Patents by Inventor ZHENG YI CAI

ZHENG YI CAI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Automatic assessment method and assessment system thereof for yield improvement
    Patent number: 11480531
    Abstract: An assessment system includes a storage device and a processing circuit. The processing circuit is coupled to the storage device and configured to execute the instructions stored in the storage device. The storage device is configured for storing instructions of extracting at least one feature parameter corresponding to at least one defect detected on an object respectively; determining at least one feature evaluation according to the at least one feature parameter respectively; weighting the at least one feature evaluation to calculate at least one weighted feature evaluation respectively; summing the at least one weighted feature evaluation to calculate at least one total score corresponding to at least one lesson-learnt case; and ranking the at least one total score corresponding to the at least one lesson-learnt case to find out a suspected root cause corresponding to one of the at least one lesson-learnt case with higher priority.
    Type: Grant
    Filed: December 24, 2019
    Date of Patent: October 25, 2022
    Assignee: Yangtze Memory Technologies Co., Ltd.
    Inventors: Ge Ge Zhao, Fei Wang, Zheng Yi Cai, Ling Ling Fu, Tao Huang, Xing Jin, Jing Yun Wu, Yadong Wang
  • Method for calibrating verticality of particle beam and system applied to semiconductor fabrication process
    Patent number: 11112482
    Abstract: The present invention provides a method for calibrating verticality of a particle beam. The method includes: providing a baseplate having a first sensor and a second sensor; emitting the particle beam to the first sensor of the baseplate from an emitter, such that a first datum is collected when the first sensor receives the particle beam; emitting the particle beam to the second sensor of the baseplate from the emitter, such that a second datum is collected when the second sensor receives the particle beam; calculating a first calibrating datum based on the first datum and the second datum; and adjusting the baseplate or the emitter based on the first calibrating datum if the first calibrating datum is out of a first predetermined range.
    Type: Grant
    Filed: December 10, 2019
    Date of Patent: September 7, 2021
    Assignee: Yangtze Memory Technologies Co., Ltd.
    Inventors: Guangdian Chen, Jin Xing Chen, Zheng Yi Cai
  • Automatic Assessment Method and Assessment System Thereof for Yield Improvement
    Publication number: 20210140897
    Abstract: An assessment system includes a storage device and a processing circuit. The processing circuit is coupled to the storage device and configured to execute the instructions stored in the storage device. The storage device is configured for storing instructions of extracting at least one feature parameter corresponding to at least one defect detected on an object respectively; determining at least one feature evaluation according to the at least one feature parameter respectively; weighting the at least one feature evaluation to calculate at least one weighted feature evaluation respectively; summing the at least one weighted feature evaluation to calculate at least one total score corresponding to at least one lesson-learnt case; and ranking the at least one total score corresponding to the at least one lesson-learnt case to find out a suspected root cause corresponding to one of the at least one lesson-learnt case with higher priority.
    Type: Application
    Filed: December 24, 2019
    Publication date: May 13, 2021
    Inventors: GE GE ZHAO, Fei Wang, ZHENG YI CAI, LING LING FU, TAO HUANG, XING JIN, JING YUN WU, Yadong Wang
  • METHOD FOR CALIBRATING VERTICALITY OF PARTICLE BEAM AND SYSTEM APPLIED TO SEMICONDUCTOR FABRICATION PROCESS
    Publication number: 20210132174
    Abstract: The present invention provides a method for calibrating verticality of a particle beam. The method includes: providing a baseplate having a first sensor and a second sensor; emitting the particle beam to the first sensor of the baseplate from an emitter, such that a first datum is collected when the first sensor receives the particle beam; emitting the particle beam to the second sensor of the baseplate from the emitter, such that a second datum is collected when the second sensor receives the particle beam; calculating a first calibrating datum based on the first datum and the second datum; and adjusting the baseplate or the emitter based on the first calibrating datum if the first calibrating datum is out of a first predetermined range.
    Type: Application
    Filed: December 10, 2019
    Publication date: May 6, 2021
    Inventors: Guangdian Chen, JIN XING CHEN, ZHENG YI CAI