Abstract: Provided are a message processing method and apparatus, a device and a storage medium. The method includes: acquiring a first device message sent by an Internet-of-Things device, where the first device message includes a target message transmission topic name and target device data generated by the Internet-of-Things device; acquiring topic mapping relationship configuration information in a configuration database, where each stream processing topic name in the topic mapping relationship configuration information corresponds to at least one message transmission topic name; determining a target stream processing topic name according to the target message transmission topic name and the topic mapping relationship configuration information; and generating a second device message based on the target device data and the target stream processing topic name and sending the second device message to a stream processing server so that the stream processing server processes the second device message.

Abstract: A resource treatment system for urine and feces separation and recovery in urine diversion dehydration toilets, includes a urine-faeces division toilet, a urine and gray water treatment system, and a fermentation and biodegradation fecal system. The urine-faeces division toilet is configured to separate and recover urine and feces discharged by users. The urine and gray water treatment system includes an adjusting pool, a microalgae culture device and a metal-based electrogenerated dynamic membrane. The adjusting pool is configured to receive the urine in the urine-faeces division toilet and domestic sewage, and adjust a urine-to-domestic sewage ratio. The metal-based electrogenerated dynamic membrane includes a metal microfiltration membrane, a stainless-steel mesh and a power supply. The fermentation and biodegradation fecal system includes a collection and adjusting device, a fermentation bed and a biodegradation chamber.

Abstract: A resource treatment system for urine and feces separation and recovery in urine diversion dehydration toilets, includes a urine-faeces division toilet, a urine and gray water treatment system, and a fermentation and biodegradation fecal system. The urine-faeces division toilet is configured to separate and recover urine and feces discharged by users. The urine and gray water treatment system includes an adjusting pool, a microalgae culture device and a metal-based electrogenerated dynamic membrane. The adjusting pool is configured to receive the urine in the urine-faeces division toilet and domestic sewage, and adjust a urine-to-domestic sewage ratio. The metal-based electrogenerated dynamic membrane includes a metal microfiltration membrane, a stainless-steel mesh and a power supply. The fermentation and biodegradation fecal system includes a collection and adjusting device, a fermentation bed and a biodegradation chamber.

Abstract: A power system energy management system with security constrained automatic generation control (SCAGC) is disclosed wherein the power generation output and branch power flow are constrained by security limit. A sub-optimization model is used to calculate SCAGC for each control area in parallel. Graph computing is applied to solve the SCAGC by simplex approach in hierarchical parallel and nodal parallel. The SCAGC is solved heuristically first by combining the equal incremental fuel cost ratio and generation shift factor, and if the heuristics do not converge, a simplex method is used to solve the SCAGC.

Abstract: A method and system for reducing a water content in a substance, comprising: mixing a water-and-solid-containing substance with a liquefied gas solvent creating a mixture and at least part of water in the water-and-solid-containing substance to be extracted into the liquefied gas solvent; separating the mixture into a substance with a decreased water content and a solvent with an increased water content, comprising the liquefied gas solvent and water extracted from the water-and-solid-containing substance; separating the solvent with an increased water content into a liquefied-gas-solvent-rich phase and a water-rich phase by changing a temperature of the solvent with an increased water content, and in a process of changing the temperature, keeping the temperature to be lower than a boiling point of the liquefied gas solvent under a pressure in the process; and returning at least part of the liquefied-gas-solvent-rich phase to be used as a solvent in creating the mixture.

Abstract: A method for preventing the formation of watermark defects includes the steps of forming a pad oxide, a silicon nitride layer and a silicon oxynitride layer over a semiconductor substrate. A photoresist mask is formed over the resulting structure, with the silicon oxynitride layer being used as an anti-reflective coating during exposure of the photoresist material. An etch is performed through the photoresist mask, thereby forming a trench in the substrate. The photoresist mask is stripped, and the silicon oxynitride layer is conditioned. For example, the silicon oxynitride layer may be conditioned by a rapid thermal anneal in the presence of oxygen or nitrogen. A wet clean step is subsequently performed to remove a native oxide layer in the trench. The conditioned silicon oxynitride layer prevents the formation of watermarks during the wet clean process.

Abstract: A method for preventing the formation of watermark defects includes the steps of forming a pad oxide, a silicon nitride layer and a silicon oxynitride layer over a semiconductor substrate. A photoresist mask is formed over the resulting structure, with the silicon oxynitride layer being used as an anti-reflective coating during exposure of the photoresist material. An etch is performed through the photoresist mask, thereby forming a trench in the substrate. The photoresist mask is stripped, and the silicon oxynitride layer is conditioned. For example, the silicon oxynitride layer may be conditioned by a rapid thermal anneal in the presence of oxygen or nitrogen. A wet clean step is subsequently performed to remove a native oxide layer in the trench. The conditioned silicon oxynitride layer prevents the formation of watermarks during the wet clean process.