Patents by Inventor Zhonghuan ZHAO

Zhonghuan ZHAO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10737320
    Abstract: The present invention relates to a high-purity tantalum powder and a preparation method therefore. The tantalum powder has a purity of more than 99.995%, as analyzed by GDMS. Preferably, the tantalum powder has an oxygen content of not more than 1000 ppm, a nitrogen content of not more than 50 ppm, a hydrogen content of not more than 20 ppm, a magnesium content of not more than 5 ppm, and an average particle diameter D50 of less than 25 ?m.
    Type: Grant
    Filed: February 27, 2014
    Date of Patent: August 11, 2020
    Assignee: Ningxia Orient Tantalum Industry Co., Ltd.
    Inventors: Zhongxiang Li, Yuewei Cheng, Xueqing Chen, Ting Wang, Dejun Shi, Zekun Tong, Yan Yan, Xiaoyu Tian, Zhonghuan Zhao
  • Publication number: 20190308247
    Abstract: Provided are a flaked tantalum powder and method for preparation thereof; said flaked tantalum powder contains 300-1800 ppm of nitrogen, 10-100 ppm of phosphorus, and 1-40 ppm of boron. The flaked tantalum powder has high capacity and low leakage current, good puncture-resistance, and particularly outstanding high-frequency attributes. Doping with nitrogen during oxygen reduction is performed before three thermal treatments are carried out; the solution of performing three thermal treatments and a subsequent process improves the uniformity of distribution of elemental nitrogen and makes up for the deficiency of an oxide film, thereby increasing the pressure resistance of the product, and especially its high-frequency attributes.
    Type: Application
    Filed: July 13, 2016
    Publication date: October 10, 2019
    Inventors: Xueqing CHEN, Yuewei CHENG, Yuezhong MA, Zhongxiang LI, Zhidao WANG, Xia LI, Dejun SHI, Zhonghuan ZHAO
  • Publication number: 20160354838
    Abstract: The present invention relates to a high-purity tantalum powder and a preparation method therefore. The tantalum powder has a purity of more than 99.995%, as analyzed by GDMS. Preferably, the tantalum powder has an oxygen content of not more than 1000 ppm, a nitrogen content of not more than 50 ppm, a hydrogen content of not more than 20 ppm, a magnesium content of not more than 5 ppm, and an average particle diameter D50 of less than 25 ?m.
    Type: Application
    Filed: February 27, 2014
    Publication date: December 8, 2016
    Inventors: Zhongxiang LI, YUEWEI CHENG, Xueqing CHEN, Ting WANG, Dejun SHI, Zekun TONG, Yan YAN, Xiaoyu TIAN, Zhonghuan ZHAO