Abstract: Aqueous compositions comprising (a) at least one phenolic compound and (b) at least one hydrotrope in an amount effective to solubilize said at least one phenolic compound in water are provided for cosmetic and other uses.

Abstract: The invention provides synergistic aqueous compositions comprising at least one flavonoid, and ferulic acid, and optionally one or more additional antioxidants, for cosmetic use.

Abstract: A water releasing composition in the form of an emulsion and process for using the composition are provided. The composition includes an aqueous phase and an oil phase. The aqueous phase includes at least one water-soluble active ingredient at a concentration by weight of from about 0.1% to about 20%, based upon weight of the composition. The oil phase includes dimethicone at a concentration by weight of about 1% to about 25%, and an emulsifying crosslinked siloxane elastomer at a concentration by weight of about 0.1% to about 20%, both based upon weight of the composition. The composition has a phase ratio of the aqueous phase to the oil phase of about 3.0 to about 12.0. The composition converts from an emulsion to a plurality of droplets upon application of shear.

Abstract: Aqueous compositions comprising a) at least one active compound and b) at least one hydrotrope in an amount effective to increase transdermal penetration of the active compound, and methods for increasing bioavailability of active compounds are provided.

Abstract: The present invention relates to a method of selecting a subset of patterns from a design, to a method of performing source and mask optimization, and to a computer program product for performing the method of selecting a subset of patterns from a design. According to certain aspects, the present invention enables coverage of the full design while lowering the computation cost by intelligently selecting a subset of patterns from a design in which the design or a modification of the design is configured to be imaged onto a substrate via a lithographic process. The method of selecting the subset of patterns from a design includes identifying a set of patterns from the design related to the predefined representation of the design. By selecting the subset of patterns according to the method, the selected subset of patterns constitutes a similar predefined representation of the design as the set of patterns.

Abstract: The invention provides synergistic aqueous compositions comprising at least one flavonoid, and ferulic acid, and optionally one or more additional antioxidants, for cosmetic use.

Abstract: Aqueous compositions comprising a) at least one active compound and b) at least one hydrotrope in an amount effective to increase transdermal penetration of the active compound, and methods for increasing bioavailability of active compounds are provided.

Abstract: Aqueous compositions comprising (a) at least one phenolic compound and (b) at least one hydrotrope in an amount effective to solubilize said at least one phenolic compound in water are provided for cosmetic and other uses.

Abstract: The present invention provides aqueous compositions comprising (a) at least one compound selected from the group consisting of adenosine and adenosine analogues, and (b) at least one hydrotrope in an amount effective to solubilize said at least one compound (a) in water, for cosmetic uses.

Abstract: The present invention relates generally to selecting optimum patterns based on diffraction signature analysis, and more particularly to, using the optimum patterns for mask-optimization for lithographic imaging. A respective diffraction map is generated for each of a plurality of target patterns from an initial larger set of target patterns from the design layout. Diffraction signatures are identified from the various diffraction maps. The plurality of target patterns is grouped into various diffraction-signature groups, the target patterns in a specific diffraction-signature group having similar diffraction signature. A subset of target patterns is selected to cover all possible diffraction-signature groups, such that the subset of target patterns represents at least a part of the design layout for the lithographic process. The grouping of the plurality of target patterns may be governed by predefined rules based on similarity of diffraction signature.

Abstract: The present invention relates to a method of selecting a subset of patterns from a design, to a method of performing source and mask optimization, and to a computer program product for performing the method of selecting a subset of patterns from a design. According to certain aspects, the present invention enables coverage of the full design while lowering the computation cost by intelligently selecting a subset of patterns from a design in which the design or a modification of the design is configured to be imaged onto a substrate via a lithographic process. The method of selecting the subset of patterns from a design includes identifying a set of patterns from the design related to the predefined representation of the design. By selecting the subset of patterns according to the method, the selected subset of patterns constitutes a similar predefined representation of the design as the set of patterns.

Abstract: The present invention relates generally to selecting optimum patterns based on diffraction signature analysis, and more particularly to, using the optimum patterns for mask-optimization for lithographic imaging. A respective diffraction map is generated for each of a plurality of target patterns from an initial larger set of target patterns from the design layout. Diffraction signatures are identified from the various diffraction maps. The plurality of target patterns is grouped into various diffraction-signature groups, the target patterns in a specific diffraction-signature group having similar diffraction signature. A subset of target patterns is selected to cover all possible diffraction-signature groups, such that the subset of target patterns represents at least a part of the design layout for the lithographic process. The grouping of the plurality of target patterns may be governed by predefined rules based on similarity of diffraction signature.

Abstract: Magnetic materials and methods for using ferromagnetic and antiferromagnetic coupling and exchange bias for binary and multistate magnetic memory device.

Abstract: Magnetic materials and methods for using ferromagnetic and antiferromagnetic coupling and exchange bias for binary and multistate magnetic memory device.