Abstract: An alignment method and related system and device are based on holographic lithography. The method includes controlling an illumination light to generate an alignment image after passing through an alignment image area of a holographic mask. The alignment image includes first and second period images. A period of the first period image is different from that of the second period image. A light intensity corresponding to the first period image and a light intensity corresponding to the second period image are obtained. A relative position of a silicon wafer and/or a holographic mask is adjusted to determine an alignment position between the silicon wafer and the holographic mask with respect to the holographic lithography based on a condition in which the light intensity corresponding to the first period image and the light intensity corresponding to the second period image are equal and both reach a maximum value.

Abstract: A system includes: a phantom object; one or more sensors within the phantom object; and a processor, a computer readable memory, a non-transitory computer readable storage medium associated with a computing device in communication with the phantom object, and program instructions executable by the computing device to cause the computing device to perform operations including: detecting a medical instrument within the phantom object based on sensor data captured by the one or more sensors; measuring a distance between the medical instrument and a target point based on the sensor data; and storing or outputting information identifying the distance between the medical instrument and the target point.