Patents by Inventor Zhming Wan

Zhming Wan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus to decelerate and control ion beams to improve the total quality of ion implantation
    Patent number: 6946667
    Abstract: An ion implantation method is disclosed in this invention. The disclosed method is for implanting a target wafer with ions extracted from an ion source traveling along an original ion beam path. The method includes steps of a) employing a set of deceleration electrodes disposed along the original ion beam path before the target wafer for decelerating and deflecting the ion beam to the target wafer; and b) employing a charged particle deflecting means disposed between the ion source and the set of deceleration electrodes for deflecting the ion beam away from original ion beam path and projecting to the set of electrodes with an incident angle for the set of electrodes to deflect the ion beam back to the original ion beam path for implanting the target wafer.
    Type: Grant
    Filed: November 19, 2002
    Date of Patent: September 20, 2005
    Assignee: Advanced Ion Beam Technology, Inc.
    Inventors: Jiong Chen, Zhming Wan, Qing Qian