Patents by Inventor Zhikai Wang

Zhikai Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10387187
    Abstract: A method of rebooting a computing system in which a virtual machine (VM) runs on top of a hypervisor and a host operating system (OS) includes the following steps. Those steps are sending, from the host OS to the hypervisor, a pre-reboot notification that the host OS is going to reboot, in response to reception of the pre-reboot notification, saving by the hypervisor state of a session that is executing in the VM, rebooting the host OS, after the host OS is rebooted, logging on to the host OS using a credential provider that was previously registered with the host OS and sending a post-reboot notification from the host OS to the hypervisor, and in response to reception of the post-reboot notification, instantiating by the hypervisor a VM in which the session is resumed using the saved state of the session.
    Type: Grant
    Filed: July 7, 2017
    Date of Patent: August 20, 2019
    Assignee: VMware, Inc.
    Inventors: Zhikai Chen, Zhibin He, Xi Chen, Wen Wang
  • Publication number: 20190035644
    Abstract: A semiconductor processing apparatus is provided. The apparatus includes a body portion, which includes at least one semiconductor processing unit. Each semiconductor processing unit includes a recess formed on an upper surface of the body portion, wherein a bottom surface of the recess has at least one location and a peripheral. The bottom surface ascends from the at least one location toward the peripheral against a direction of gravity or descends from the at least one location toward the peripheral following the direction of gravity. Each semiconductor processing unit also includes a first channel that connects to the recess at the at least one location, as well as at least one second channel connecting to the recess at the peripheral. Each of the first channel and the at least one second channel serves as an inlet or an outlet via which a fluid enters or exits the recess.
    Type: Application
    Filed: March 18, 2016
    Publication date: January 31, 2019
    Inventors: Sophia Wen, Zhikai Wang
  • Publication number: 20180350635
    Abstract: A semiconductor processing apparatus is provided. The apparatus includes a first chamber portion and a second chamber portion movable relative to the first chamber portion between an open position and a closed position. The first chamber portion includes a recessed area formed on an internal surface of the first chamber portion. The first chamber portion also includes one or more through-holes connected to respective locations of the recessed area. When the second chamber portion is in the closed position and a semiconductor wafer is housed in the micro chamber, the recessed area is sealed by a surface of the semiconductor wafer to form a closed channel. The surface may be processed by a processing fluid flowing in the closed channel. Accordingly, a flowing direction and a flowing speed of the processing fluid may be accurately controlled, and an amount of the processing fluid consumed may be greatly reduced.
    Type: Application
    Filed: December 21, 2015
    Publication date: December 6, 2018
    Inventors: Sophia Wen, Zhikai Wang
  • Patent number: 10043978
    Abstract: The present teachings relate to organic semiconductor formulations including an organic semiconducting compound in a liquid medium, where the liquid medium includes (1) a compound in liquid state that has electronic properties complementary to the electronic structure of the organic semiconducting compound and optionally (2) a solvent or solvent mixture for solubilizing the organic semiconducting compound. The present formulations can be used as inks in the fabrication of organic semiconductor devices.
    Type: Grant
    Filed: March 21, 2016
    Date of Patent: August 7, 2018
    Assignee: Flexterra, Inc.
    Inventors: Chun Huang, Damien Boudinet, Yan Zheng, Zhikai Wang, Yu Xia, Theresa L. Starck, Antonio Facchetti
  • Publication number: 20170012208
    Abstract: The present teachings relate to organic semiconductor formulations including an organic semiconducting compound in a liquid medium, where the liquid medium includes (1) a compound in liquid state that has electronic properties complementary to the electronic structure of the organic semiconducting compound and optionally (2) a solvent or solvent mixture for solubilizing the organic semiconducting compound. The present formulations can be used as inks in the fabrication of organic semiconductor devices.
    Type: Application
    Filed: March 21, 2016
    Publication date: January 12, 2017
    Inventors: Chun Huang, Damien Boudinet, Yan Zheng, Zhikai Wang, Yu Xia, Theresa L. Starck, Antonio Facchetti
  • Patent number: 9428605
    Abstract: A method for the preparation of an organic-inorganic hybrid composition is performed through three major steps. In addition, a product is generated from this organic-inorganic hybrid composition. In step one, a series of hydrolysis reactions and condensation reactions with a functional organosilane or a combination of functional organosilanes, in presence of water as a reactant for hydrolysis and a suitable acid or a base as a catalyst is performed in order to obtain the first intermediate. In step two, a hydroxyl group-capping intermediate is prepared via reacting a hydroxyl reactable chemical with a hydroxyl functional polymerizable compound. In the third step, a hydroxyl group-capping reaction is conducted with the first intermediate and the hydroxyl group-capping intermediate, so as to obtain the organic-inorganic hybrid composition. It may further include a polymerization step to form an organic-inorganic hybrid polymer composition by UV irradiation or other approaches.
    Type: Grant
    Filed: November 8, 2013
    Date of Patent: August 30, 2016
    Assignee: NEO SITECH LLC
    Inventors: Zhikai Wang, John Jun Chiao
  • Patent number: 9341948
    Abstract: Described herein is a solution-processable composition for preparing a photopatternable material. The solution-processable composition generally includes (a) an oligomeric siloxane component that includes, based on its total weight, between about 40% by weight and about 100% by weight one or more cage-structured polyhedral oligomeric silsesquioxanes that are functionalized with one or more crosslinkable moieties such as cycloaliphatic epoxy moieties, (b) a polymerization initiator; (c) one or more thermosettable polymers that collectively are present in an amount between about 1% by weight and about 20% by weight based on the total weight of the oligomeric siloxane component; and (d) a solvent.
    Type: Grant
    Filed: August 25, 2014
    Date of Patent: May 17, 2016
    Assignee: Polyera Corporation
    Inventors: Chun Huang, Zhikai Wang, Yu Xia, Meko McCray, Theresa L. Starck, Darwin Scott Bull, Antonio Facchetti, Xiang Yu
  • Patent number: 9293711
    Abstract: Disclosed are formulations including an organic semiconducting compound in a liquid medium, where the liquid medium includes (1) a compound in liquid state that has electronic properties complementary to the electronic structure of the organic semiconducting compound and optionally (2) a solvent or solvent mixture for solubilizing the organic semiconducting compound. The present formulations can be used as inks in the fabrication of organic semiconductor devices.
    Type: Grant
    Filed: March 15, 2013
    Date of Patent: March 22, 2016
    Assignee: Polyera Corporation
    Inventors: Chun Huang, Damien Boudinet, Yan Zheng, Zhikai Wang, Yu Xia, Theresa L. Starck, Antonio Facchetti
  • Publication number: 20150056553
    Abstract: The present inorganic-organic hybrid materials can be patterned with relatively low photo-exposure energies and are thermally stable, mechanically robust, resist water penetration, and show good adhesion to metal oxides, metals, metal alloys, as well as organic materials. The present materials can be solution-processed (e.g., by spin-coating), and can exhibit good chemical (e.g., solvent and etchant) resistance in the cured form.
    Type: Application
    Filed: August 25, 2014
    Publication date: February 26, 2015
    Inventors: Chun Huang, Zhikai Wang, Yu Xia, Meko McCray, Theresa L. Starck, Darwin Scott Bull, Antonio Facchetti, Xiang Yu
  • Publication number: 20140128495
    Abstract: A method for the preparation of an organic-inorganic hybrid composition is performed through three major steps. In addition, a product is generated from this organic-inorganic hybrid composition. In step one, a series of hydrolysis reactions and condensation reactions with a functional organosilane or a combination of functional organosilanes, in presence of water as a reactant for hydrolysis and a suitable acid or a base as a catalyst is performed in order to obtain the first intermediate. In step two, a hydroxyl group-capping intermediate is prepared via reacting a hydroxyl reactable chemical with a hydroxyl functional polymerizable compound. In the third step, a hydroxyl group-capping reaction is conducted with the first intermediate and the hydroxyl group-capping intermediate, so as to obtain the organic-inorganic hybrid composition. It may further include a polymerization step to form an organic-inorganic hybrid polymer composition by UV irradiation or other approaches.
    Type: Application
    Filed: November 8, 2013
    Publication date: May 8, 2014
    Applicant: NEW SITECH LLC
    Inventors: Zhikai WANG, John Jun CHIAO
  • Publication number: 20140042369
    Abstract: Disclosed are formulations including an organic semiconducting compound in a liquid medium, where the liquid medium includes (1) a compound in liquid state that has electronic properties complementary to the electronic structure of the organic semiconducting compound and optionally (2) a solvent or solvent mixture for solubilizing the organic semiconducting compound. The present formulations can be used as inks in the fabrication of organic semiconductor devices.
    Type: Application
    Filed: March 15, 2013
    Publication date: February 13, 2014
    Inventors: Chun Huang, Damien Boudinet, Yan Zheng, Zhikai Wang, Yu Xia, Theresa L. Starck, Antonio Facchetti
  • Publication number: 20120059186
    Abstract: A composition comprising at least one curable compound (I) advantageously having a refractive index Formula (I) of at least 1.60 and obtained from the reaction of A at least one aromatic polyisocyanate, B at least one monofunctional alcohol or amine, C at least one further monofunctional alcohol or amine different from B, D at least one diol or diamine, and E optionally a hydroxyl group containing (meth)acrylate, the compound (I) comprising at least one curable functional group selected from the group consisting of carbon-carbon double bonds and epoxy groups.
    Type: Application
    Filed: May 11, 2010
    Publication date: March 8, 2012
    Inventors: Zhikai Wang, Marcus Lee Hutchins
  • Publication number: 20070179254
    Abstract: UV curable urethane (meth)acrylate polymers which useful as laminating and pressure sensitive adhesives am disclosed and methods of making them. The polymers comprise a urethane extended backbone formed by reacting diisocyanates with a mixture of polyols derived from acrylates and polyols derived from rubber polymers.
    Type: Application
    Filed: January 6, 2005
    Publication date: August 2, 2007
    Inventors: Zhikai Wang, Xinya Lu, Morris Johnson, JoAnn Arceneaux
  • Publication number: 20060258829
    Abstract: An acrylic urethane (meth)acrylate oligomer composition is provided, which has an acrylic urethane backbone comprising a reaction product of an acrylic polyol, and a diisocyanate, said acrylic urethane (meth)acrylate oligomer has residues in the Mowing order: hydroxy(meth)acrylate-(diisocyanate-acrylic polyol)n-diisocyanate-hydroxy(meth)acrylate where n is 1 to 10. The oligomer is useful in ink compositions.
    Type: Application
    Filed: September 20, 2004
    Publication date: November 16, 2006
    Inventors: Zhikai Wang, Rosalyn Waldo, Sue Williamson
  • Publication number: 20050155522
    Abstract: Functionalized pigment compositions produced by reacting a radiation reactive organometallic coupling agent with a pigment/dye.
    Type: Application
    Filed: January 26, 2005
    Publication date: July 21, 2005
    Inventors: Zhikai Wang, Bin Wu
  • Patent number: 6913639
    Abstract: Functionalized pigment compositions produced by reacting a radiation reactive organ metallic coupling agent with a pigment/dye.
    Type: Grant
    Filed: December 10, 2001
    Date of Patent: July 5, 2005
    Assignee: Surface Specialties, S.A.
    Inventors: Zhikai Wang, Bin Wu
  • Publication number: 20050084607
    Abstract: The present invention provides a method for producing organic/inorganic hybrid nanocomposites by use of ultrasonic agitation. The particles are reacted with an organic coupling agent to modify the surface of said particles to inhibit agglomeration.
    Type: Application
    Filed: December 19, 2002
    Publication date: April 21, 2005
    Inventor: Zhikai Wang
  • Publication number: 20050065310
    Abstract: An acrylic urethane (meth)acrylate oligomer is provided, which has an acrylic urethane backbone comprising a reaction product of an acrylic polyol and a diisocyanate, which backbone is capped with a hydroxy(meth)acrylate. The acrylic urethane (meth)acrylate oligomer has residues in the following order: hydroxy(meth)acrylate?(diisocyanate?acrylic polyol)n?diisocyanate?hydroxy(meth)acrylate where n is 1 to 10. The oligomer is useful in ink compositions.
    Type: Application
    Filed: September 23, 2003
    Publication date: March 24, 2005
    Inventors: Zhikai Wang, Rosalyn Waldo, Sue Williamson
  • Patent number: 6838536
    Abstract: A substantially reactive and gel-free composition which comprises: a. particles capable of reaction with a radiation curable resin; b. a coupling agent for modification of the surface of said particles; c. a radiation curable resin; d. a radiation curable salt capable of inhibiting gel formation in said composition.
    Type: Grant
    Filed: August 30, 2002
    Date of Patent: January 4, 2005
    Assignee: UCB, S.A.
    Inventors: Zhikai Wang, Carol Black, Jun Qiao
  • Publication number: 20040063813
    Abstract: A powder coating composition comprising reactive nanoparticles and a thermocurable or radiation curable resin. The nanoparticles impart a wide range of enhanced properties to the compositions such as hardness and abrasion resistance.
    Type: Application
    Filed: October 8, 2003
    Publication date: April 1, 2004
    Inventors: Bin Wu, Zhikai Wang