet cavity, and a backwash water outlet is formed in the water inlet cavity; and the backwash water outlet is connected to a sludge concentration and storage tank or the pre-denitrification zone.Type: GrantFiled: September 29, 2021Date of Patent: September 24, 2024Assignee: YUNNAN HEXU ENVIRONMENTAL TECHNOLOGY CO., LTD.Inventors: Wensheng Li, Ranrong Liu, Xin Zhang, Zheng Lv, Yulong Li, Yiqiu Fang, Fei Xia
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Patent number: 11902143Abstract: A method includes determining a network connection path that passes through m reference network devices, where m?1, and the m reference network devices are located in a network domain and are coupled to a device outside the network domain, determining a device configuration requirement of a first network connection service for each of n reference network devices that the network connection path passes through, where m?n?1, and determining that the network connection path is one of paths of the first network connection service when the device configuration meets the device configuration requirement.Type: GrantFiled: May 14, 2021Date of Patent: February 13, 2024Assignee: HUAWEI TECHNOLOGIES CO., LTD.Inventors: Liya Zhang, Chao Fang, Zheng Lv
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Patent number: 11887889Abstract: A method of manufacturing a semiconductor device can include: forming an interlayer dielectric layer on an upper surface of a lower metal layer, the lower metal layer including first and second regions; forming a through hole extending from an upper surface of interlayer dielectric layer to the lower metal layer to expose the upper surface of the lower metal layer; forming a conductive layer covering a bottom part and sidewall parts of the through hole, and the upper surface of the interlayer dielectric layer; forming a first dielectric layer covering the first conductive layer on the first region of the lower metal layer; filling the through hole with a first metal; and forming an upper metal layer above the upper surface of the interlayer dielectric layer.Type: GrantFiled: June 2, 2021Date of Patent: January 30, 2024Assignee: Silergy Semiconductor Technology (Hangzhou) LTDInventors: Zheng Lv, Xunyi Song, Meng Wang
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Publication number: 20240014213Abstract: A method of manufacturing a semiconductor device structure can include: forming a first gate dielectric layer on a first region of a semiconductor substrate, and forming a second gate dielectric layer on a second region of the semiconductor substrate; forming a conductive layer on the first and second gate dielectric layers; forming a barrier layer on the conductive layer; patterning the barrier layer to form a barrier pattern; etching the conductive layer to form first and second gates using the barrier pattern as a mask; forming a photolithography pattern on the semiconductor substrate, where the photolithography pattern exposes the well implantation area of the first region and a portion of the barrier pattern on the first gate; forming a well region in the well implantation area using the lithography pattern and the exposed barrier pattern as masks; and removing the photolithography pattern and the barrier pattern.Type: ApplicationFiled: June 2, 2023Publication date: January 11, 2024Inventors: Zheng Lv, Xunyi Song, Chihsen Huang
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Patent number: 11688824Abstract: A method of manufacturing an optoelectronic integrated device can include: providing a semiconductor substrate including at least one optoelectronic device in the semiconductor substrate; forming a first dielectric layer on a first surface of the semiconductor substrate; forming a multilayer insulating layer on the first dielectric layer; forming a first opening in the multilayer insulating layer to expose the first dielectric layer above the optoelectronic device area; and forming a second dielectric layer on the dielectric layer, where the first dielectric layer and the second dielectric layer are anti-reflection layers.Type: GrantFiled: May 4, 2021Date of Patent: June 27, 2023Assignee: Silergy Semiconductor Technology (Hangzhou) LTDInventors: Zheng Lv, Huisen He, Xianguo Huang
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Patent number: 11558247Abstract: This disclosure provides a method and an apparatus for implementing a composed VPN. The method includes: obtaining a business type and a customer site that are input by a user; determining an access point corresponding to the customer site; determining one or more segment VPNs according to the business type and the access point corresponding to the customer site; obtaining a composed VPN according to the one or more segment VPNs; and outputting an access point list and a segment VPN list of the composed VPN to the user. In the solutions provided in this application, a user can learn a correlation between businesses in different domains related to a composed VPN, and can readily estimate a range affected by a business change of the composed VPN.Type: GrantFiled: November 5, 2020Date of Patent: January 17, 2023Assignee: HUAWEI TECHNOLOGIES CO., LTD.Inventors: Liya Zhang, Yuanshan Chen, Zheng Lv
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Publication number: 20220017394Abstract: A device for advanced nitrogen and phosphorus removal in sewage treatment includes a pre-denitrification zone, an anaerobic zone, an anoxic zone, an aerobic zone, a sedimentation zone, a biological filtration zone, and a clear water zone, where a sludge return system is provided between the pre-denitrification zone and the sedimentation zone; a nitrification liquid return system is provided between the anoxic zone and the aerobic zone; a filler layer is provided in the biological filtration zone, and the filler layer divides a cavity in the biological filtration zone to form an upper water inlet cavity and a lower water outlet cavity; a backwash aeration pipe is provided in the water outlet cavity, and a backwash water outlet is formed in the water inlet cavity; and the backwash water outlet is connected to a sludge concentration and storage tank or the pre-denitrification zone.Type: ApplicationFiled: September 29, 2021Publication date: January 20, 2022Inventors: Wensheng Li, Ranrong Liu, Xin Zhang, Zheng Lv, Yulong Li, Yiqiu Fang, Fei Xia
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Publication number: 20210384073Abstract: A method of manufacturing a semiconductor device can include: forming an interlayer dielectric layer on an upper surface of a lower metal layer, the lower metal layer including first and second regions; forming a through hole extending from an upper surface of interlayer dielectric layer to the lower metal layer to expose the upper surface of the lower metal layer; forming a conductive layer covering a bottom part and sidewall parts of the through hole, and the upper surface of the interlayer dielectric layer; forming a first dielectric layer covering the first conductive layer on the first region of the lower metal layer; filling the through hole with a first metal; and forming an upper metal layer above the upper surface of the interlayer dielectric layer.Type: ApplicationFiled: June 2, 2021Publication date: December 9, 2021Inventors: Zheng Lv, Xunyi Song, Meng Wang
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Publication number: 20210351315Abstract: A method of manufacturing an optoelectronic integrated device can include: providing a semiconductor substrate including at least one optoelectronic device in the semiconductor substrate; forming a first dielectric layer on a first surface of the semiconductor substrate; forming a multilayer insulating layer on the first dielectric layer; forming a first opening in the multilayer insulating layer to expose the first dielectric layer above the optoelectronic device area; and forming a second dielectric layer on the dielectric layer, where the first dielectric layer and the second dielectric layer are anti-reflection layers.Type: ApplicationFiled: May 4, 2021Publication date: November 11, 2021Inventors: Zheng Lv, Huisen He, Xianguo Huang
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Publication number: 20210273875Abstract: A method includes determining a network connection path that passes through m reference network devices, where m?1, and the m reference network devices are located in a network domain and are coupled to a device outside the network domain, determining a device configuration requirement of a first network connection service for each of n reference network devices that the network connection path passes through, where m?n?1, and determining that the network connection path is one of paths of the first network connection service when the device configuration meets the device configuration requirement.Type: ApplicationFiled: May 14, 2021Publication date: September 2, 2021Inventors: Liya Zhang, Chao Fang, Zheng Lv
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Publication number: 20210058291Abstract: This disclosure provides a method and an apparatus for implementing a composed VPN. The method includes: obtaining a business type and a customer site that are input by a user; determining an access point corresponding to the customer site; determining one or more segment VPNs according to the business type and the access point corresponding to the customer site; obtaining a composed VPN according to the one or more segment VPNs; and outputting an access point list and a segment VPN list of the composed VPN to the user. In the solutions provided in this application, a user can learn a correlation between businesses in different domains related to a composed VPN, and can readily estimate a range affected by a business change of the composed VPN.Type: ApplicationFiled: November 5, 2020Publication date: February 25, 2021Applicant: HUAWEI TECHNOLOGIES CO., LTD.Inventors: Liya Zhang, Yuanshan Chen, Zheng Lv
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Patent number: 10855530Abstract: This disclosure provides a method and an apparatus for implementing a composed virtual private network (VPN). The method includes: obtaining a service type and a customer site that are input by a user; determining an access point corresponding to the customer site; determining one or more segment VPNs according to the service type and the access point corresponding to the customer site; obtaining a composed VPN according to the one or more segment VPNs; and outputting an access point list and a segment VPN list of the composed VPN to the user.Type: GrantFiled: September 5, 2018Date of Patent: December 1, 2020Assignee: Huawei Technologies Co., Ltd.Inventors: Liya Zhang, Yuanshan Chen, Zheng Lv
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Publication number: 20200219027Abstract: A knowledge transfer-based modeling method for blast furnace gas scheduling systems, firstly, building energy body models of all stages of energy generation, transmission, consumption, storage and conversion based on pipe network structures of gas systems, and extracting common structure features of different gas systems based on the energy models; secondly, designing a data distribution feature-based membership function transfer method, learning mapping relations between data of the different gas systems according to distribution features of the data, and then transferring membership functions; thirdly, proposing a feature-based fuzzy rule transfer method, mapping rule structures of different systems to adjacent low-dimensional features, and realizing rule transfer in a rule reconstruction mode; and finally, designing a scheduling data-based knowledge transfer adjustment strategy, inputting actual scheduling data of blast furnace gas systems into the models, and adjusting corresponding rule parameters by takType: ApplicationFiled: June 15, 2018Publication date: July 9, 2020Inventors: Zheng LV, Jun ZHAO, Ying LIU, Wei WANG
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Publication number: 20190020539Abstract: This disclosure provides a method and an apparatus for implementing a composed VPN. The method includes: obtaining a business type and a customer site that are input by a user; determining an access point corresponding to the customer site; determining one or more segment VPNs according to the business type and the access point corresponding to the customer site; obtaining a composed VPN according to the one or more segment VPNs; and outputting an access point list and a segment VPN list of the composed VPN to the user. In the solutions provided in this application, a user can learn a correlation between businesses in different domains related to a composed VPN, and can readily estimate a range affected by a business change of the composed VPN.Type: ApplicationFiled: September 5, 2018Publication date: January 17, 2019Applicant: HUAWEI TECHNOLOGIES CO., LTD.Inventors: Liya ZHANG, Yuanshan Chen, Zheng Lv
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Publication number: 20150201831Abstract: A portable perimeter for static multi-point synchronous thresholding screening and single-point thresholding detection is provided, comprising: an IPC (industrial personal computer); an LED optical source; an optical splitter; a visual field stimulator; a monitor; a printer; and a transponder; wherein the IPC is connected with the LED optical source, the optical splitter, the monitor, the printer and the transponder; wherein the visual field stimulator is hemispherical, four stimulating holes are provided on the visual field stimulator in such a manner that four beams split out by the optical splitter from a light from the LED optical source respectively pass through the four stimulating holes for forming an optical stimulating signal; wherein the stimulating holes are respectively provided in a GHA15 area, a GHB15 area, a GHC15 area and a GHD15 area according to a GH center 30 degrees visual field partition nomenclature.Type: ApplicationFiled: September 17, 2012Publication date: July 23, 2015Inventors: Zhongjiang He, Jichun Yang, Shuo Liu, Peng Li, Guojiang Gao, Zheng Lv
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Patent number: 8515561Abstract: This present provides a control and protection equipment system suitable for synthesis converter operation test, relates to power system automation equipment field. This system includes human-machine interface element, synchronization element, signal acquisition element, data aggregation element, conditioning element, protecting element, wave form recording element, wave form monitor element, on-off input element, on-off output element, vale based element (VBE), high direct current supply power system controller, high voltage supply system controller, current surge circuit controller, impulse circuit controller, test converter valve water cooling controller and test equipment water cooling system controller. This system can control converter samples and auxiliary valves on set trigging timing, produce various operation tests need heat, voltage and current of the converter samples and carry through operation tests.Type: GrantFiled: December 24, 2009Date of Patent: August 20, 2013Inventors: Guangfu Tang, Xingang Zhang, Kunpeng Zha, Zheng Lv, Zhiyuan He
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Publication number: 20110276189Abstract: This present provides a control and protection equipment system suitable for synthesis converter operation test, relates to power system automation equipment field. This system includes human-machine interface element, synchronization element, signal acquisition element, data aggregation element, conditioning element, protecting element, wave form recording element, wave form monitor element, on-off input element, on-off output element, vale based element (VBE), high direct current supply power system controller, high voltage supply system controller, current surge circuit controller, impulse circuit controller, test converter valve water cooling controller and test equipment water cooling system controller. This system can control converter samples and auxiliary valves on set trigging timing, produce various operation tests need heat, voltage and current of the converter samples and carry through operation tests.Type: ApplicationFiled: December 24, 2009Publication date: November 10, 2011Applicant: CHINA ELECTRIC POWER RESEARCH INSTITUTEInventors: Guangfu Tang, Xingang Zhang, Kunpeng Zha, Zheng Lv, Zhiyuan He