Patents by Inventor Zhenhua Ma

Zhenhua Ma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11986243
    Abstract: Disclosed is a fundus camera, which relates to the technical field of medical devices and includes: an illumination module, a main optical assembly, a focusing module, and an image sensing acquisition module; the illumination module includes a plurality of light sources configured to emit light of different wavelengths, illumination light emitted by the plurality of light sources is conducted to enter an eye of a patient through the main optical assembly, and light reflected by a retina of the patient is conducted to pass through the main optical assembly and the focusing module to enter the image sensing acquisition module. The fundus camera provided by the present application improves the technical problem that the fundus camera in the prior art cannot image different layers of the retina, thereby providing valuable medical and diagnostic data.
    Type: Grant
    Filed: January 22, 2019
    Date of Patent: May 21, 2024
    Assignee: SHENZHEN THONDAR TECHNOLOGY CO., LTD
    Inventors: Yequan Huang, Jianwei Ren, Zhenhua Chen, Xuechuan Dong, Feiyan Ma, Jinsong Zhang, Sha Lai, Kexing Liu, Zeljko Ribaric
  • Publication number: 20240161673
    Abstract: The present disclosure provides a shift register unit, a driving method, a driving circuit and a display device. The shift register unit includes a first node potential adjustment circuit, a first tank circuit, a second node control circuit, a second tank circuit, a third node control circuit, a first node control circuit, and an output circuit; the first node potential adjustment circuit changes the potential of the first node according to the adjustment clock signal under the control of the potential of the first node; the first tank circuit is used to maintain the potential of the first node; the third node control circuit controls the potential of the third isolation node and the potential of the fourth node; the second node control circuit controls the potential of the second isolation node.
    Type: Application
    Filed: January 25, 2024
    Publication date: May 16, 2024
    Inventors: Yingsong XU, Zhenhua ZHANG, Qian MA, Xilei CAO, Changlong YUAN, Jingyi FENG, Weiyun HUANG, Benlian WANG
  • Patent number: 11922845
    Abstract: The present disclosure provides a shift register unit, a driving method, a driving circuit and a display device. The shift register unit includes a first node potential adjustment circuit, a first tank circuit, a second node control circuit, a second tank circuit, a third node control circuit, a first node control circuit, and an output circuit; the first node potential adjustment circuit changes the potential of the first node according to the adjustment clock signal under the control of the potential of the first node; the first tank circuit is used to maintain the potential of the first node; the third node control circuit controls the potential of the third isolation node and the potential of the fourth node; the second node control circuit controls the potential of the second isolation node.
    Type: Grant
    Filed: October 23, 2020
    Date of Patent: March 5, 2024
    Assignees: Chengdu BOE Optoelectronics Technology Co., Ltd., BOE Technology Group Co., Ltd.
    Inventors: Yingsong Xu, Zhenhua Zhang, Qian Ma, Xilei Cao, Changlong Yuan, Jingyi Feng, Weiyun Huang, Benlian Wang
  • Patent number: 8405817
    Abstract: A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.
    Type: Grant
    Filed: February 1, 2010
    Date of Patent: March 26, 2013
    Assignee: ASML Netherlands B.V.
    Inventors: Marco Koert Stavenga, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Richard Moerman, Michel Riepen, Sergei Shulepov, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Jan Willem Cromwijk, Ralph Joseph Meijers, Fabrizio Evangelista, David Bessems, Hua Li, Marinus Jochemsen, Pieter Lein Joseph Gunter, Franciscus Wilhelmus Bell, Erik Witberg, Marcus Agnes Johannes Smits, Zhenhua Ma
  • Publication number: 20100214543
    Abstract: A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.
    Type: Application
    Filed: February 1, 2010
    Publication date: August 26, 2010
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Marco Koert Stavenga, Nicolaas Rudolf Kemper, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Richard Moerman, Michel Riepen, Sergei Shulepov, Gert-Jan Gerardus Johannes Thomas Brands, Koen Steffens, Jan Willem Cromwijk, Ralph Joseph Meijers, Fabrizio Evangelista, David Bessems, Hua Li, Marinus Jochemsen, Pieter Lein Joseph Gunter, Franciscus Wilhelmus Bell, Erik Witberg, Marcus Agnes Johannes Smits, Zhenhua Ma