Patents by Inventor Zhengkai Lu

Zhengkai Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12334368
    Abstract: A liquid delivering system for wafer cleaning equipment includes an acid scouring tank, a sulfuric acid supplying source, a hydrogen peroxide supplying source, a first mixing device, a second mixing device and a feedback-control panel. The first mixing device and the second mixing device both includes a mixing duct, a multi-section mixing screw rod arranged inside the mixing duct and a heater wrapped around the mixing duct. By ways of adopting the above-mentioned technical solution, it is possible to realize fully mixing sulfuric acid with hydrogen peroxide in a mode of mixing in multi-stages, achieve precise control to temperature, and enable mixed liquid to fully react, thereby ensuring that the mixed liquid coming into the acid scouring tank meets cleaning requirements, and improving quality and efficiency of cleaning wafers.
    Type: Grant
    Filed: January 16, 2025
    Date of Patent: June 17, 2025
    Assignees: PNC PROCESS SYSTEMS CO., LTD., ULTRON SEMICONDUCTOR (SHANGHAI) CO., LTD.
    Inventors: Yilin Shen, Xinlai Chen, Dawei Liu, Jie Wang, Zhengkai Lu, Ming Xu, Panpan Li, Fangyi Lv, Chuanlong Liu
  • Publication number: 20250157832
    Abstract: A liquid delivering system for wafer cleaning equipment includes an acid scouring tank, a sulfuric acid supplying source, a hydrogen peroxide supplying source, a first mixing device, a second mixing device and a feedback-control panel. The first mixing device and the second mixing device both includes a mixing duct, a multi-section mixing screw rod arranged inside the mixing duct and a heater wrapped around the mixing duct. By ways of adopting the above-mentioned technical solution, it is possible to realize fully mixing sulfuric acid with hydrogen peroxide in a mode of mixing in multi-stages, achieve precise control to temperature, and enable mixed liquid to fully react, thereby ensuring that the mixed liquid coming into the acid scouring tank meets cleaning requirements, and improving quality and efficiency of cleaning wafers.
    Type: Application
    Filed: January 16, 2025
    Publication date: May 15, 2025
    Inventors: Yilin Shen, Xinlai Chen, Dawei Liu, Jie Wang, Zhengkai Lu, Ming Xu, Panpan Li, Fangyi Lv, Chuanlong Liu
  • Publication number: 20250155903
    Abstract: A method of controlling mixed liquid to be delivered for SPM solution includes: before the SPM solution comes into an acid scouring tank, mixing the sulfuric acid with the hydrogen peroxide in a delivering pipe in a first stage and a second stage in turn, so as to make a mixed liquid after mixing in the first stage to further get mixed in the second stage; heating the mixed liquid in the first stage; monitoring an oxygen concentration value of the mixed liquid flowing out after mixing in the first stage; and if the oxygen concentration value is smaller than an oxygen concentration value at full reaction, adding supplementary sulfuric acid and hydrogen peroxide during mixing in the second stage, so as to enable the oxygen concentration value of the mixed liquid flowing out after mixing in the second stage monitored in real time to reach an oxygen concentration value.
    Type: Application
    Filed: January 16, 2025
    Publication date: May 15, 2025
    Inventors: Yuan Jiang, Dawei LIU, Jing ZHANG, Zhengkai LU, Ming XU, Panpan LI, Fangyi LV, Chuanlong LIU