Patents by Inventor Zhonglai WANG

Zhonglai WANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210408174
    Abstract: The present application provides a display substrate, a display panel, and a display device. The display substrate includes a substrate layer. The substrate layer includes a first substrate portion and a second substrate portion joined to each other. The first substrate portion is made of a first substrate material and configured to be disposed opposite to a photosensitive element. The second substrate portion is made of a second substrate material. A light transmittance of the first substrate material is larger than or equal to a light transmittance threshold, and a light transmittance of the second substrate material is smaller than the light transmittance threshold.
    Type: Application
    Filed: September 13, 2021
    Publication date: December 30, 2021
    Applicant: HEFEI VISIONOX TECHNOLOGY CO., LTD.
    Inventors: Wei CHAO, Peng LIAO, Zhonglai WANG, Xiaojia LIU, Jingli CHEN, Buwei PAN, Huayun HOU
  • Patent number: 10788756
    Abstract: The present invention provides a method for detecting a size of a pattern made by photolithography, which being applied for detecting a size of a pattern formed on an array substrate of a liquid crystal display including: deriving function layer parameters and position parameters of a detection-pattern; deriving a thickness-profile of the detection-pattern according to the function layer parameters and the position parameters of the detection-pattern; deriving a plane-profile of the detection-pattern according to the thickness-profile of the detection-pattern; proceeding a size-detection to the plane-profile of the detection-pattern.
    Type: Grant
    Filed: August 18, 2015
    Date of Patent: September 29, 2020
    Assignee: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
    Inventors: Kuanju Fu, Caiqin Chen, Zhonglai Wang
  • Publication number: 20180239262
    Abstract: The present invention provides a method for detecting a size of a pattern made by photolithography, which being applied for detecting a size of a pattern formed on an array substrate of a liquid crystal display and made by, which comprises: deriving function layer parameters and position parameters of a detection-pattern; deriving a thickness-profile of the detection-pattern according to the function layer parameters and the position parameters of the detection-pattern; deriving a plane-profile of the detection-pattern according to the thickness-profile of the detection-pattern; proceeile of the detection-pattern.
    Type: Application
    Filed: August 18, 2015
    Publication date: August 23, 2018
    Inventors: Kuanju FU, Caiqin CHEN, Zhonglai WANG