Patents by Inventor ZHONG YAOYING

ZHONG YAOYING has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Methods and apparatus for depositing aluminum by physical vapor deposition (PVD)
    Patent number: 11670485
    Abstract: Methods and apparatus for performing physical vapor deposition in a reactor chamber to form aluminum material on a substrate including: depositing a first aluminum layer atop a substrate to form a first aluminum region having a first grain size and a second aluminum layer atop the first aluminum layer, wherein the second aluminum layer has a second grain size larger than the first grain size; and depositing aluminum atop the second aluminum layer under conditions sufficient to increase the second grain size.
    Type: Grant
    Filed: August 20, 2019
    Date of Patent: June 6, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Siew Kit Hoi, Zhong Yaoying, Xinxin Wang
  • METHODS AND APPARATUS FOR DEPOSITING ALUMINUM BY PHYSICAL VAPOR DEPOSITION (PVD)
    Publication number: 20210057186
    Abstract: Methods and apparatus for performing physical vapor deposition in a reactor chamber to form aluminum material on a substrate including: depositing a first aluminum layer atop a substrate to form a first aluminum region having a first grain size and a second aluminum layer atop the first aluminum layer, wherein the second aluminum layer has a second grain size larger than the first grain size; and depositing aluminum atop the second aluminum layer under conditions sufficient to increase the second grain size.
    Type: Application
    Filed: August 20, 2019
    Publication date: February 25, 2021
    Inventors: SIEW KIT HOI, ZHONG YAOYING, XINXIN WANG