Abstract: In a method of manufacturing a semiconductor device, a fin structure having a channel region protruding from an isolation insulating layer disposed over a semiconductor substrate is formed, a cleaning operation is performed, and an epitaxial semiconductor layer is formed over the channel region. The cleaning operation and the forming the epitaxial semiconductor layer are performed in a same chamber without breaking vacuum.

Abstract: An automatic adjustment method and an automatic adjustment device of a beam of a semiconductor apparatus, and a training method of a parameter adjustment model are provided. The automatic adjustment method of the beam of the semiconductor apparatus includes the following steps. The semiconductor apparatus generates the beam. A wave curve of the beam is obtained. The wave curve is segmented into several sections. The slope of each of the sections is obtained. Several environmental factors of the semiconductor apparatus are obtained. According to the slopes and the environmental factors, at least one parameter adjustment command of the semiconductor apparatus is analyzed through the parameter adjustment model.

Abstract: An automatic adjustment method and an automatic adjustment device of a beam of a semiconductor apparatus, and a training method of a parameter adjustment model are provided. The automatic adjustment method of the beam of the semiconductor apparatus includes the following steps. The semiconductor apparatus generates the beam. A wave curve of the beam is obtained. The wave curve is segmented into several sections. The slope of each of the sections is obtained. Several environmental factors of the semiconductor apparatus are obtained. According to the slopes and the environmental factors, at least one parameter adjustment command of the semiconductor apparatus is analyzed through the parameter adjustment model.

Abstract: A remote control device for a manufacturing equipment and a method for detecting manual control are provided. The method for detecting the manual control on the manufacturing equipment includes the following steps. A cursor pattern is created. When the user interface is automatically controlled, a history location of the cursor pattern shown on a user interface of the manufacturing equipment is detected to obtain a location distribution. The location distribution is stored. A current location of the cursor pattern shown on the user interface is detected. If the current location is not within the location distribution, it is deemed that the user interface is manually controlled.

Abstract: A method for measuring brightness uniformity of a panel is disclosed. The method includes steps of: dividing the panel into a plurality of areas, measuring brightness of each area, calculating each area of an average value K the brightness differences between the area and the other adjacent areas, and comparing the value K with a predetermined value. When the value K is greater than the predetermined value, it indicates that the brightness difference between the area and the adjacent areas exceeds a uniformity threshold. When the value K is smaller than the predetermined value, it indicates that the brightness difference between the area and the adjacent areas is below the uniformity threshold. The entire panel is evaluated to ensure accuracy of measuring results.

Abstract: A method for measuring brightness uniformity of a panel is disclosed. The method includes steps of: dividing the panel into a plurality of areas, measuring brightness of each area, calculating each area of an average value K the brightness differences between the area and the other adjacent areas, and comparing the value K with a predetermined value. When the value K is greater than the predetermined value, it indicates that the brightness difference between the area and the adjacent areas exceeds a uniformity threshold. When the value K is smaller than the predetermined value, it indicates that the brightness difference between the area and the adjacent areas is below the uniformity threshold. The entire panel is evaluated to ensure accuracy of measuring results.

Abstract: A container for packaging flat panels is provided. The container has a protection structure. The flat panels are packaged in a hollow space defined by inner walls of the protection structure. The inner walls of the protection structure are formed with a plurality of recess sets for defining a plurality of receiving space so as to accommodate flat panels with different dimensions.