Patents by Inventor Zhengfeng Ma

Zhengfeng Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230173138
    Abstract: The present disclosure provides a method for modifying a hydrogel lubricating coating on a surface of general equipment, and hydrogel lubricating coating-modified general equipment, belonging to the technical field of material surface modification. In the present disclosure, by combining catechol adhesion chemistry and free radical polymerization initiated by surface catalysis, the method can realize in-situ generation of free radicals at an interface of a substrate and a hydrogel monomer solution at room temperature, without external auxiliary conditions such as illumination or heating. The method can prepare the hydrophilic hydrogel lubricating coating on the surface of almost all existing substrates, which is especially suitable for lubricating modification on an inner surface of a non-translucent pipeline instrument, showing material versatility. Therefore, the method is suitable for the fields of surface engineering and biomedicine.
    Type: Application
    Filed: December 2, 2022
    Publication date: June 8, 2023
    Applicants: Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Yantai Zhongke Research Institute of Advanced Materials and Green Chemical Engineering
    Inventors: Feng Zhou, Shuanhong Ma, Yunlei Zhang, Zhengfeng Ma
  • Patent number: 11021621
    Abstract: The present invention relates to the field of 3D printing technology, and provides a photocurable 3D printing polyimide ink, and a preparation method and application thereof. The photocurable 3D printing polyimide ink includes the following components in the following weight percentages: 40 to 60% of a photocurable polyamic acid, 5 to 40% of an organic solvent, 10 to 50% of a reactive diluent, 1 to 10% of a chain extender, and 1 to 3% of a photoinitiator. The photocurable 3D printing polyimide ink provided by the present invention has excellent mechanical properties, thermal stability, relatively high printing accuracy and relatively low shrinkage; a molded device obtained by 3D printing has excellent properties including high accuracy, great dimensional stability, high strength and corrosion resistance, excellent flexibility, high temperature resistance and relatively low shrinkage. The method for preparing the photocurable 3D printing polyimide ink has a simple process and lower energy consumption.
    Type: Grant
    Filed: April 2, 2018
    Date of Patent: June 1, 2021
    Assignee: Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences
    Inventors: Xiaolong Wang, Yuxiong Guo, Xiaoqin Zhang, Zhengfeng Ma, Pan Jiang, Feng Zhou
  • Publication number: 20190169450
    Abstract: The present invention relates to the field of 3D printing technology, and provides a photocurable 3D printing polyimide ink, and a preparation method and application thereof. The photocurable 3D printing polyimide ink includes the following components in the following weight percentages: 40 to 60% of a photocurable polyamic acid, 5 to 40% of an organic solvent, 10 to 50% of a reactive diluent, 1 to 10% of a chain extender, and 1 to 3% of a photoinitiator. The photocurable 3D printing polyimide ink provided by the present invention has excellent mechanical properties, thermal stability, relatively high printing accuracy and relatively low shrinkage; a molded device obtained by 3D printing has excellent properties including high accuracy, great dimensional stability, high strength and corrosion resistance, excellent flexibility, high temperature resistance and relatively low shrinkage. The method for preparing the photocurable 3D printing polyimide ink has a simple process and lower energy consumption.
    Type: Application
    Filed: April 2, 2018
    Publication date: June 6, 2019
    Inventors: Xiaolong Wang, Yuxiong Guo, Xiaoqin Zhang, Zhengfeng Ma, Pan Jiang, Feng Zhou