Patents by Inventor Zhonghe LIN

Zhonghe LIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240388274
    Abstract: A bonding structure and an acoustic wave device relate to the field of filters. The bonding structure includes a supporting substrate and a piezoelectric layer formed on the supporting substrate. The supporting substrate is made of a polycrystalline material, and a porosity of the supporting substrate is less than 0.0045% or greater than 0.6%. The bonding structure can effectively improve the generation of interference of spurious emission and improve the performance of the device.
    Type: Application
    Filed: July 30, 2024
    Publication date: November 21, 2024
    Inventors: Zhonghe LIN, Minghui FANG, Yenfu LIN, Shiwei HUANG, Shengyu YANG
  • Publication number: 20230188112
    Abstract: A method for making a composite substrate of a filter includes: processing a base substrate to form a centrally protruding structure having a height that decreases in a radially outward direction from a center of the base substrate to an outer periphery of the base substrate; connecting a first side of the base substrate having the centrally protruding structure to a piezoelectric layer so as to obtain a multilayer substrate; and thinning the piezoelectric layer of the multilayer substrate followed by polishing a surface of the piezoelectric layer.
    Type: Application
    Filed: February 10, 2023
    Publication date: June 15, 2023
    Applicant: FUJIAN JING'AN OPTOELECTRONICS CO., LTD.
    Inventors: Yenfu LIN, Zhonghe LIN, Shengyu YANG, Minghui FANG, Shihwei HUANG
  • Publication number: 20220368303
    Abstract: A method for blackening at least one wafer includes: (a) performing a reduction treatment on the at least one wafer; and (b) illuminating the at least one wafer with an ultraviolet light. The at least one wafer after the illumination of the UV light has a blackening uniformity value (DE value) smaller than 0.6, and a chromatic value (L value) smaller than 54. In addition, a blackened wafer made from the method is also provided.
    Type: Application
    Filed: July 27, 2022
    Publication date: November 17, 2022
    Applicant: FUJIAN JING'AN OPTOELECTRONICS CO., LTD.
    Inventors: Yilin LIU, Zhonghe LIN, Yenfu LIN, Shihwei HUANG, Minghui FANG, Shengyu YANG