Patents by Inventor Zhengning Gao

Zhengning Gao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reagents to remove oxygen from metal oxyhalide precursors in thin film deposition processes
    Patent number: 11821080
    Abstract: A process for gas phase deposition of a metal or metal nitride film on a surface substrate comprises: reacting a metal-oxo or metal oxyhalide precursor with an oxophilic reagent in a reactor containing the substrate to deoxygenate the metal-oxo or metal oxyhalide precursor, and forming the metal or metal nitride film on the substrate through a vapor deposition process. The substrate is exposed to the metal oxyhalide precursor and the oxophilic reagent simultaneously or sequentially. The substrate is exposed to a reducing agent sequentially after deoxygenation.
    Type: Grant
    Filed: March 5, 2021
    Date of Patent: November 21, 2023
    Assignee: L'Air Liquide Societe Anonyme Pour L'Etude Et L'Exploitation Des Procedes Georges Claude
    Inventors: Yumin Liu, Rocio Alejandra Arteaga Muller, Nicolas Blasco, Jean-Marc Girard, Feng Li, Venkateswara R. Pallem, Zhengning Gao
  • REAGENTS TO REMOVE OXYGEN FROM METAL OXYHALIDE PRECURSORS IN THIN FILM DEPOSITION PROCESSES
    Publication number: 20210277517
    Abstract: A process for gas phase deposition of a metal or metal nitride film on a surface substrate comprises: reacting a metal-oxo or metal oxyhalide precursor with an oxophilic reagent in a reactor containing the substrate to deoxygenate the metal-oxo or metal oxyhalide precursor, and forming the metal or metal nitride film on the substrate through a vapor deposition process. The substrate is exposed to the metal oxyhalide precursor and the oxophilic reagent simultaneously or sequentially. The substrate is exposed to a reducing agent sequentially after deoxygenation.
    Type: Application
    Filed: March 5, 2021
    Publication date: September 9, 2021
    Inventors: Yumin Liu, Rocio Arteaga, Nicolas Blasco, Jean-Marc Girard, Feng Li, Venkateswara R. Pallem, Zhengning Gao